JPS58167496A - Preparation of wafer of lithium tantalate single crystal - Google Patents

Preparation of wafer of lithium tantalate single crystal

Info

Publication number
JPS58167496A
JPS58167496A JP57050481A JP5048182A JPS58167496A JP S58167496 A JPS58167496 A JP S58167496A JP 57050481 A JP57050481 A JP 57050481A JP 5048182 A JP5048182 A JP 5048182A JP S58167496 A JPS58167496 A JP S58167496A
Authority
JP
Japan
Prior art keywords
axis
single crystal
lithium tantalate
wafer
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57050481A
Other languages
Japanese (ja)
Other versions
JPS6046077B2 (en
Inventor
Arata Sakaguchi
阪口 新
Akifumi Yoshida
吉田 紀史
Masahiro Ogiwara
荻原 正宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP57050481A priority Critical patent/JPS6046077B2/en
Publication of JPS58167496A publication Critical patent/JPS58167496A/en
Publication of JPS6046077B2 publication Critical patent/JPS6046077B2/en
Expired legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/22Complex oxides
    • C30B29/30Niobates; Vanadates; Tantalates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

PURPOSE:To obtain a wafer having no propagation attenuation of surface accoustic wave, by growing lithium tantalate single crystal using a seed crystal having a crystallographical orientation in a direction with a specific angle from Y axis, allowing it to form single domains, taking it out perpendicularly to a pulling axis. CONSTITUTION:A lithium tantalate seed crystal having a crystallographical orientation with a gradient of 36 10 degrees from y axis in the z axis direction is prepared. The seed crystal is immersed in lithium tantalate melt formed in a crucible, it is pulled up gradually in a crystallographical orientation in the direction of 36 10 degrees from Y axis, to grow it into a given thickness and length. The electrodes 3 are set above and below the pulling axis of the prepared single crystal 1'' grown in the direction of 36 10 degrees from y axis, and DC voltage is applied to them so that it is allowed to form single domains. The single crystal 1'' is taken out approximately perpendicularly to the pulling axis, to give a round-shaped wafer having a plane orientation in the direction of 36 10 degrees from Y axis.

Description

【発明の詳細な説明】 本発明はタンタル酸リチウム単結晶の36°±10@Y
軸方向の面方位をもつウェーハの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a 36°±10@Y lithium tantalate single crystal.
This invention relates to a method of manufacturing a wafer having an axial surface orientation.

タンタル酸リチウム(LiTaOり単結晶はTV受信機
のIPフィルター等に用いられているほか。
Lithium tantalate (LiTaO single crystal) is used in IP filters for TV receivers, etc.

新用途として自動車電話用等の通信機用8人W(表面弾
性波)フィルターやセンサーへの応用も研究されている
。上記Tv受受信吊用はタンタル酸リチウム単結晶のう
ちでもX軸引上げ単結晶から切り出されたX板つェーへ
〔面方位<2TO> )が使用される。
As a new application, research is also being conducted into 8-W (surface acoustic wave) filters and sensors for communication devices such as car phones. For the Tv receiver/receiver suspension, an X-plate thread (plane orientation <2TO>) cut from an X-axis pulled single crystal among lithium tantalate single crystals is used.

これに対し自動車電話用8AWフィルターへの応用では
、s6@±10”Y軸方向の面方位を持つウェーハが特
性的に有望視されており、現在この面方位をもつタンタ
ル酸ツチウム単結晶ウェーへの製造方法としては1例え
ば第1図に示したようにX軸引上げ単結晶lを切り出し
線2にしたがって縦に切り出すことによって36°±1
0’Y軸方向の面方位を持つウェーハを得る方法が試み
られている。しかし、この方法による場合、ウェーへの
形状が角形となる。大きさが不揃いとなる。単結晶の利
用効率(クエーへ切り出しに当っての歩留り)が悪いと
いう不利がある。
On the other hand, for application to 8AW filters for car phones, wafers with s6@±10'' Y-axis orientation are considered promising due to their properties, and currently tutium tantalate single crystal wafers with this orientation are being developed. 1. For example, as shown in Fig. 1, an X-axis pulled single crystal 1 is cut out vertically along cutting line 2 at 36°±1.
Attempts have been made to obtain a wafer having a surface orientation in the 0'Y-axis direction. However, when using this method, the shape of the wafer becomes a square. The size will be uneven. There is a disadvantage that the utilization efficiency of the single crystal (the yield when cutting into quay) is poor.

