JPS58173609A - Cutter for thin piece - Google Patents

Cutter for thin piece

Info

Publication number
JPS58173609A
JPS58173609A JP5530182A JP5530182A JPS58173609A JP S58173609 A JPS58173609 A JP S58173609A JP 5530182 A JP5530182 A JP 5530182A JP 5530182 A JP5530182 A JP 5530182A JP S58173609 A JPS58173609 A JP S58173609A
Authority
JP
Japan
Prior art keywords
blade
section
cut
cutting
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5530182A
Other languages
Japanese (ja)
Inventor
岩「淵」 真三郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP5530182A priority Critical patent/JPS58173609A/en
Publication of JPS58173609A publication Critical patent/JPS58173609A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [発明の技術分11f1 本発明は薄片切断装置に係シ、特に被切断物の送シ速度
を制御する薄片切断装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Part 11f1 of the Invention] The present invention relates to a thin slice cutting device, and more particularly to a thin slice cutting device that controls the feeding speed of an object to be cut.

[発明の技術的背景とその問題点コ 従来半導体用のウェハは超LSI化等によシウエハ精度
が厳しく要求されている。ウェハはインゴットをスライ
スして造られ、このスライス時にウェハの破損や反りを
起むすことがあり、ウェハの精度を決定させている。
[Technical background of the invention and its problems] Conventional wafers for semiconductors are required to have high wafer precision due to the trend toward ultra-large scale integration (LSI) and the like. Wafers are made by slicing ingots, and during this slicing, the wafers may be damaged or warped, which determines the accuracy of the wafers.

一般にインゴットのスライスは内周刃にダイアモンドを
用いたブレードを高速回転させて、それにインゴットを
一定速度で送シ込んで切断を行なっている。この切断時
にはブレードの偏心があり、つオフ切断への刃の寄与率
が内周円の約10%位しかなく、そのため切断中の切削
抵抗が変化し、この変化に応じてグレードの地金へダメ
ージが繰シ返し加え−られる九めブレードに疲労が起こ
る。ブレードの地金の疲労はブレードによって一様では
なく地金の材質の不均一による疲労強弱があり、つtシ
疲労に弱い部分では寄与率109gで刃先のダイアモン
ドが剥脱してしまいブレードは切断不能となシウエハ破
損を起こす。この場合、疲労に強い部分でも疲労の限界
が壱ヤ、ある時点では切断不能を起こしてウェハの破損
等を起こす丸めウェハ1枚当夛のブレード費用が高価に
なるのが一般的となっている。また、ブレードはその切
削能力が低下すると撓みを生じウェハの反りの原因とな
っている。
Generally, ingots are sliced by rotating a blade with a diamond inner edge at high speed and feeding the ingot into the blade at a constant speed. During this cutting, there is an eccentricity of the blade, and the contribution of the blade to off-cutting is only about 10% of the inner circumference, so the cutting resistance during cutting changes, and the grade of base metal changes according to this change. The ninth blade suffers from fatigue due to repeated damage. Fatigue of the base metal of the blade is not uniform depending on the blade, but there are fatigue strengths and weaknesses due to non-uniformity of the material of the base metal.In areas that are weak to fatigue, the diamond on the cutting edge peels off at a contribution rate of 109g, making the blade unable to cut. This may cause damage to the wafer. In this case, even the part that is resistant to fatigue has a limit of fatigue, and at some point it becomes impossible to cut the wafer, resulting in damage to the wafer.The blade cost for each rounded wafer is generally high. . Further, when the cutting ability of the blade decreases, the blade becomes deflected, causing warping of the wafer.

このように、現在はブレードの切削能力が低下してもウ
エノ1の送りを一定速度としているため、ブレードの切
削能力が低下するに従いブレードの寿命とウェハの精度
を悪化せしめている。
As described above, at present, the wafer 1 is fed at a constant speed even when the cutting ability of the blade decreases, and as the cutting ability of the blade decreases, the life of the blade and the precision of the wafer deteriorate.

[発明の目的] 本発明は上記従来の難点に鑑みなされたもので、ブレー
ドの切削抵抗を検出する検出部を、インゴットを保持す
る箇所に設けて、その検出11と予め定めた設定値を比
較してウエノ・をブレードに送り込む速度を制御するコ
ントロール部を設けるととKよってブレードの寿命を延
ばし。
[Object of the Invention] The present invention has been made in view of the above-mentioned conventional difficulties, and includes providing a detection section for detecting the cutting resistance of the blade at a location where the ingot is held, and comparing the detection section 11 with a predetermined set value. Providing a control unit to control the speed at which Ueno is fed into the blade will extend the life of the blade.

