JPS58181888A - Silver coating material and preparation thereof - Google Patents

Silver coating material and preparation thereof

Info

Publication number
JPS58181888A
JPS58181888A JP5512082A JP5512082A JPS58181888A JP S58181888 A JPS58181888 A JP S58181888A JP 5512082 A JP5512082 A JP 5512082A JP 5512082 A JP5512082 A JP 5512082A JP S58181888 A JPS58181888 A JP S58181888A
Authority
JP
Japan
Prior art keywords
alloy
layer
thickness
plating
intermediate layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5512082A
Other languages
Japanese (ja)
Other versions
JPH0241591B2 (en
Inventor
Satoshi Suzuki
智 鈴木
Shoji Shiga
志賀 章二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP5512082A priority Critical patent/JPS58181888A/en
Publication of JPS58181888A publication Critical patent/JPS58181888A/en
Publication of JPH0241591B2 publication Critical patent/JPH0241591B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To enhance the close adhesiveness of a silver coating material, in the Ag coating material prepared by forming an Ag layer or an Ag alloy layer on a base member, by providing an intermediate layer comprising Zn or an alloy containing a specific amount or more of Zn between the base member and the Ag layer or the Ag alloy layer. CONSTITUTION:The surface of a base member plated with Zn or a Zn alloy with Zn content of 50% or more, for example, a Zn-Cu alloy, a Zn-Ni alloy or a Zn- Sn alloy in a thickness of 0.01-3mum and Ag or an Ag alloy is subsequently plated on the Zn or the Zn alloy layer. By this method, even if oxygen is diffused and permeated into the Ag layer or the Ag alloy layer under a high temp. environment, oxygen is inhibited by the Zn layer or the Zn alloy layer being an intermediate layer and the close adhesivensss of the base member and the Ag layer or the Ag alloy layer is not damaged.

Description

【発明の詳細な説明】 本発明は、耐食性、半田付は性が潰れ、これ等の特性が
、l4i−環境I′−晒されても劣化しない田婁性の潰
れた銀波di材料と、その製造方法に関するものである
DETAILED DESCRIPTION OF THE INVENTION The present invention provides corrosion resistance, solderability, and other properties that do not deteriorate even when exposed to the l4i environment. This relates to a manufacturing method.

一般に基材上L−Ag又はAg合金を形成したAg被覆
材料は芯材の特性に加えてAg特有の優れた耐食性と半
田付は性を有するため、従来から麺々の用達に用いられ
ている。例えばCu、 Fe、 Ni又はその合金線条
材を基材とし、該&材上に雁さ0Er−10μのAg層
を形成したAffi被榎材料は、基材の機械的強度に加
えてAgの優れた耐食性と半田付は性を有Tる経済的な
馬性能材料として知られておt)、゛4子部品のリード
材や電子*21!i円の専′峨体とし℃広く用いらハて
いる。
In general, Ag coating materials that form L-Ag or Ag alloys on a base material have traditionally been used for noodles because, in addition to the properties of the core material, they have the excellent corrosion resistance and solderability characteristic of Ag. There is. For example, the Affi material has a base material of Cu, Fe, Ni, or alloy wire material, and an Ag layer with a thickness of 0 Er-10 μ is formed on the material. Known as an economical performance material with excellent corrosion resistance and soldering properties, it is also used as lead material for four-piece parts and electronic *21! It is widely used as a specialized body for i-yen.

このようなAg被覆材料を焼鈍処理などの加熱錫mをす
るか、又は高温状態で使用するなど、大気中で、Ai記
環境シニ晒丁と、大気中の酸素がAg層層内部ユニ活発
浸透して基材表Ijj′?酸化し、基材とAg層間の密
看性を低下して半田付は強度の低”Fを招き、1!気接
続の信頼性を損なう欠点がある。特に基材としてCu又
はCu合金を用いた場合には4材がAg膚内に拡散して
Ag被4LVi料の外観を伽なうばかりか、半田付は性
や1[気接触抵抗を著しく損なう欠点があった。従って
、為諷環境に晒され赫11被覆材料では銀層な厚くしな
ければならC1これがAg被覆材料のコストアップの原
因となって1+%b。
When such Ag-coated materials are subjected to a heating process such as annealing, or when used in high-temperature conditions, the oxygen in the atmosphere actively penetrates into the Ag layer. Then, the base material table Ijj′? It oxidizes, reducing the tightness between the base material and the Ag layer, resulting in low soldering strength, which impairs the reliability of the 1! bond.Especially when Cu or Cu alloy is used as the base material. In the case where the 4 material is diffused into the Ag skin, not only does the appearance of the Ag-covered 4LVi material become unsatisfactory, but also soldering has the drawback of significantly impairing the soldering properties and the gas contact resistance. In Ag 11 coating materials, the silver layer must be thicker than C1, which increases the cost of Ag coating materials by 1+%b.

