JPS5818149B2 - Cleaning equipment for screen residue, dirt, etc. - Google Patents

Cleaning equipment for screen residue, dirt, etc.

Info

Publication number
JPS5818149B2
JPS5818149B2 JP53084175A JP8417578A JPS5818149B2 JP S5818149 B2 JPS5818149 B2 JP S5818149B2 JP 53084175 A JP53084175 A JP 53084175A JP 8417578 A JP8417578 A JP 8417578A JP S5818149 B2 JPS5818149 B2 JP S5818149B2
Authority
JP
Japan
Prior art keywords
screen
cleaning
screen residue
tank
residue
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53084175A
Other languages
Japanese (ja)
Other versions
JPS5511044A (en
Inventor
高橋誠二
今村好信
伏尾正則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Kiden Kogyo Ltd
Original Assignee
Hitachi Kiden Kogyo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kiden Kogyo Ltd filed Critical Hitachi Kiden Kogyo Ltd
Priority to JP53084175A priority Critical patent/JPS5818149B2/en
Publication of JPS5511044A publication Critical patent/JPS5511044A/en
Publication of JPS5818149B2 publication Critical patent/JPS5818149B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は下水処理場やポンプ場等に設置されたスクリー
ンにて捕獲されたスクリーン渣や下水沈砂池にて沈澱し
た汚砂等を連続的に洗滌処理する装置に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for continuously cleaning screen sludge captured by screens installed in sewage treatment plants, pumping stations, etc., and sludge settled in sewage settling basins. It is.

即ち、本発明は傾きの変更可能で、その−き□によって
槽内に貯溜する水の一部が切れて渇水状態を現出させう
るようなしたるスクリーン渣汚砂等の洗滌処理槽と、こ
の洗滌処理槽のスクリーン渣。
That is, the present invention provides a cleaning treatment tank for screen residue, sewage, etc., whose inclination can be changed and whose tilt can cut off a portion of the water stored in the tank, causing a drought condition; Screen residue from this cleaning treatment tank.

汚砂等の投入口に予じめ粗ごみを除去すべく設けたるス
クリーンと、上記処理槽内に、投入されるスクリーン渣
、汚砂等を移送せしめる移送手段と、この移送時水中の
又は渇水状態にあるスクリーン渣、汚砂等に直接高圧流
体を噴射し、脆弱な有機物を破砕、洗滌する洗滌ノズル
とを具備せしめてなるスクリーン渣汚砂等の洗滌処理装
置を特徴とするものである。
A screen installed in advance to remove bulky waste at the input port for waste sand, etc., a transfer means for transferring the screen residue, waste sand, etc. to be introduced into the treatment tank, and a screen installed in advance to remove coarse garbage at the input port for waste sand, etc.; The present invention is characterized by a cleaning treatment device for screen residue, waste sand, etc., which is equipped with a washing nozzle that injects high-pressure fluid directly onto the screen residue, waste sand, etc. in a state, and crushes and washes fragile organic matter.

一般に下水処理場やポンプ場で下水中に含まれるごみは
スクリーンにて除去され、このスクリーン渣を投棄場所
等の処理編へ搬入し、ここで適当な処理がなされている
Generally, garbage contained in sewage at a sewage treatment plant or pumping station is removed using a screen, and the screen residue is transported to a treatment facility such as a dumping site, where it is appropriately treated.

然しこの除去されたスクリーン渣はヘドロ状ノ物質、人
糞その地回溶性の有機物が多く含まれ、刊含水率も非常
に高い。
However, this removed screen residue contains a lot of sludge-like substances, human excrement, and other soil-soluble organic matter, and has a very high moisture content.

又沈澱池で回収されるスカムも同様である。The same applies to scum collected in sedimentation ponds.

従ってこのようなスクリーン渣成いはスカム汚砂等を処
理場まで運搬する場合、汚水が運送途中に滴下したり悪
臭が発生したりして不衛生であると共にこれを埋立処理
する際にも汚水が地下水や河川へ流出し公害の起因とも
なる。
Therefore, when transporting such screen residue, scum, etc. to a treatment plant, the sewage drips during transportation and generates a bad odor, which is unsanitary. It also leaks into groundwater and rivers, causing pollution.