またウェハの破損や反りを減少ならしめた薄片切断装置
を提供せんとするものである。
Another object of the present invention is to provide a thin section cutting device that reduces wafer breakage and warpage.

[発明の概I!] 本発明はダイアモンド内周刃を有し回転するブレードと
、該ブレードに被切断物を送シ込む駆動部と、前記被切
断物を保持する保持部と、該保持部に設けた切削抵抗を
検出する検出部と、該検出部からの検出値と予め定めた
設定値を比較して前記被切断物の送シ速度を制御するコ
ントロール部とを備えてブレードの切削抵抗をインゴッ
トの保持部の箇所で測定して、インボッとの送り込み速
度を変化させてブレードの切削抵抗のばらつきを少なく
させた薄片切断装置で多る。
[Summary of the invention I! ] The present invention includes a rotating blade having a diamond inner circumferential cutting edge, a drive unit that feeds an object to be cut to the blade, a holding unit that holds the object to be cut, and a cutting resistance provided in the holding unit. The cutting resistance of the blade is controlled by the cutting resistance of the ingot holding part, and the control part controls the feeding speed of the object to be cut by comparing the detection value from the detection part with a predetermined setting value. This is common in thin-section cutting machines that reduce variations in the cutting resistance of the blade by measuring the cutting force at different points and changing the feeding speed between inbots.

[発明の実施例] 以下本発明の一実施例を図面により説明する。[Embodiments of the invention] An embodiment of the present invention will be described below with reference to the drawings.

本発明は第1図に示すように、ダイアモンド内周刃1を
有し回転するブレード2と、ブレード2にインゴット3
を送り込む(矢印方向)駆動部4と、インゴット3を保
持する保持部5と、保持部5に設けた切削抵抗を検出す
る検出部6と、検出部6からの検出値と予め定めた設定
値を比較してインゴット3の送り速度を制御するコント
ロール部7とから構成されている。
As shown in FIG.
(in the direction of the arrow), a holding section 5 that holds the ingot 3, a detection section 6 provided in the holding section 5 that detects cutting resistance, and a detection value from the detection section 6 and a predetermined set value. and a control section 7 that controls the feeding speed of the ingot 3 by comparing the values.

検出部6は、インゴット3の装着部にストレインゲージ
8を設はインゴット3の歪を測定してこれを増幅器(図
示せず)で増幅させ、所謂検出値(切削抵抗)としてコ
ントロール部Tに送っている。コントロール部Tでは、
検出部6からの検出値と予め定めた設定値を比較演算し
て、インゴット3の送シ速度を切削抵抗が高い場合は遅
く、ま九低い場合は早くするように駆動部4に指令を出
し、切削抵抗に応じたウェハの送り速度を可変させてウ
ェハの破損や反りを防止し、ブレードの寿命を向上させ
ている。
The detecting section 6 measures the strain of the ingot 3 by installing a strain gauge 8 in the mounting part of the ingot 3, amplifies this with an amplifier (not shown), and sends it to the control section T as a so-called detected value (cutting resistance). ing. In the control section T,
The detection value from the detection unit 6 and a predetermined set value are compared and calculated, and a command is issued to the drive unit 4 to slow down the feeding speed of the ingot 3 when the cutting resistance is high, and to speed it up when the cutting resistance is low. By varying the wafer feed speed according to the cutting resistance, wafer damage and warping are prevented and blade life is extended.

ウェハの反りは第2図のグラフに示されるように従来方
式の乎゛論約30μmに対し本発明の装置では平均的2
5μmに減少する。また、ブレードの寿命つまりブレー
ド1枚当りのウェハ切断枚数は第3図のグラフに示され
るように従来方式の500〜3000枚に対し本発明の
装置では2000〜4000枚に向上し、且つ分布範囲
が狭く切断枚数の大きい方に寄る効果を生じた。
As shown in the graph of Fig. 2, the warpage of the wafer is approximately 30 μm in the conventional system, whereas the average warpage in the apparatus of the present invention is approximately 2 μm.
It decreases to 5 μm. In addition, the life of the blade, that is, the number of wafers cut per blade, is improved from 500 to 3,000 in the conventional method to 2,000 to 4,000 in the device of the present invention, as shown in the graph of FIG. The effect was that the number of sheets cut was narrow and the number of sheets cut was large.

