JPS5815497Y2 - Mother plate used for seed plate production - Google Patents

Mother plate used for seed plate production

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Publication number
JPS5815497Y2
JPS5815497Y2 JP1980009672U JP967280U JPS5815497Y2 JP S5815497 Y2 JPS5815497 Y2 JP S5815497Y2 JP 1980009672 U JP1980009672 U JP 1980009672U JP 967280 U JP967280 U JP 967280U JP S5815497 Y2 JPS5815497 Y2 JP S5815497Y2
Authority
JP
Japan
Prior art keywords
plate
base plate
seed
metal foil
mother
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1980009672U
Other languages
Japanese (ja)
Other versions
JPS56115461U (en
Inventor
豊 伊藤
俊彦 吉見
輝満 川端
Original Assignee
日本鉱業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本鉱業株式会社 filed Critical 日本鉱業株式会社
Priority to JP1980009672U priority Critical patent/JPS5815497Y2/en
Publication of JPS56115461U publication Critical patent/JPS56115461U/ja
Application granted granted Critical
Publication of JPS5815497Y2 publication Critical patent/JPS5815497Y2/en
Expired legal-status Critical Current

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  • Electrolytic Production Of Metals (AREA)

Description

【考案の詳細な説明】 本考案は、金属の電解精製に際し、陰極として用いられ
る種板を製造するための母板に関するものである。
[Detailed Description of the Invention] The present invention relates to a mother plate for manufacturing a seed plate used as a cathode during electrolytic refining of metal.

従来、このような種板製造用母板においては、金属板の
外周縁部に絶縁材を貼り付けて該絶縁材で囲まれた金属
面が種板を析出させる陰極とされていた。
Conventionally, in such a mother plate for producing seed plates, an insulating material is attached to the outer peripheral edge of the metal plate, and the metal surface surrounded by the insulating material is used as a cathode for depositing the seed plate.

従って、従来の母板は30〜40 kgという重量とな
り、こうした母板を多数枚吊り下げて電解液槽へ運ぶク
レーン等の装置も大掛りなものが必要とされていた。
Therefore, the conventional motherboard weighs 30 to 40 kg, and large-scale equipment such as a crane is required to suspend and transport a large number of such motherboards to the electrolyte tank.

また、母板に析出される種板は一定形状でしかも外周辺
をできるだけ直線とする必要があるが、母板は常時強酸
性の電解液中に浸されていると共に、母板から種板を剥
離させる際に機械的な力が母板外周部に設けられた塩化
ビニール性の絶縁部に加えられることからその絶縁部の
傷みは激しく、従来では長いものでも3〜5ケ月程度の
寿命しか得られないという問題点があった。
In addition, the seed plate deposited on the mother plate must have a constant shape and the outer periphery must be as straight as possible. When peeling off, mechanical force is applied to the vinyl chloride insulation part provided on the outer periphery of the motherboard, which causes severe damage to the insulation part. The problem was that it could not be done.

また、該絶縁部が損傷することにより、該損傷部に金属
の電着が起こり種板を得るための電解操業が良好に行わ
れ得なかった。
Further, due to the damage to the insulating part, metal was electrodeposited on the damaged part, making it impossible to carry out the electrolytic operation for obtaining the seed plate well.

またさらに、絶縁部が、金属母板の外周部に、3〜4m
m厚の塩化ビニールより構成されているため、種板を母
板から剥離する際に、金属母板に剥離用突器物をつき当
てる方法がとられるため、電着面となる金属母板も傷つ
けることとなり好ましい電解操業を行うことが出来なか
った。
Furthermore, an insulating part is provided on the outer periphery of the metal base plate for 3 to 4 m.
Since it is made of m-thick vinyl chloride, when peeling the seed plate from the base plate, a peeling tool is used to hit the metal base plate, which will also damage the metal base plate that will be the electrodeposited surface. As a result, it was not possible to perform a desirable electrolytic operation.

また従来、母板の基体を絶縁材で構威し、その表面に金
属板を、母板の型成形時に一体に又は接着剤により接着
させて積層させた種板製造用の母板についても提案され
ている。
In addition, we have also proposed a motherboard for manufacturing seed plates, in which the base of the motherboard is made of an insulating material, and a metal plate is laminated on the surface of the insulating material, either integrally during the molding of the motherboard or by bonding with an adhesive. has been done.