基材5二Cu父はCu合金を用いたAg被覆材料ではA
g層内にCu@が拡散するのt防止するため、基材とA
gll1間にNi父はNi合金からなる中1ン5層を設
けたものが実用化されている。N1又は7ン合金層はC
u等の拡散バリヤーとして作用し、Cu◆がAgjli
の表(iil二進出Tるのを抑えるため、Agjliの
厚さを薄くしてもλg4I11fIL材料の表面品實の
低ドは起らず経済的であるとされている。しかしながら
、NI又はNi合金中間層は、 Cu等の鉱飲を防止す
るも、Ag層内部への酸素の進入を防止することができ
ず、Ag層を通して浸入した#1素l二よりへム又−か
i合金中間層の表面が酸化し、Nム系中+に盾とAg1
mとの密着性を低Fする欠点があった。
The base material 52 is A in Ag coating material using Cu alloy.
In order to prevent Cu@ from diffusing into the G layer, the base material and A
A structure in which the Ni layer is made of a Ni alloy and the Ni layer is provided between the gll1 and the gll1 layer has been put into practical use. N1 or 7 alloy layer is C
Cu◆ acts as a diffusion barrier for Agjli, etc.
Table (iii) In order to suppress the oxidation, even if the thickness of Agjli is reduced, the surface quality of the λg4I11fIL material will not deteriorate and it is said to be economical. However, if NI or Ni alloy Although the intermediate layer prevents mineralization of Cu, etc., it cannot prevent oxygen from entering into the Ag layer, and the #1 element that has penetrated through the Ag layer prevents the #1 alloy intermediate layer from entering through the Ag layer. The surface of is oxidized, and a shield and Ag1 are formed in the N-based system.
There was a drawback that the adhesion with m was low.

性、半田付は性、ぞ1性、41a#触性尋を掘なうこと
のない銀波81材料と、その製造方法を開発したもので
ある。
We have developed a silver wave 81 material that does not dig into the surface of the surface, and a method for manufacturing it.

卸ち1本発明蝦被覆材料は基材上こAg又はAg合金層
を形成したAil!覆財科において、基材とAg父はA
g合金層[CZa父は2n含有量が50%以上のZn合
金からなる中間層を設けたことを特徴とするものである
Wholesale 1 The shrimp coating material of the present invention is an Ail coated material with an Ag or Ag alloy layer formed on the base material! In asset subversion, the base material and Ag father are A.
The g-alloy layer [CZa] is characterized by providing an intermediate layer made of a Zn alloy with a 2n content of 50% or more.

また、本発明銀被覆材料の製造方法は基は上に紹又はM
合金l1lIv形成したAg斂涜財料の製造において、
1&財上にム又はZn含有1−が50%以上のZn合金
を0.01−10μの厚さにメッキした後、M又は紹合
会をメッキすることV*徴とするものである。
Further, the method for producing the silver-coated material of the present invention is described above or M
In the production of Ag detritus formed by the alloy l1lIv,
After plating M or a Zn alloy containing 50% or more of Zn to a thickness of 0.01 to 10 μm on the surface of the V* material, plate M or an introduction plate.

本発明Ag1l榎材料はCmFζNi父はその合金、或
いはCm又はCm合金を被覆した銅覆m財や銅属ムl 
Hk&Hとし、これ等41上に二Zn又はZn含有量が
50%以上の2鳳合金からなる中間層を設け。
The Ag11 material of the present invention is CmFζNi or its alloy, or copper-clad goods or copper metal goods coated with Cm or Cm alloy.
Hk&H, and an intermediate layer made of Zn or a Zn alloy having a Zn content of 50% or more is provided on these 41.