「発明の効果」 以上実施例から4明らかなように本発明によれば、ブレ
ードの切削抵抗を検出する検出部を、インゴットを保持
する箇所に設けて、その検出値と予め定め先膜定値を比
較してウエノ・をブレードに送り込む速度を制御するコ
ントロール部を設けることによってインゴットやブレー
ドに必要以上の負荷を与えることを防止できるためウェ
ハの破損や反りを減少ならしめ且つブレードの寿命つま
りウェハの切断枚数を向上させることができ、従って品
質を高め、生産性を増し、コスト的にも安価にすること
ができる。
"Effects of the Invention" As is clear from the above embodiments, according to the present invention, a detection section for detecting the cutting resistance of the blade is provided at a location where the ingot is held, and the detected value and a predetermined film constant value are set. In comparison, by providing a control unit that controls the speed at which the wafer is fed into the blade, it is possible to prevent excessive loads from being applied to the ingot and the blade, thereby reducing wafer breakage and warping, and prolonging the life of the blade. It is possible to increase the number of sheets to be cut, thereby improving quality, increasing productivity, and reducing costs.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の薄片切断装置を示した概念図、第2図
は本発明の薄片切断装置によるウェハの反妙の分布を示
したグラフ、第3図は本発明の薄片切断装置によるブレ
ードのウェハ切断枚数の分布を示したグラフである。 1・・・ダイアモンド内周刃、  2・・・ブレード3
・・・インゴット   4・・・駆動部5・・・保持部
     6・・・検出部T・・・コントロール部  
8・・・ストレインケージば)・・・従来の薄片切断装
置 (ロ)・・・本発明の薄片切断装置
FIG. 1 is a conceptual diagram showing the thin slice cutting device of the present invention, FIG. 2 is a graph showing the distribution of wafer deformation by the thin slice cutting device of the present invention, and FIG. 3 is a blade using the thin slice cutting device of the present invention. 3 is a graph showing the distribution of the number of wafers cut. 1...Diamond inner peripheral blade, 2...Blade 3
... Ingot 4 ... Drive section 5 ... Holding section 6 ... Detection section T ... Control section
8...Strain cage B)...Conventional flake cutting device (B)...Flame cutting device of the present invention

Claims (1)

【特許請求の範囲】[Claims] ダイアモンド内周刃を有し回転するブレードと、該ブレ
ードに被切断物を送シ込む駆動部と、前記被切断物を保
持する保持部と、該保持部に設けた切削抵抗を検出する
検出部と、該検出部からの検出値と予め定めた設定値を
比較して前記被切断物の送シ速度を制御するコントロー
ル部とを備えてなることを峙黴とする薄片切断装置。
A rotating blade having a diamond inner circumferential edge, a driving section that feeds the object to be cut to the blade, a holding section that holds the object to be cut, and a detection section provided on the holding section that detects cutting resistance. and a control section that compares the detection value from the detection section with a predetermined set value to control the feeding speed of the object to be cut.
JP5530182A 1982-04-05 1982-04-05 Cutter for thin piece Pending JPS58173609A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5530182A JPS58173609A (en) 1982-04-05 1982-04-05 Cutter for thin piece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5530182A JPS58173609A (en) 1982-04-05 1982-04-05 Cutter for thin piece

Publications (1)

Publication Number Publication Date
JPS58173609A true JPS58173609A (en) 1983-10-12

Family

ID=12994740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5530182A Pending JPS58173609A (en) 1982-04-05 1982-04-05 Cutter for thin piece

Country Status (1)

Country Link
JP (1) JPS58173609A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6296400A (en) * 1985-10-23 1987-05-02 Mitsubishi Metal Corp Production of wafer
JPS6270904U (en) * 1985-10-22 1987-05-06

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6270904U (en) * 1985-10-22 1987-05-06
JPH049139Y2 (en) * 1985-10-22 1992-03-06
JPS6296400A (en) * 1985-10-23 1987-05-02 Mitsubishi Metal Corp Production of wafer
JPH0429640B2 (en) * 1985-10-23 1992-05-19

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