ところがこの従来の母板では、上記絶縁基体と金属板と
の積層構造に問題があり、すなわち前記型成形によるも
のはその製造特に後処理が面倒で高価につき、また接着
剤を使用するものでは、該接着剤が電極波によって侵さ
れるという問題がある。
However, with this conventional motherboard, there are problems with the laminated structure of the insulating substrate and the metal plate, namely, the manufacturing process, especially the post-processing, is troublesome and expensive in the molding method, and in the case of using an adhesive, There is a problem that the adhesive is attacked by the electrode waves.

本考案は以上の様な点に鑑み、軽量で取扱いが容易であ
り、また種板の剥離作業性も良好で、しかも母板基体の
ふっ素樹脂を含む絶縁性外皮部の表面に金属箔が熱圧着
により簡単且つ強固に取付けられた種板製造に用いる母
板を提供することを目的とするものである。
In view of the above points, the present invention is lightweight and easy to handle, has good peeling workability of the seed plate, and has a metal foil on the surface of the insulating outer skin containing fluororesin of the base plate. The object of the present invention is to provide a mother plate used for manufacturing seed plates that can be simply and firmly attached by pressure bonding.

次に、本考案に係る種板製造用母板の一実施例を図面に
ついて説明する。
Next, an embodiment of the mother plate for seed plate production according to the present invention will be described with reference to the drawings.

第1図は本考案に係る母板の正面図、第2図は同II
−II ’線における要部拡大断面図、第3図A。
Figure 1 is a front view of the mother plate according to the present invention, and Figure 2 is the same II.
FIG. 3A is an enlarged sectional view of the main part taken along the line -II'.

B、Cは母板の製作手順を示す説明図である。B and C are explanatory diagrams showing the manufacturing procedure of the mother plate.

図中1が母板で、この母板1は絶縁性材料による母板基
体2を有しており、該母板基体2としてこの実施例にお
いては第2図に示すように、塩化ビニール等のプラスチ
ック木材等の軽量な材料による芯材3と、この芯材3を
被包するふっ素樹脂を含むFRP材等による絶縁性外皮
部4とで構成されている。
In the figure, reference numeral 1 denotes a motherboard, and this motherboard 1 has a motherboard base 2 made of an insulating material. In this embodiment, as shown in FIG. It is composed of a core material 3 made of a lightweight material such as plastic wood, and an insulating outer skin part 4 made of an FRP material containing fluororesin, which encloses the core material 3.

上記構成による母板基体2の両面における両側縁部と下
縁部を残した内側には銅、チタン、スズ等による金属箔
5,5が熱圧着により圧着されており、こうして作られ
た母板1の上辺には逆U字状の母板懸吊りボン6が上記
金属箔5,5と接触するようにしてビス7止めされてい
る。
Metal foils 5, 5 made of copper, titanium, tin, etc. are bonded by thermocompression bonding to the inner side of both sides of the base plate base 2 having the above structure, leaving both side edges and the lower edge, and the base plate made in this way 1, an inverted U-shaped mother plate suspension bong 6 is fixed with screws 7 so as to be in contact with the metal foils 5, 5.

更に、上記母板懸吊りボン6内には母板支持ビーム8が
上記母板1の上辺と平行に通挿支持されており、上記母
板懸吊りボン6の基部側近傍における上記金属箔5,5
の面上には帯状の絶縁材9,9が母板1の上辺と平行に
被着されている。
Further, a mother plate support beam 8 is inserted and supported in the mother plate suspension bong 6 in parallel with the upper side of the mother plate 1, and the metal foil 5 near the base side of the mother plate suspension bong 6 is supported. ,5
Strip-shaped insulating materials 9, 9 are applied parallel to the upper side of the base plate 1 on the surface thereof.