他方また第2図に示したように、Y軸(<010〉)も
しくはZ軸(<001>)引上げ単結晶1′を切り出し
線2にしたがって斜めに切り出すことによって第1図の
場合と同様の面方位な持つウェー八を得る方法も試みら
れているが、この場合にも単結晶の利用効率が悪いほか
、ウエーノ\の形状が楕円形のためデバイス製造工程で
の取扱いが不都合であるという欠点がある。
On the other hand, as shown in FIG. 2, by diagonally cutting out the Y-axis (<010>) or Z-axis (<001>) pulled single crystal 1' along the cutting line 2, the same process as in FIG. Attempts have also been made to obtain wafers with the same plane orientation, but in this case as well, the disadvantage is that the utilization efficiency of the single crystal is poor, and the elliptical shape of the wafer makes it difficult to handle in the device manufacturing process. There is.

本発明はかかる不利欠点を解決したものであって、これ
はZ軸方向に向ってY軸より340±lθ。
The present invention solves this disadvantage, and the distance is 340±lθ from the Y-axis toward the Z-axis direction.

の傾きの結晶工学的方位を有する種結晶を用いて36°
±106Y軸方向にタンタル酸リチウム単結晶を成員さ
せる工程、得られた単結晶を単一分域化する工程、およ
びこの単結晶から36°+10’Y軸方向の面方位を持
つ丸形ウェー八Y引上げ軸にほぼ垂直に切り出す工程か
らなることを特徴とするタンタル酸ツチクム単結晶ウェ
ーへの製造方法に関するものである。
using a seed crystal with a crystallographic orientation of inclination of 36°
A process of forming a lithium tantalate single crystal in the ±106 Y-axis direction, a process of dividing the obtained single crystal into a single domain, and a round wafer having a plane orientation of 36° + 10' Y-axis direction from this single crystal. The present invention relates to a method for manufacturing a tutsicum tantalate single crystal wafer, which comprises a step of cutting out substantially perpendicular to the Y-pulling axis.

この本発明方法によれば、■丸形ウェー八を簡単に得る
ことができる、■切り出しの際の面方位の検査・修正が
容易である、■結晶利用効率が格段に向上する、■一定
形状の丸形クエーへの使用による8AWデバイス製造工
程の効率化、という利点がもたらされる。特にこの■の
利点は引上げ単結晶の径(クエーへ径)が大きくなるに
つれて大きくなる。
According to the method of the present invention, 1) it is possible to easily obtain round wafers, 2) it is easy to inspect and correct the plane orientation during cutting, 2) the crystal utilization efficiency is significantly improved, and 2) it has a constant shape. The advantage of using this method for round quays is to improve the efficiency of the 8AW device manufacturing process. In particular, this advantage (2) increases as the diameter (Quey diameter) of the pulled single crystal increases.

以下本発明の方法を詳細に説明する。The method of the present invention will be explained in detail below.

まず、あらかじめ2軸方向に向ってY自より36@±1
0’の傾きの結晶工学的方位を有する種結晶を準備する
のであるが、これは例えば従来通りの方法でX軸方向引
上げあるいはY軸もしくはべ1 金に垂直に切り出したもの(ウェー八)、あるいはまた
s3図に示す本発明の方法による引上げ単結晶から引上
げ軸方向に切り出された切片を使用することができる。
First, in advance, 36@±1 from the Y axis in the two-axis direction.
A seed crystal having a crystallographic orientation with an inclination of 0' is prepared, for example, by pulling it in the X-axis direction or cutting it perpendicular to the Y-axis or the bezel (Weh 8) using a conventional method. Alternatively, it is possible to use a section cut out in the direction of the pulling axis from a single crystal pulled by the method of the present invention as shown in Figure s3.