該中間層上にムg又はλg合畿層を形成したもので中間
層には純ムの外、Zn含有量が50%以上のZn−Ni
、 Zm−Cu、Zss−8m、 Zn−Cd等)合金
力Fti イラれ1.匈又はAg合金層としては純AJ
iの外、Ag−Cu。
A Mug or λg joint layer is formed on the intermediate layer, and the intermediate layer contains not only pure Mu but also Zn-Ni with a Zn content of 50% or more.
, Zm-Cu, Zss-8m, Zn-Cd, etc.) Alloy strength Fti Irritation1. Pure AJ is used as a layer or Ag alloy layer.
Outside of i, Ag-Cu.

紹−sb%AH−8e、 AH−飄λg−In等の合金
が用いられている。しかして中t11IIJIIf)J
llさは少なくとも101声以上。
Alloys such as sb%AH-8e and AH-λg-In are used. However, middle school t11IIJIIf)J
There are at least 101 voices.

3、Ojl以下とすることが望ましく、またAg又はA
g合金層の厚さは少なくとも0.1声以上とすることが
望ましい。
3. It is desirable that it be less than Ojl, and Ag or A
It is desirable that the thickness of the g-alloy layer be at least 0.1 tone or more.

このように本発明Ax 11!覆財料は中間層ζ二Zn
父はZn含有量が50%以上の加合金を用いたもので、
All環境シー晒されると大気中のIIM素がAH叉は
Ag合金層の内部に拡散浸透してくるが、Is累は中間
層であるZn又は加合金によって阻止され、基材の酸化
が非常に遅くなる。また中間層から’lrw)一部が基
材とAg又はAg合金層の双方に拡散し、基材内に拡散
したZnは基材構成元素が1父はAg合金層内へ拡散す
るのを阻止するため、λgM6N材料の外観、li!を
良性及び半田付は性4を損なうことがなく、M又はAg
合金層内に拡散したzaは、販−円に均一に分散し、場
内への酸素の拡散を著しく低Fさせるため、中間層の表
面はもとより基材表面や、その内部も酸化されることが
なく、Ag又はAg層の密着性を損なうようなことがな
い。
In this way, the present invention Ax 11! The fee for subverting the property is for the middle class ζ2Zn
My father used a filler alloy with a Zn content of 50% or more.
When exposed to an All environmental sea, IIM elements in the atmosphere diffuse into the AH or Ag alloy layer, but Is elements are blocked by the intermediate layer of Zn or additive alloy, and the oxidation of the base material is extremely severe. Become slow. In addition, some of the Zn from the intermediate layer diffuses into both the base material and the Ag or Ag alloy layer, and the Zn diffused into the base material prevents the constituent elements of the base material from diffusing into the Ag alloy layer. Therefore, the appearance of λgM6N material, li! The benign and soldering does not damage the property 4, M or Ag
The za diffused into the alloy layer is uniformly dispersed in the sales circle and significantly reduces the diffusion of oxygen into the field, so that not only the surface of the intermediate layer but also the surface of the base material and its interior may be oxidized. There is no possibility of impairing the adhesion of Ag or the Ag layer.

−しかして中間層の厚さt−o、oi〜3o声としたの
は0.01μ未満では上記効果が充分でなく、またa、
oμ憎えでもより入きな効果が期待できず、使用条件−
によっては過剰のZfiがAg yta hに拡散して
Agの外観な損なうようじなるため望ましくない。また
中間層を純Zn又はh含有量が50%以上のZn合金で
形成したのは、Za含育量が50%未満の7.n合金で
は上記効果が有効に発揮できず、たとえ発揮できたとし
ても厚い中tmmが必要とな11.実用上不経済である
-However, the reason why the thickness of the intermediate layer is set to 0, oi to 3o is that if it is less than 0.01μ, the above effect is not sufficient, and a,
Even if you hate it, you can't expect a stronger effect, and the conditions of use -
In some cases, excessive Zfi may diffuse into Ag ytah, which may impair the appearance of Ag, which is undesirable. Moreover, the intermediate layer was formed of pure Zn or a Zn alloy with an h content of 50% or more because 7. with a Za content of less than 50%. 11. The above effects cannot be effectively achieved with n alloys, and even if they could be achieved, a thick medium tmm would be required. It is practically uneconomical.