然して、上記絶縁材9の下方に位置する金属箔5の表面
が種板を析出させる陰極とされ、この陰極は母板懸吊り
ボン6を介して母板支持ビーム8と電気的に接続されて
いる。
The surface of the metal foil 5 located below the insulating material 9 serves as a cathode for depositing the seed plate, and this cathode is electrically connected to the base plate support beam 8 via the base plate suspension bong 6. There is.

上記金属箔5として銅箔を用いて上記母板1を試作した
結果、基体2に厚さ70μの銅箔を熱盤プレスを使用し
、温度380℃、圧力50kg/cm2、時間3〜5分
間の条件で熱圧着させた場合、接着が均一で然も2.8
kg/cmの引剥がし強度が得られた。
As a result of trial manufacturing of the mother plate 1 using copper foil as the metal foil 5, a copper foil with a thickness of 70μ was applied to the base 2 using a hot platen press at a temperature of 380°C, a pressure of 50kg/cm2, and a time of 3 to 5 minutes. When thermocompression bonding was carried out under the conditions of 2.8
A peel strength of kg/cm was obtained.

尚この金属箔5の厚さは、25〜100ミクロンの範囲
とする。
Note that the thickness of this metal foil 5 is in the range of 25 to 100 microns.

上述した母板1を製作するにはまず、第3図Aに示すよ
うに基体2に金属箔5を熱圧着により圧着させることに
より被着させ、次に、第3図Bに示すように母板懸吊り
ボン6と母板支持ビーム8を取り付け、更に第3図Cに
示すように絶縁材9を被着させればよい。
To manufacture the above-mentioned base plate 1, first, as shown in FIG. 3A, the metal foil 5 is adhered to the base body 2 by thermocompression bonding, and then, as shown in FIG. The plate suspension bong 6 and the base plate support beam 8 are attached, and then an insulating material 9 is applied as shown in FIG. 3C.

こうして作られた母板1を電解液10内に沈めて絶縁材
9の範囲内に電解液10の液面10 aが位置するよう
にして該母板1を保持し、この母板1の金属箔5を陰極
として電圧を加えると、該金属箔5の表面に種板となる
金属が析出する。
The base plate 1 thus produced is submerged in the electrolytic solution 10, and the base plate 1 is held so that the liquid level 10a of the electrolytic solution 10 is located within the range of the insulating material 9. When a voltage is applied using the foil 5 as a cathode, a metal serving as a seed plate is deposited on the surface of the metal foil 5.

この析出した金属の厚さが約0.7mmになったら通電
をやめて、金属箔5の表面から析出した金属を機械的な
力を加えて剥離きせる。
When the thickness of the deposited metal reaches about 0.7 mm, the electricity is turned off and the deposited metal is peeled off from the surface of the metal foil 5 by applying mechanical force.

このとき、析出した金属は金属箔5の全体の大きさより
縦、横の巾が1〜2mm程度大きくなっている。
At this time, the length and width of the deposited metal are approximately 1 to 2 mm larger than the overall size of the metal foil 5.

このため機械的な力が母板基体2と剥離される金属との
間に加えられた場合であっても、金属箔5は傷つく虞は
なく。
Therefore, even if mechanical force is applied between the base plate base 2 and the metal to be peeled off, the metal foil 5 will not be damaged.

なぜならば、金属箔は、母板基体に熱圧着により圧着さ
れているため母板基体2と金属箔5の上面が、同一平面
上に位置しており(第2図)、剥離用容器器具は、外周
部の母板基体2を傷つけるだけに終るからである。
This is because the metal foil is bonded to the base plate by thermocompression bonding, so the top surfaces of the base plate 2 and the metal foil 5 are located on the same plane (Fig. 2), and the peeling container device is This is because it ends up only damaging the mother plate base 2 at the outer periphery.

またこの金属箔5は、ふっ素樹脂を含む母板基体の外皮
部4に熱圧着により被着され接着剤を使用する必要がな
いので、その被着作業が簡単且つ強固であり、長寿命化
が図れるものである。
In addition, this metal foil 5 is adhered to the outer skin 4 of the motherboard substrate containing fluororesin by thermocompression bonding, and there is no need to use an adhesive, so the attachment work is simple and strong, and the service life can be extended. It is something that can be achieved.