この種結晶をイリジウムるつぼ中に形成されたりyタル
酸ツテクム融液に浸し、3610Y軸方向の結晶工学的
方位に徐々に引上げることにより、目的の太さおよび長
さに成長させる。該原料融液の加熱手段としては通常高
鳩波誘導加熱装置を使用すればよい。36°+:lO°
Y軸の範囲に引上げるとL i T a Os単結晶の
臂開面である(〈012>)面が引上げ軸にほば垂直(
32,9°Y軸の場合は垂直)に位置し、結晶自身の萄
1が引張り応力として(<012>) 面に作用するた
め、(<012>)面でのクラックが種および結晶中に
発生し属い。この(<012>)面でのクラックを防止
するには冷却時の11および結晶の引上げ軸方向および
径方向の温度差をできるだけ小さくすることが必要であ
り、冷却時に種の上端が保温筒の外へ出ないように保温
筒な従来より高くし、種も保温筒の中に入った状態にし
て冷却することが望ましい、また結晶成長操作中のふん
囲気としては不活性ガス中、空気中、あるいは(不活性
ガス中 十酸素)の混合ガiのいずれでもよいが、好ましくはク
ラック防止のために不活性ガスと酸素との混合ガス中で
職長を行い、かつ冷却中も酸素を含むふん囲気に保つこ
とが望ましい。
This seed crystal is formed in an iridium crucible or immersed in a y-talate melt, and is gradually pulled up in the crystal engineering direction of the 3610 Y-axis direction, thereby growing to a desired thickness and length. As a means for heating the raw material melt, a high-pitched wave induction heating device may normally be used. 36°+: lO°
When pulled up to the Y-axis range, the (<012>) plane, which is the open plane of the Li Ta Os single crystal, becomes almost perpendicular to the pulling axis (
32.9° (perpendicular in the case of the Y-axis), and since the stem 1 of the crystal itself acts on the (<012>) plane as a tensile stress, cracks at the (<012>) plane cause seeds and crystals to form. Occur and belong. In order to prevent cracks on this (<012>) plane, it is necessary to minimize the temperature difference in the pulling axis direction and radial direction of 11 and the crystal during cooling, so that the upper end of the seed is in the heat-insulating cylinder during cooling. It is preferable to keep the heat insulating tube higher than the conventional heat insulating tube so that it does not escape outside, and to cool the seeds with the seeds inside the insulating tube. Alternatively, a mixture of (10 oxygen in an inert gas) may be used, but it is preferable to conduct the foreman in a mixed gas of an inert gas and oxygen to prevent cracking, and to keep an atmosphere containing oxygen during cooling. It is desirable to keep the

つぎに、このようにして成長された結晶は次工程で単一
分域化される。この単一分域化の具体的方法は第4図、
第sHに示すとおりである。すなわち114図のように
、36°±10@Y釉方向感長単結晶1′の引上げ軸方
向の上下に電極(Pt電極)8をセットするか、あるい
は第5図(A)および(B)のように、単結晶1′の側
面に電極を結ぶ線がX軸に垂直になるように電極(Pi
電極)をセットし、直流電圧を印加することにより容易
に単一分域化が行われ、この際の印加電力は直径をda
m。
Next, the crystal grown in this way is made into a single domain in the next step. The specific method of this single area division is shown in Figure 4.
As shown in No. sH. That is, as shown in Fig. 114, electrodes (Pt electrodes) 8 are set above and below the pulling axis direction of the 36° ± 10 @ Y glaze direction sensitive length single crystal 1', or as shown in Figs. 5 (A) and (B). The electrode (Pi
Single segmentation is easily performed by setting the electrodes and applying a DC voltage, and the applied power at this time is
m.

長さく上下間)を1alI%引上げ軸方向をY軸から単
一分域化C二当って印加電界をZ軸方向に加える必要が
なく、上記の手段によって良好に単一分域化が行われる
There is no need to apply an applied electric field in the Z-axis direction, and the single domain can be successfully achieved by the above method. .