このような本発明Ag被覆材料は次のようにして造られ
る。抑ち、基材上にクラッド法、メッキ法等≦=よ11
7.n又はZn合金からなる中間層と、その上に、匂又
は1合1ItJlを形成して造ることもできるが、特に
基材を通常の手段により脱脂、活性化した債、基材上に
Zm父は7.o合*t/鑞気メッキ又は化学メッキし、
その上6二連続してAg又はAg合金t−電気メッキ又
は化学メッキすることが最適である。
Such an Ag-coated material of the present invention is produced as follows. Pressure, cladding method, plating method, etc. on the base material ≦=Yo11
7. It can also be made by forming an intermediate layer made of Zn or Zn alloy and Zn or Zn alloy thereon. is 7. o*t/Brazed plating or chemical plating,
Furthermore, six consecutive Ag or Ag alloy t-electroplatings or chemical platings are optimal.

以丁、本発明を実施例について説明する。The present invention will now be described with reference to embodiments.

実施例(1ン 直径0.6謳の純Cm線を通続的に供給し、これを巻き
取るライン上に下記処理槽を設け、順次通過させて連続
的に処理し、Cm纏上C二厚さOD5声のZnをメッキ
した後、犀さ1.s声のbvメッキして本発明Ag被a
lcuilt−製造した。
Example (A pure Cm wire with a diameter of 0.6 mm is continuously supplied, and the following treatment tank is installed on the line that winds it up, and the Cm wire is passed through it one after another to be continuously treated. After plating Zn with a thickness of OD 5, it was plated with BV of 1.s and then coated with Ag of the present invention.
lcuilt-manufactured.

(1)カソード脱脂槽   NaOH209/1電魔密
If  IQVdm寓 処理時間 io秒 (2)水洗槽   林 処理時1155秒 (3)M洗槽   HI304 100#/7処通時l
ll5秒 (4)水 洗槽     清水 処理時間 5秒 (51Zfl j ’j+槽      ZuCN  
 601/INaCH401/I Nap!(BoVl iE流密If  IA/am宜 処理時間 20秒 (6)水洗槽      清水 処理時間 5秒 (7)ムgストライクツツキ槽  AgCN    3
1/IK CN   4011/1 電流密度 10A/dm! %J!!1時間 3秒 (8)Agメッキ槽     AgCN  501/I
KCN   100N/j 電流密11”  3A/dm” 処理時間  55秒 (謝水洗槽      清水 処理時間 10秒゛ αQ乾燥 実施例(り 実施例(1)において(51のZaメッキ時間を廷長し
、Cu線上孟二厚さα5戸のムをメッキした後、厚さ1
5声のAltメブキして本発明Ag披潰Cu線を!1造
しも実施例<31 実施例(りと同様こして、Cu線上に厚さ1.0声の7
、yaをメッキした後、厚さ1.5声のAgをメッキし
て本発明ムg被覆Cu線を製造した。
(1) Cathode degreasing tank NaOH209/1 Denmaku If IQVdm treatment time io seconds (2) Washing tank 1155 seconds when processing Hayashi (3) M washing tank HI304 100#/7 times l
ll 5 seconds (4) Water washing tank Clean water processing time 5 seconds (51Zfl j 'j + tank ZuCN
601/INaCH401/I Nap! (BoVl iE flow tight If IA/am processing time 20 seconds (6) Washing tank Clean water processing time 5 seconds (7) Mug strike wood tank AgCN 3
1/IK CN 4011/1 Current density 10A/dm! %J! ! 1 hour 3 seconds (8) Ag plating tank AgCN 501/I
KCN 100N/j Current density 11"3A/dm" Treatment time 55 seconds (washing tank Clear water treatment time 10 seconds) After plating a layer with a thickness of α5 on the line, a thickness of 1
5-voice Alt Mebuki and the present invention Ag show Cu line! 1. Example <31 Example (Similarly to ri, strain 7 on the Cu wire with a thickness of 1.0
, ya, and then plated with 1.5 tones of Ag to produce a mug-coated Cu wire of the present invention.