また母板基体2は従来の金属製と異なり絶縁性の材質で
あるため、この母体基体2に傷が生じても好ましい電解
操業が行い得る。
Further, since the base plate 2 is made of an insulating material unlike conventional metals, a preferable electrolytic operation can be performed even if the base plate 2 is damaged.

このため常に均一な種板が得られるものである。For this reason, a uniform seed plate can always be obtained.

さらに好ましいのは、母板としての寿命が飛躍的に伸び
、少なくとも1〜2年の寿命が期待できる点である。
What is more preferable is that the lifespan of the base plate is dramatically extended, and a lifespan of at least 1 to 2 years can be expected.

また母板1を構成する金属の割合が少なく、重量におい
ても従来の+程度とされるものであり、それだけ取り扱
いが容易となると共に、母板を操作するためのクレーン
等の装置も軽量用のもので良い。
In addition, the proportion of metal that makes up the base plate 1 is small, and the weight is said to be about the same as before, making it easier to handle, and equipment such as cranes for manipulating the base plate is also lighter. Anything is fine.

また、この実施例においては母板を一定の厚さにし、銅
電着による母体のそりを発生させないため基体2内に芯
材3が埋設される構成とされている。
Further, in this embodiment, the base plate is made to have a constant thickness, and the core material 3 is embedded in the base body 2 in order to prevent warping of the base body due to copper electrodeposition.

該芯材3としては耐酸性を考慮する必要がなく、それだ
け低置な素材を用いることができ、母板1を低コストで
提供することができる。
As the core material 3, there is no need to take acid resistance into consideration, and a low-lying material can be used, and the mother board 1 can be provided at low cost.

以上説明したように、本考案によれば、母板の基体を、
軽量材料よりなる芯材の外周面を絶縁性外皮部により被
包させた構造となし、その表面に熱圧着により100μ
以下の厚さとした金属箔を圧着させるようにしたので、
全体として軽量で取扱いも容易であって低コストで提供
することが出来、母板を操作するためのクレーン等の装
置においても軽量化を図ることが出来る効果がある。
As explained above, according to the present invention, the base of the mother plate is
The outer circumferential surface of the core material made of lightweight material is covered with an insulating outer skin part, and a 100μ
Since the metal foil with the following thickness was crimped,
Overall, it is lightweight and easy to handle, and can be provided at low cost, and has the effect of reducing the weight of devices such as cranes for operating the base plate.

また上記本考案によれば、母板基体の外皮部は、ふっ素
樹脂を含む絶縁材料により形成され、この外皮部に金属
箔が熱圧着により圧着されてなるものであるから、その
製造特に金属箔の固着作業が容易且つ能率的であるばか
りでなく、この熱圧着時におけるふっ素樹脂の溶融によ
り強固に一体化して固着され、しかも上記外皮部と金属
箔との間に酸に弱い接着剤を使用する必要がないところ
から構造的に堅牢で長寿命化が図れるという効果がある
Further, according to the present invention, the outer skin of the motherboard substrate is formed of an insulating material containing fluororesin, and the metal foil is bonded to the outer skin by thermocompression bonding, so that the manufacturing process, especially the metal foil, is difficult. Not only is the fixing work easy and efficient, but the fluororesin is melted during this thermocompression bonding to firmly integrate and fix, and an acid-resistant adhesive is used between the outer skin and the metal foil. This has the advantage of being structurally robust and extending its lifespan since there is no need to do so.

また基体の外皮部がふっ素樹脂系であるところから、耐
酸耐熱性に格段に優れ、しがも上記熱圧着作業も容易化
するという効果がある。
Furthermore, since the outer skin of the base is made of fluororesin, it has excellent acid resistance and heat resistance, and also has the effect of facilitating the above-mentioned thermocompression bonding work.