なお、この単一分域化の手段としては本発明者らが先に
提案した方法すなわち断熱材からなる処理槽内に、一対
の電極板をその表面が互に平行となるように間隔をおい
て配設し、その電極板間のほぼ中央部に該単結晶1′を
配置し、該処理槽内に該単結晶と同種の粉末を密に充て
んし、電極板に直流電圧を印加するという方法も有利に
採用される。
Note that the method for achieving this single area is the method previously proposed by the present inventors, in which a pair of electrode plates are placed in a treatment tank made of heat insulating material and spaced so that their surfaces are parallel to each other. The single crystal 1' is arranged approximately in the center between the electrode plates, the treatment tank is densely filled with powder of the same type as the single crystal, and a DC voltage is applied to the electrode plates. The method is also advantageously employed.

上記のようにして単一分域化された単結晶をつぎに引上
げ軸にほぼ重直に切り出し、これによりsr+lo°Y
軸方向の面方位を持つ丸形ウェーハを得るのであるが、
この際基準面として(〈ox2>)面もしくit (<
014 >)面を用い、これらの画をX線で方位出しし
た後、X軸を回転軸として所定角度回転さセるとよい。
Next, the single crystal that has been made into a single domain as described above is cut out almost perpendicularly to the pulling axis, and thereby sr+lo°Y
To obtain a round wafer with an axial surface orientation,
At this time, the reference plane is the (<ox2>) plane or it (<
It is preferable to orient these images with X-rays using the 014>) plane, and then rotate them by a predetermined angle using the X-axis as the rotation axis.

なお、方位として36°+109Y軸方向を用いている
が、これらの方位と180°反対側の方位も当然本発明
の対象となる。
Note that although the 36°+109 Y-axis direction is used as the azimuth, naturally the present invention also covers an azimuth 180° opposite to these azimuths.

以上説明したとおり、本発明の方法によると第3因に示
したように単結晶引上げ方向に対して垂直に切り出すだ
けで、目的とする366±10eY軸方向の面方位を持
つタンタル酸リチウム単結晶ウェーハが、特性上のバラ
ツキのない声質の製品として高歩留りで容具に得られる
As explained above, according to the method of the present invention, as shown in the third factor, by simply cutting out the lithium tantalate single crystal perpendicular to the single crystal pulling direction, the desired lithium tantalate single crystal with a plane orientation of 366±10e in the Y-axis direction can be obtained. The wafers can be obtained as products with consistent quality and uniform characteristics at a high yield.

このようにして得られるタンタル酸リチウム単結晶ウェ
ーハは、その面方位が36°土1OOY軸方向であるた
め、表面弾性波の伝般減衰がほとんどイロとなり、さら
に温度特性が小さいという特徴な有している。
The lithium tantalate single-crystal wafer obtained in this way has the characteristic that the propagation attenuation of surface acoustic waves is almost zero because its surface orientation is 36° earth 1OOY axis direction, and furthermore, the temperature characteristics are small. ing.

つぎに具体的比IIR4P11.夷厖例Yゐげ金。Next, the specific ratio IIR4P11. Yage money for example.

比較例 1[111too−高さ100朧のイリジウムるつぼに
タンタル酸すチウム粉未焼成原料を3700P入れ、こ
れを高周波誘導加熱装置により溶融した。
Comparative Example 1 [111too] 3700P of unsintered tantalate powder was put into an iridium crucible with a height of 100mm, and this was melted using a high-frequency induction heating device.

これにY軸のタンタル酸リチウム種結晶を浸し、径約5
3■長さ約100−のタンタル峻リチウム単結晶を(N
、+3.0容量%0.)ふん囲気中で引上げ、成長終了
後るつぼ保護のためにふん囲気なN、 100%にして
冷却した後装置より取り出した。
Dip the lithium tantalate seed crystal on the Y axis into this, and
3 ■ A tantalum steep lithium single crystal with a length of about 100-
, +3.0 capacity%0. ) After the growth was completed, the crucible was cooled to 100% nitrogen atmosphere to protect the crucible, and then removed from the apparatus.

得られた単結晶を方位切断し、単一分域化した後。After the obtained single crystal is oriented and cut into single domains.

1!50−長8100−の円柱状に加工した。It was processed into a cylindrical shape with a length of 1.50 mm and a length of 8100 mm.