実施411+(転) 実施例(11において(5)のZKIメッキ槽に代えて
、ド記Zn−Ni合金メッキ槽を設け、Cu線上に厚さ
0.1声のZn−N4合1it(Znn含有的約70%
をメッキした後。
Implementation 411+ (conversion) In Example (11), a Zn-Ni alloy plating tank was provided in place of the ZKI plating tank in (5), and 1 it of Zn-N4 alloy (containing Zn) with a thickness of 0.1 was coated on the Cu wire. Approximately 70%
After plating.

厚さ1.5声のAgをメッキして本発明AgM覆Cu線
を製造した。
An AgM-covered Cu wire of the present invention was manufactured by plating Ag with a thickness of 1.5 tones.

Za−Ni合金メッキ槽  Nゑ804−6H,018
ON/jZn80.・7H,0809/1 為B0.     301/l N1(4C1101/1 浴1m        50”C 電流密#flA/dfn1 処理時i1     30秒 実施例(5) 実施N(11において(8)のAgメッキ槽に代えて、
F記のAg −8b合金メッキ槽を設け、 Cu線上に
厚さ0.05声のムをメッキした後、厚さ1.5μのA
g−8b合金(8b含有量約2%)をメッキして本発明
Ag舎金被覆Cu線4/11遺した。
Za-Ni alloy plating tank N804-6H, 018
ON/jZn80.・7H, 0809/1 Tame B0. 301/l N1 (4C1101/1 bath 1m 50"C current density #flA/dfn1 processing time i1 30 seconds Example (5) Example N (in 11, in place of the Ag plating bath in (8),
A Ag-8b alloy plating bath described in F was installed, and after plating a 0.05μ thick layer on the Cu wire, a 1.5μ thick layer was plated on the Cu wire.
The Ag-coated Cu wire 4/11 of the present invention was plated with G-8B alloy (8B content: about 2%).

Ag−8b合金メッキ4f  AzCN   121/
IK CN   401/1 酒石酸アンチモニルカリ  251/l1酒石酸カツウ
ムナトリウム 2’d/11EtIL密度      
 4A/dm”処理時間       40秒 比較例(l 実施III filこおいて間のZaメッキ槽り二おけ
るZnメッキ11則を短縮し、C種線上に厚さα005
μのznなメッキしたIl、厚さ1.5声のAg?メ゛
ツキしてAg被覆Cl1llVIlltした。
Ag-8b alloy plating 4f AzCN 121/
IK CN 401/1 Antimonyl Potassium Tartrate 251/l1 Potassium Sodium Tartrate 2'd/11 EtIL Density
4A/dm" processing time 40 seconds Comparative example (I) Shorten the 11th rule of Zn plating in the Za plating tank 2 between fil and the thickness α005 on the C type line.
μ's zn plated Il, thickness 1.5 tone Ag? It was plated and coated with Ag.

比較例(り 実施例tl)におい1問のZnメッキ槽≦二おけるZn
メッキ時間を延長し、CIII線上(二厚さ4.0声の
Znをメッキした後、厚さLJ声のムg4−メッキして
Ag被ru線をl1jlした。
Comparative example (example tl) Zn plating tank in one question ≦ Zn in two tanks
The plating time was extended, and after plating Zn with a thickness of 4.0 mm on the CIII wire (2), g4-plating with a thickness of LJ was applied, and the Ag coated RU wire was plated with l1jl.

比較例(31 実施例(11において(四の2膳メッキ槽C二代えて下
記tnZn−Cu合金/ffキ槽tl−設け、Cu1I
IA上に犀さ0.1μのZllシー舎金合金IIIl含
有量約30%)即ち黄銅をメッキした後、厚さLs声の
Agをメッキしてλg被覆Cu線t−製造した。
Comparative Example (31) In Example (11), the following tnZn-Cu alloy/ff plating tank tl- was provided instead of the two plating tank C (4), Cu1I
After plating a Zll metal alloy III (containing about 30%), that is, brass with a thickness of 0.1 μm on IA, plated with Ag having a thickness of Ls, a λg coated Cu wire was produced.