また上記金属箔の厚さは25〜100μとされていると
ころから、一般に金属箔として銅箔を用いる場合にはこ
の厚さのものが最も入手しやすく経済的であす、25μ
未満では所要の電流が流れにくい場合があるが本考案の
場合にはそのようなことはなく、100μを越えると重
量が重くなりまた基体との間に段差が生じて剥離性等が
悪くなるが、本考案の場合には軽量で剥離性も良好であ
る等実用上優れた効果がある。
In addition, since the thickness of the metal foil mentioned above is said to be 25 to 100μ, generally when copper foil is used as the metal foil, this thickness is the most easily available and economical, 25μ.
If the thickness is less than 100μ, it may be difficult for the required current to flow, but this does not occur in the case of the present invention. The present invention has excellent practical effects such as being lightweight and having good releasability.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本考案に係る母板の一実施例を示すものであり、第
1図は同母板の正面図、第2図は同IIII’線におけ
る要部拡大断面図、第3図A、B、Cは母板の製作手順
を示す説明図である。 1・・・・・・母板、2・・・・・・母板基体、3・・
・・・・芯材、4・・・・・・絶縁性外皮部、5・・・
・・・陰極としての金属箔。
The figures show an embodiment of the motherboard according to the present invention, and FIG. 1 is a front view of the motherboard, FIG. 2 is an enlarged cross-sectional view of the main part taken along line III', and FIGS. 3A and B. , C are explanatory diagrams showing the manufacturing procedure of the mother plate. 1...Mother board, 2...Mother board base, 3...
... Core material, 4 ... Insulating outer skin part, 5 ...
...Metal foil as a cathode.

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] (1)金属の電解精製に用いる種板製造に用いる母板に
おいて、該母板の基体は、軽量材料による芯材と、該芯
材の外周面を被包するふっ素樹脂を含む材料による絶縁
性外皮部とで構威され、この母板基板の表面には、厚さ
25〜100μの金属箔が熱圧着により圧着され、この
金属箔の表面が種板を析出させる陰極とされたことを特
徴とする種板構造に用いる母板。
(1) In the base plate used for manufacturing seed plates used in electrolytic refining of metals, the base plate has a core material made of a lightweight material and an insulating material made of a material containing fluororesin that covers the outer peripheral surface of the core material. A metal foil with a thickness of 25 to 100 μm is bonded to the surface of this mother plate by thermocompression bonding, and the surface of this metal foil is used as a cathode for depositing the seed plate. The base plate used for the seed plate structure.
(2)前記絶縁性外皮部は、ふっ素樹脂を含むFRP材
により形成された実用新案登録請求の範囲第1項記載に
よる種板製造に用いる母板。
(2) The insulating outer skin portion is a base plate used for manufacturing a seed plate according to claim 1, wherein the insulating outer skin portion is formed of an FRP material containing a fluororesin.
JP1980009672U 1980-01-31 1980-01-31 Mother plate used for seed plate production Expired JPS5815497Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1980009672U JPS5815497Y2 (en) 1980-01-31 1980-01-31 Mother plate used for seed plate production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1980009672U JPS5815497Y2 (en) 1980-01-31 1980-01-31 Mother plate used for seed plate production

Publications (2)

Publication Number Publication Date
JPS56115461U JPS56115461U (en) 1981-09-04
JPS5815497Y2 true JPS5815497Y2 (en) 1983-03-29

Family

ID=29606313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1980009672U Expired JPS5815497Y2 (en) 1980-01-31 1980-01-31 Mother plate used for seed plate production

Country Status (1)

Country Link
JP (1) JPS5815497Y2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002020862A (en) * 2000-07-06 2002-01-23 Sony Corp Sputtering system
JP6643196B2 (en) * 2016-06-29 2020-02-12 日立Geニュークリア・エナジー株式会社 Secondary waste elution and recovery device for chemical decontamination and chemical decontamination system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3331763A (en) * 1962-12-03 1967-07-18 Kennecott Copper Corp Blank for production of cathode starting sheets
JPS52127405A (en) * 1976-04-19 1977-10-26 Nippon Kobunshi Kagaku Kk Base plate for electrolytic refining

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5023307U (en) * 1973-06-28 1975-03-15

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3331763A (en) * 1962-12-03 1967-07-18 Kennecott Copper Corp Blank for production of cathode starting sheets
JPS52127405A (en) * 1976-04-19 1977-10-26 Nippon Kobunshi Kagaku Kk Base plate for electrolytic refining

Also Published As

Publication number Publication date
JPS56115461U (en) 1981-09-04

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