又焼却処理を行う場合には含水率が高いため焼却が困難
であると共に焼却費が高価となる。
In addition, when incineration is performed, it is difficult to incinerate because of the high moisture content, and the incineration cost is high.

さらにスクリーン渣或いはスカムの投棄場所もその悪臭
等のため都市近くで見つけ出すことは困難である等数々
の欠点がある。
Furthermore, there are many drawbacks, such as the fact that it is difficult to find a dumping site for screen residue or scum near a city due to its foul odor.

本発明はこれに鑑みてなしたものである。The present invention has been made in view of this.

以下本発明を実施例に基づいて説明する。The present invention will be explained below based on examples.

ポンプ場、下水処理場のスクリーン等にて除去されたス
クリーン渣或いは沈澱池より回収されたスカム及び下水
沈砂池に沈澱した汚砂(以下スクリーン渣等と略称する
)をコンベア等の搬送手段1を介して洗滌処理槽2へ搬
送せしめる。
The screen sludge removed by the screens of pumping stations, sewage treatment plants, etc., the scum collected from the sedimentation pond, and the scum settled in the sewage sedimentation basin (hereinafter abbreviated as screen sludge, etc.) are conveyed through a conveyor 1 such as a conveyor. The water is transported to the cleaning treatment tank 2 through the cleaning treatment tank 2.

そしてこのスクリーン渣等を洗滌処理槽2へ投入前に、
スクリーンを設は粗ごみを予じめ除去しておく。
Before putting this screen residue etc. into the cleaning treatment tank 2,
Before setting up a screen, remove bulky waste beforehand.

この搬入は洗滌槽の処理能力に応じて間歇的もしくは連
続的に行うものである。
This delivery may be carried out intermittently or continuously depending on the processing capacity of the washing tank.

この洗滌処理槽2は軸9により支持されて、この軸を中
心として俯仰できるようなっているから、槽の傾斜は変
更可能である。
This cleaning treatment tank 2 is supported by a shaft 9 and can be raised or raised about this shaft, so that the inclination of the tank can be changed.

又槽内には搬入されたスクリーン渣等を洗滌しつつ移送
するためスクリューコンベア、掻寄板付チェーンコンベ
ア、その他槽内のスクリーン渣等をその一端より他端へ
移送できる移送手段3としてスクリューコンベアを設け
る。
In addition, a screw conveyor, a chain conveyor with a scraper plate, and a screw conveyor are used as transfer means 3 that can transfer the screen residue, etc. in the tank from one end to the other in order to transfer the screen residue, etc. carried into the tank while washing it. establish.

この洗滌処理槽2は洗滌に必要な時間の滞溜を行わせる
ように所要の長さを有し、且図示の如く洗滌後のスクリ
ーン渣等の排出側が高くなっているため、処理槽内の水
は槽の途中から切れて渇水状態が現出なっている。
This cleaning treatment tank 2 has a required length to allow the cleaning to be retained for the necessary time, and as shown in the figure, the discharge side of the screen residue etc. after cleaning is raised, so that the inside of the treatment tank is The water has run out in the middle of the tank, creating a drought situation.

そして洗滌水は低位側で排水するように傾斜をつけた密
閉式となっているので防臭効果を得るものである。
Since the washing water is of a closed type with a slope so that it drains on the lower side, it has a deodorizing effect.

移送手段3は槽上部又は適当な位置に設置された駆動装
置4にて駆動される。
The transfer means 3 is driven by a drive device 4 installed at the top of the tank or at an appropriate position.

又この洗滌処理槽の移送手段3より上方位置に洗滌ノズ
ル5を設は槽内を移送されるスクリーン渣等に直接上記
ノズル5,5・・・・・・より洗滌水又は空気等の高圧
流体を噴射し洗滌せしめる。
In addition, a cleaning nozzle 5 is installed above the transfer means 3 of the cleaning treatment tank, and the cleaning water or high-pressure fluid such as air is directly applied to the screen sludge transferred in the tank from the nozzles 5, 5... Spray it to cleanse it.