この円柱状単結晶をX軸を回転軸にして2−軸方向に3
66回転した後、ウェーハを切り出すことにより厚さ0
.5−の楕円形ウェーハが47枚得られた。これを丸形
になるように加工し、径50m厚さ0.5−の丸形ウェ
ーハ(面方位36°Y軸)を同枚数得た。
This cylindrical single crystal is rotated in the 2-axis direction with the X axis as the rotation axis.
After 66 rotations, the wafer is cut out to a thickness of 0.
.. Forty-seven 5- oval wafers were obtained. This was processed into a round shape to obtain the same number of round wafers (plane orientation 36° Y axis) each having a diameter of 50 m and a thickness of 0.5 mm.

実J1例 比較例と#111mのるつぼにタンタル酸リチウム粉末
焼成原料1yoot入れ、8様に溶融した。これに3@
0Y軸方向の方位をもっタンタル酸リチウム種結晶を浸
し、径約s3−長さ約100−のタンタル酸リチウム単
結晶を比較例より5m高くした保温筒な用い、  (N
、+3.0容量%O,)ふん囲気中で引上げ、威長終了
後種が保温筒の中に入った位置で0.濃度をそのままに
して冷却した後装「− 置より取り出した。得られた単結晶VX軸を回転輪にし
、(<01!>)画を基準面にして(〈012 >)軸
からY軸に向い3.16回転8せて方位切断した。つい
で単一分域化した籠、径Sow長さ100−の円柱状に
加工した。この円柱状単結晶を垂直に切り出すことによ
り径l5o−厚さ0.5−の丸形ウェーハ(面方位36
°Y釉)を83枚得た。
Actual Example J1 Comparative Example 1yoot of lithium tantalate powder sintering raw material was put into a #111m crucible and melted in 8 ways. 3@ for this
A lithium tantalate seed crystal oriented in the 0Y-axis direction was immersed, and a lithium tantalate single crystal with a diameter of about s3 and a length of about 100 was made 5 m higher than the comparative example.
, +3.0 volume% O,) was raised in a feces atmosphere, and after the lengthening was completed, the seeds entered the heat-insulating cylinder at a temperature of 0. The obtained single crystal V was taken out from the cooled after-cooling unit. The obtained single crystal V The cage was turned 3.16 times 8 times in the opposite direction and cut in the azimuth direction.Then, the single-segmented cage was processed into a cylindrical shape with a diameter So and a length of 100 mm.By cutting this cylindrical single crystal perpendicularly, a diameter of 15 o-thickness was obtained. 0.5- round wafer (plane orientation 36
83 pieces of glaze (°Y glaze) were obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

111図、第2図は従来のウェーへ切り出し税明図、第
3図は本発明のウエーノ為切り出し説明図な示したもの
であり、また第4図、185図は引上げ単結晶を単一分
域化するための説明図を示したものである。 1 、 l’ 、 l’・・・単結晶 2・・・・切り出し線 8・・・・電極。 特許出願人 信越化学工業株式会社 第1図      第2図 × 第5図(B) 手続補正書 昭和58年4 月 411 持訂庁長官若杉和夫  殿 1、!抄件の表示 昭$057年特許111’150481号2、発明の名
称 タンタル酸リチウム単結晶ウェーノーの製造方法3、補
正をする者 事件との関係 特16願人 名称 (206)  信越化学工業株式会社4、代 理
 人 6、補正の対象 l)明細IIF第4ページ最下行シーおける「(ウエー
ノ\)」を削除する。 2)明細書′s6ページi&f行における[印加゛成力
]を「印加′磁圧」と補正する@
Figures 111 and 2 are diagrams of conventional wafers cut out, Figure 3 is an explanatory diagram of the wafer of the present invention cut out, and Figures 4 and 185 are diagrams of the wafer cut into single crystals of the present invention. This figure shows an explanatory diagram for regionalization. 1, l', l'...single crystal 2...cutting line 8...electrode. Patent Applicant Shin-Etsu Chemical Co., Ltd. Figure 1 Figure 2 × Figure 5 (B) Procedural Amendment April 1981 411 Director-General of the Revision Agency Kazuo Wakasugi 1,! Display of extracts 1983 Patent No. 111'150481 2 Name of the invention Method for producing lithium tantalate single crystal waeno 3 Relationship with the person making the amendment Name of Patent No. 16 applicant (206) Shin-Etsu Chemical Co., Ltd. 4 , Agent 6, Subject of amendment l) Delete "(Ueno\)" in the bottom line of page 4 of Specification IIF. 2) Correct [applied force] in line i & f on page 6 of the specification to "apply magnetic pressure" @