Zn−Cu合金メフキ槽  Cu CN   301/
IZn(CN)、  lOg/l NaCN    501/I Na、C0,3011/1 浴温  301/1 処理時間  30秒 比較例(4) 実施例+11において(5)のZnメッキ槽に代えてF
記の処理楕を設け、CM線上に厚さく15μのへivメ
ッキした後、厚さ1.5μのAgをメッキしてAg彼櫨
Cu線を!g1!遺した。
Zn-Cu alloy mesh tank Cu CN 301/
IZn (CN), lOg/l NaCN 501/I Na, C0,3011/1 Bath temperature 301/1 Treatment time 30 seconds Comparative example (4) In Example + 11, instead of the Zn plating bath in (5), F was used.
After providing the treatment ellipse described above and IV plating to a thickness of 15μ on the CM wire, we plated Ag to a thickness of 1.5μ to create an Ag-Cu wire! g1! I left it behind.

Ni ) ッ* 槽Ni 80.  2+01/lN1
Cj、    501i//1 に4 s BOs    30 &/j1[fl’m 
K    5 A/d m !Ii&!通時1′&13
0秒 比較例(5) 実施例(11において(5)のZnメッキ槽を省略し 
C。
Ni ) * Tank Ni 80. 2+01/lN1
Cj, 501i//1 to 4 s BOs 30 &/j1[fl'm
K 5 A/d m! Ii&! Diachronic 1′ & 13
0 second comparative example (5) Example (in 11, the Zn plating bath in (5) was omitted)
C.

線上に直接厚さ1.5声のAg VメッキしてAg被榎
Cu線を製造した。
Ag coated Cu wire was manufactured by directly plating Ag V to a thickness of 1.5 tones on the wire.

比較例(Q 比較例(5)において(8)のメッキ時間を約2倍にし
、Cm線上t−直播厚さ10μのAgをメッキしてAg
被覆CII線を製造した。
Comparative Example (Q) In Comparative Example (5), the plating time of (8) was approximately doubled, and Ag was plated with a thickness of 10μ directly on the Cm line.
A coated CII wire was produced.

これ等の各ムgl[ff1clI4@lについて、ダイ
オード組立工程を模してル気流中、310℃のm度で1
5分間加熱し、次いで大気中、250℃の!!イで10
時間加熱し、各加熱逃場後に270“Cの温度(二保持
した共晶へンダ浴中に5秒間ディプして半田付WIt−
目視により比較した。また上記両加熱処理後の線につい
て、クール長さ16υ腸で80回捻回し、Ag被膜の剥
離状sv比較してλg層の#g肴性を調べた。これ等の
結果′4fl1表に示す。
For each of these modules gl
Heat for 5 minutes, then in air at 250°C! ! 10 in A
solder by dipping for 5 seconds into a eutectic solder bath held at a temperature of 270"C (270"C after each heating release).
Comparison was made visually. In addition, the wires after both of the above heat treatments were twisted 80 times with a cool length of 16υ, and the #g appetizing properties of the λg layer were examined by comparing the peeling pattern sv of the Ag coating. These results are shown in Table '4fl1.

1%1表中山気流中110℃の温度で15分間加熱は8
4 fツブの半田付けに相当し、大気中250℃の温度
で10時間加熱はモールド処理に相当し、それぞれダイ
オード組立時と組立後の半田付は性や密着性を示Tもの
で、41表から明らかなようC二、本発明Agl覆Cu
線は何れもSiチップの半田付けにおいて90%嵐上の
半田付は性を示し、ダイオード組立後の半田付は性とA
g被膜の密#制;優れていることが判る。
1% 1 table Heating at a temperature of 110℃ for 15 minutes in Nakayama airflow is 8
This corresponds to soldering a 4F tube, and heating in the atmosphere at a temperature of 250°C for 10 hours corresponds to molding.Soldering during and after assembly of the diode indicates the properties and adhesion, respectively, and Table 41 As is clear from C2, the present invention Agl override Cu
Both lines indicate the quality of soldering on a 90% storm when soldering a Si chip, and the quality and A of soldering after assembling a diode.
g. Denseness of the film: It is found that it is excellent.