特に前述のように槽の後位に渇水状態が出ているため、
ここで洗滌されることは水中でノズルの被洗に比して極
めて高い洗滌が行われることになる。
In particular, as mentioned above, there is a drought situation at the rear of the tank,
The cleaning performed here means that cleaning is performed at a much higher level than when the nozzle is washed underwater.

この洗滌用高圧流体の噴射は所要の圧力にて行うもので
、この洗滌ノズル5は槽外より導かれほぼ槽の全長もし
くは部分的に亘り配管した洗滌用高、圧流体供給管6に
所要ピッチを以て多数穿設し。
This injection of high-pressure cleaning fluid is carried out at a required pressure, and the cleaning nozzle 5 is guided from outside the tank and is connected to a cleaning height and pressure fluid supply pipe 6 that is piped over almost the entire length or part of the tank at a required pitch. A large number of holes were drilled.

そしてこの高圧噴射流体にて脆弱な有機物を破砕する。This high-pressure jetting fluid then crushes fragile organic matter.

而して上述の如く構成する洗滌処理槽を、下水処理場等
の除塵機等により掻きあげられたスクリーン渣を搬出す
るライン上に設置しベルトコンベア等により予じめ粗ご
みをスクリーン7にて除去したのち洗滌処理槽の下部に
投入されたスクリ−ン渣等は、移送手段3の軸につけら
れたスクリュー羽根の回転により前止りに傾斜せしめた
洗滌処理槽内を移送されながら同時に洗滌処理槽内に設
けられた洗滌用高圧流体供給管につけたノズルより噴射
する高圧流体により破砕、攪拌洗滌されつつ槽の傾斜を
利して槽の排出側へ水切りを行いつつ移送される。
The cleaning tank configured as described above is installed on the line that carries out the screen residue scraped up by a dust remover, etc. at a sewage treatment plant, etc., and the bulky waste is preliminarily removed from the screen 7 by a belt conveyor or the like. After being removed, the screen residue, etc. placed in the lower part of the cleaning tank is transferred through the cleaning tank, which is tilted to the front end by the rotation of the screw blade attached to the shaft of the transfer means 3, and is simultaneously transferred to the cleaning tank. They are crushed, agitated and washed by high pressure fluid sprayed from a nozzle attached to a high pressure cleaning fluid supply pipe provided inside, and are transferred to the discharge side of the tank while draining using the slope of the tank.

スクリーン渣等はスクリュー羽根により囲まれているの
で高圧水による飛散を防止でき確実に洗滌されると共に
、またこのスクリュー羽根による強制移送のため、スク
リーン渣等のショートパスはなく、また洗滌に要する滞
溜時間を確実にとれるので洗滌むらがなく連続処理が可
能である。
Since the screen sludge is surrounded by the screw blades, it is prevented from being splashed by high-pressure water and is washed reliably. Also, because the screen sludge is forcibly transferred by the screw blades, there is no short path for the screen sludge, and there is no stagnation required for cleaning. Continuous processing is possible without uneven washing because the accumulation time is ensured.

そしてスクリュー羽根により移送されつつ洗滌された上
部よりの洗滌後のスクリーン渣等を、また下部より洗滌
水を個別に排出し排出されたスクリーン渣等は検出口部
に設けたドラムスクリーン等によりさらに固液分離を行
うものである。
The screen sludge, etc. after washing from the upper part, which was washed while being transferred by the screw blade, and the screen sludge, etc. discharged from the lower part after the washing water was discharged separately, are further solidified by a drum screen installed at the detection port. It performs liquid separation.