Claims (1)

【特許請求の範囲】[Claims] 1、  Z軸方向に向ってY軸より36°!lO°の傾
きの結晶工学的方位を有する種結晶を用いて36’+ 
106Y軸方向にタンタル酸リチウム単結晶を成長させ
る工程、得られた単結晶を単一分域化する工程、および
この単結晶から36゜±lO°Y軸方向の面方位を持つ
丸形ウェーハを引上げ軸にほぼ垂直に切り出す工程から
なることを特徴とするタンタル験リチウム単結晶ウェー
への製造方法
1. 36° from the Y axis towards the Z axis direction! 36'+ using a seed crystal with a crystallographic orientation with a tilt of lO°
106 A step of growing a lithium tantalate single crystal in the Y-axis direction, a step of dividing the obtained single crystal into a single domain, and a round wafer having a plane orientation of 36°±lO° in the Y-axis direction from this single crystal. A method for manufacturing tantalum lithium single crystal wafers, which comprises a step of cutting out almost perpendicular to the pulling axis.
JP57050481A 1982-03-29 1982-03-29 Method for manufacturing lithium tantalate single crystal wafer Expired JPS6046077B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57050481A JPS6046077B2 (en) 1982-03-29 1982-03-29 Method for manufacturing lithium tantalate single crystal wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57050481A JPS6046077B2 (en) 1982-03-29 1982-03-29 Method for manufacturing lithium tantalate single crystal wafer

Publications (2)

Publication Number Publication Date
JPS58167496A true JPS58167496A (en) 1983-10-03
JPS6046077B2 JPS6046077B2 (en) 1985-10-14

Family

ID=12860097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57050481A Expired JPS6046077B2 (en) 1982-03-29 1982-03-29 Method for manufacturing lithium tantalate single crystal wafer

Country Status (1)

Country Link
JP (1) JPS6046077B2 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5050299A (en) * 1973-09-03 1975-05-06
JPS5127900A (en) * 1974-08-15 1976-03-09 Nippon Electric Co NIOBUSANRICHIUMUTANKETSUSHONO IKUSEIHOHO
JPS5364700A (en) * 1976-11-22 1978-06-09 Toshiba Corp Working method for single crystal
JPS5619048A (en) * 1979-07-25 1981-02-23 Konishiroku Photo Ind Co Ltd Photographic image forming method
JPS5631911A (en) * 1979-08-24 1981-03-31 Hitachi Shipbuilding Eng Co Bridge leg and construction thereof
JPS574112A (en) * 1980-05-07 1982-01-09 Siemens Ag Method of producing laminated condenser
JPS5833310A (en) * 1981-08-21 1983-02-26 Hitachi Ltd Surface acoustic wave device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5050299A (en) * 1973-09-03 1975-05-06
JPS5127900A (en) * 1974-08-15 1976-03-09 Nippon Electric Co NIOBUSANRICHIUMUTANKETSUSHONO IKUSEIHOHO
JPS5364700A (en) * 1976-11-22 1978-06-09 Toshiba Corp Working method for single crystal
JPS5619048A (en) * 1979-07-25 1981-02-23 Konishiroku Photo Ind Co Ltd Photographic image forming method
JPS5631911A (en) * 1979-08-24 1981-03-31 Hitachi Shipbuilding Eng Co Bridge leg and construction thereof
JPS574112A (en) * 1980-05-07 1982-01-09 Siemens Ag Method of producing laminated condenser
JPS5833310A (en) * 1981-08-21 1983-02-26 Hitachi Ltd Surface acoustic wave device

Also Published As

Publication number Publication date
JPS6046077B2 (en) 1985-10-14

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