これに対しZn中間層の厚さを0.005μとした比較
例(1)及び4.0μとした比較例(2)、更にZn中
間層として7.n含有量が30%のZn−Cu合金をメ
ッキした比較例(3)のAg被覆Cu@では何れも半田
付は性が劣化しており、特に比較例(1)及び(3)の
Ag4Bt榎l線ではムgii6[の密着性が着しく低
ドしていることが判る。比較例(21で嬬zn過嵐のた
め黄色への変色が見られた。
On the other hand, there is a comparative example (1) in which the thickness of the Zn intermediate layer is 0.005 μm, a comparative example (2) in which the thickness of the Zn intermediate layer is 4.0 μm, and a further Zn intermediate layer with a thickness of 7.0 μm. Comparative Example (3), Ag-coated Cu@, which was plated with Zn-Cu alloy with an n content of 30%, had poor solderability, especially Ag4Bt Enoki of Comparative Examples (1) and (3). It can be seen that the adhesion of Mugii6 is significantly low in the I-ray. Comparative Example (21) showed discoloration to yellow due to overstorm.

また中間層にNiを用いた比較例(4)のλgM!覆C
u線では大気中の加11&(二より、NI中闇層が酸化
し、Ag被膜の密着が著しく劣化するばかりか、半田付
は性も著しく低Fしており、史≦二中間層を用いること
なくII接Cu線上にAg 4/被覆した比較例(5L
(6)においてもCuの酸化によりAg?jI膜の密着
性反び半田付は性が著しく低下してお舎1.厚さ3声程
度のAgH覆ではなお不充分であることが判る。
Moreover, λgM! of Comparative Example (4) using Ni in the intermediate layer! Cover C
In the case of U-rays, the dark layer in the atmosphere is oxidized, and not only does the adhesion of the Ag film deteriorate significantly, but also the soldering properties are extremely low F. Comparative example (5L
Also in (6), Ag? due to oxidation of Cu? The adhesion of the jI film warped, and the soldering properties were significantly reduced. It can be seen that an AgH cover with a thickness of about 3 tones is still insufficient.

尚、以上の例は比較的l&温の加熱であるが、より低温
の加熱では比較例(2)によるAg被覆Cu線でもZs
がムg鳩の表面に過剰に拡散Tることがなく実用的であ
り得ることは前記の通りである。また以上の説明は何れ
も@Ml二ついて説明したがこれに限るものではなく、
板材1条蒋、tj:!材寺についても全く同様の結果が
得られるものである。
Note that the above examples involve heating at a relatively low temperature, but when heating at a lower temperature, Zs
As mentioned above, it can be practically used without excessively diffusing on the surface of mug pigeons. In addition, all of the above explanations were explained using two @Ml, but they are not limited to this.
Board material 1 row Chiang, tj:! Exactly the same results can be obtained for material temples.

このように大気中でi1%潟に晒されるAg*ff1l
Nには少なくとも厚さ5声以上のAge覆が必要とされ
ていたが、本発明によれば、zn又はZo合被からなる
中間層を設けることl二より、薄いλg被被覆はるかに
優れた特性が得られるもので、雀Agの点からも優れて
おり、工業上顕著な効果を奏するものである。
Ag*ff1l exposed to i1% lagoon in the atmosphere in this way
N requires an Age coating with a thickness of at least 5 tones, but according to the present invention, a thin λg coating is far superior to providing an intermediate layer made of Zn or Zo coating. It is superior in terms of sparrow Ag, and has remarkable industrial effects.