本発明によるときは密閉した洗滌処理槽内をスクリーン
渣等を移送せしめつつ上方又は側方より高圧で洗滌用の
高圧流体を噴射してスクリーン渣等に直接かけるように
しているため悪臭を放つスクリーン渣等でもその洗滌破
砕処理の際、槽外へ悪臭を放つことがなく、シかも周囲
に飛散することなく連続的に確実に処理できる利点があ
る。
According to the present invention, while the screen residue, etc. is transferred inside the closed cleaning treatment tank, high-pressure cleaning fluid is injected at high pressure from above or from the side, and is sprayed directly onto the screen residue, etc., which causes a foul odor to be removed from the screen. When washing and crushing residue, etc., there is an advantage that no foul odor is released outside the tank, and the residue can be treated continuously and reliably without scattering to the surroundings.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明装置の概略を示す縦断正面図。 麻2図は同側面図である。 1・・・・・・搬送手段、2・・・・・・洗滌処理槽、
3・・・・・・移送手段、4・・・・・・駆動装置、5
・・・・・・洗滌ノズル、6・・・・・・洗滌水供給管
、7・・・・・・粗ごみ除去用のスクリーン、8・・・
・・・固液分離手段。
FIG. 1 is a longitudinal sectional front view schematically showing the apparatus of the present invention. Figure 2 is the same side view. 1...Transportation means, 2...Washing treatment tank,
3... Transfer means, 4... Drive device, 5
...Washing nozzle, 6...Washing water supply pipe, 7...Screen for removing coarse dirt, 8...
...Solid-liquid separation means.

Claims (1)

【特許請求の範囲】 1 傾きの変更可能で、その傾きによって槽内に貯溜す
る水の一部が切れて渇水状態を現出させうるようなした
るスクリーン渣汚砂等の洗滌処理槽と、この洗滌処理槽
のスクリーン渣、汚砂等の投入口に予じめ粗ごみを除去
すべく設けたるスクリーンと、上記処理槽内に、投入さ
れるスクリーン渣、汚砂等を移送せしめる移送手段と、
この移送時水中の又は渇水状態にあるスクリーン渣、汚
砂等に直接高圧流体を噴射し、脆弱な有機物を破砕。 洗滌する洗滌ノズルとを具備せしめてなるスクリーン渣
汚砂等の洗滌処理装置。
[Scope of Claims] 1. A cleaning treatment tank for dripping screen residue, sewage, etc. whose inclination can be changed, and the inclination can cut off part of the water stored in the tank and cause a drought condition; A screen is provided in advance to remove coarse garbage at the input port for screen residue, dirty sand, etc. of the cleaning treatment tank, and a transfer means for transferring the screen residue, dirty sand, etc. to be input into the treatment tank. ,
During this transfer, high-pressure fluid is injected directly onto screen residue, sludge, etc. that are underwater or in a dry state, crushing fragile organic matter. A cleaning treatment device for screen residue, dirt, etc., which is equipped with a cleaning nozzle for cleaning.
JP53084175A 1978-07-10 1978-07-10 Cleaning equipment for screen residue, dirt, etc. Expired JPS5818149B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53084175A JPS5818149B2 (en) 1978-07-10 1978-07-10 Cleaning equipment for screen residue, dirt, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53084175A JPS5818149B2 (en) 1978-07-10 1978-07-10 Cleaning equipment for screen residue, dirt, etc.

Publications (2)

Publication Number Publication Date
JPS5511044A JPS5511044A (en) 1980-01-25
JPS5818149B2 true JPS5818149B2 (en) 1983-04-11

Family

ID=13823144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53084175A Expired JPS5818149B2 (en) 1978-07-10 1978-07-10 Cleaning equipment for screen residue, dirt, etc.

Country Status (1)

Country Link
JP (1) JPS5818149B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105478663A (en) * 2016-02-14 2016-04-13 丁启民 Device and method for recovering used sodium silicate sand for casting

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3808240C1 (en) * 1988-03-09 1989-07-27 Esk-Verarbeitung Inh. Michael Kasischke, 1000 Berlin, De Method and installation for gravel washing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51150876A (en) * 1975-06-19 1976-12-24 Shin Meiwa Ind Co Ltd Dust washing apparatus
JPS533111A (en) * 1976-06-30 1978-01-12 Japan Radio Co Ltd Sweep signal generator using modulated wave

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50157568U (en) * 1974-06-13 1975-12-26

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51150876A (en) * 1975-06-19 1976-12-24 Shin Meiwa Ind Co Ltd Dust washing apparatus
JPS533111A (en) * 1976-06-30 1978-01-12 Japan Radio Co Ltd Sweep signal generator using modulated wave

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105478663A (en) * 2016-02-14 2016-04-13 丁启民 Device and method for recovering used sodium silicate sand for casting

Also Published As

Publication number Publication date
JPS5511044A (en) 1980-01-25

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