491−491-

Claims (2)

【特許請求の範囲】[Claims] (1)基材上ニAg父)1ig合金mv形成t、、りA
gm覆材料において、基材とAg父はAg合金層間にZ
n父)IZn含有社が50%比上のZn合象からなる中
間層を設けたことを特徴とする銀被覆材料。
(1) 1ig alloy mv formation on the base material, ri A
In GM-covered materials, the base material and the Ag parent have Z between the Ag alloy layers.
A silver-coated material characterized in that the IZn-containing company provides an intermediate layer consisting of 50% or more Zn compound.
(2)中間層の厚さ’&0.01〜3.0μとTる特許
請求の範囲第1項記載の銀被覆材料。 (31基材上i二Ag又はAg合金層を形成したAg被
覆材料の製造において基材上にZn又はZn含有盪が5
0%以上のZn合逮を0.01〜3.0μの厚さにメッ
キした後Ag父はAg合金メッキをメッキTることな特
徴とてる銀被覆材料の製造方法。
(2) The silver-coated material according to claim 1, wherein the thickness of the intermediate layer is 0.01 to 3.0μ. (31) In the production of an Ag coating material in which an Ag or Ag alloy layer is formed on a substrate, Zn or a Zn-containing layer is
A method for producing a silver-coated material having the following characteristics: Zn alloy plating of 0% or more is plated to a thickness of 0.01 to 3.0μ, and then Ag alloy plating is applied.
JP5512082A 1982-04-02 1982-04-02 Silver coating material and preparation thereof Granted JPS58181888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5512082A JPS58181888A (en) 1982-04-02 1982-04-02 Silver coating material and preparation thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5512082A JPS58181888A (en) 1982-04-02 1982-04-02 Silver coating material and preparation thereof

Publications (2)

Publication Number Publication Date
JPS58181888A true JPS58181888A (en) 1983-10-24
JPH0241591B2 JPH0241591B2 (en) 1990-09-18

Family

ID=12989891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5512082A Granted JPS58181888A (en) 1982-04-02 1982-04-02 Silver coating material and preparation thereof

Country Status (1)

Country Link
JP (1) JPS58181888A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS601853A (en) * 1983-06-17 1985-01-08 Hitachi Cable Ltd Leadframe for semiconductor
JPS60201651A (en) * 1984-03-26 1985-10-12 Hitachi Cable Ltd Lead frame for semiconductor
US6593643B1 (en) * 1999-04-08 2003-07-15 Shinko Electric Industries Co., Ltd. Semiconductor device lead frame
JP2009079250A (en) * 2007-09-26 2009-04-16 Dowa Metaltech Kk Copper or copper alloy member having silver alloy layer formed as outermost surface layer, and manufacturing method therefor
JP2013093228A (en) * 2011-10-26 2013-05-16 Fujikura Ltd Connector and manufacturing method therefor, and plating method of silver
JP2014164970A (en) * 2013-02-24 2014-09-08 Furukawa Electric Co Ltd:The Terminal, terminal material and production method therefor and method of manufacturing terminal using the same
WO2021181901A1 (en) * 2020-03-09 2021-09-16 Dowaメタルテック株式会社 Silver-plated material and method for manufacturing same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS601853A (en) * 1983-06-17 1985-01-08 Hitachi Cable Ltd Leadframe for semiconductor
JPH0519820B2 (en) * 1983-06-17 1993-03-17 Hitachi Densen Kk
JPS60201651A (en) * 1984-03-26 1985-10-12 Hitachi Cable Ltd Lead frame for semiconductor
JPH0512858B2 (en) * 1984-03-26 1993-02-19 Hitachi Densen Kk
US6593643B1 (en) * 1999-04-08 2003-07-15 Shinko Electric Industries Co., Ltd. Semiconductor device lead frame
JP2009079250A (en) * 2007-09-26 2009-04-16 Dowa Metaltech Kk Copper or copper alloy member having silver alloy layer formed as outermost surface layer, and manufacturing method therefor
JP2013093228A (en) * 2011-10-26 2013-05-16 Fujikura Ltd Connector and manufacturing method therefor, and plating method of silver
JP2014164970A (en) * 2013-02-24 2014-09-08 Furukawa Electric Co Ltd:The Terminal, terminal material and production method therefor and method of manufacturing terminal using the same
WO2021181901A1 (en) * 2020-03-09 2021-09-16 Dowaメタルテック株式会社 Silver-plated material and method for manufacturing same
EP4083271A4 (en) * 2020-03-09 2024-01-17 Dowa Metaltech Co Ltd Silver-plated material and method for manufacturing same

Also Published As

Publication number Publication date
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