JPS58143531A - Surface treating device for wafer - Google Patents

Abstract

PURPOSE:To prevent the adhesion of foreign matters, and to improve the degree of washing by shifting the wafer to the next tank from a tank without being contacted with air. CONSTITUTION:The wafer treated with a chemical liquid in a chemical-liquid tank 10 is fed into a moving guide 15 by a feed-in pusher 16 from a receiving guide 14. When the feed-in pusher 16 is returned to an original position, a cover 24 falls, and contacts with a lower-surface plate 21. The lower-surface plate 21 and the cover 24 rise from the inside of the chemical-liquid tank 10 as the wafer is left as it enters into the chemical liquid by a shaft 22 for vertical movement. The wafer is moved to the upper section of a rinsing tank 11 by a shaft 23 for horizontal movement, and drops into the rinsing tank 11 by the shaft 22 for vertical movement, the cover 24 rises, and the chemical liquid is washed away by pure water in a moment.

Description

[Detailed description of the invention] The present invention relates to a wafer surface processing apparatus.

-In particular, in the production of Chihirotai products, the yield rate of the processing process for beef and sea urchin...
The question of whether or not you can go as far as you can go will be a budding success.

By the way, the 9eva cleaning process 11 usually consists of chemical treatment, water washing treatment, and e) continuous treatment. -tq; Defined, conventionally -1
A careful medicine cypress I that performs a VC1-based liquid treatment, and a water wash *t? T-friend flush tank 2 and [separately]
Handle 5 of cartridge 4 containing multiple wafers 3
Hold it with + and press it by hand ^ mechanically (take it out from article 4111 and transfer it to washing tank 2.

However, when replacing wafer 3 with wafer 3, wafer 3 is dispersed from the chemical solution and 7 is thrown into the air.
9. The surface of the sea urchin begins to dry, and water droplets condense on the surface of the sea urchin. Dust and other debris gathers in these water droplets and evaporates, forming a water mark.

This leads to a decrease in the wafer cleaning capacity and a decrease in the retention capacity.

The purpose of the present invention is to provide a wafer cleaning method that can be used to clean the wafer during the 1ITIe thinning process, prevent the adhesion of foreign particles to the wafer, and Ru.

Since this purpose belongs to tS, book address #4 is configured to #L so that it does not dry in the air, and the length is O.

Hereinafter, the present invention will be explained in detail as shown in the figure.
to look like.

Figure 2 is a diagonal m- showing the center and inner part of the 9-evaporation purifying device according to this example.

In this actual hrIVc, the wafer cleaning equipment can be broadly divided into wafers (chemical bath IO for washing chemical liquid with tin salt before washing, rinsing tank 11 for washing wafers, and these two cypresses 10 and IIc).
It consists of a moving mechanism 12 for changing the wafer from the chemical f/1 tank 10 to the washing tank 111C1, and a gutsher mechanism 13 for moving the wafer in the various parts 10.11.

Wafer r from the front vertical unit to the III Yakushomon 10K
Receiving and selling wafers [A receiving kite 14 that is easy to pull into the chemical solution tank 10, this receiving guide, and @4i111
A feeding pusher 16 is provided between the moving guide 15 of 112 and the moving guide 15 for 9 ejaculations. This I; Df-included bushing 16 is inserted into water & water 11 and 7tII-
Guide 15, dispensing guider 17 and 12) dispensing pusher 18 and linking shaft 1rL for transferring to i41te+7eha',
1) ct) Operated by the body system. In addition, code 1 change is 1
The pusher shaft 20 is a guide for the pusher.

- Part II - Reibutsu 12 is a part of the guide 15 (downward plate 21 to be fixed, vertical movement shaft 22 to move this lower plate 21 up and down) - horizontal # that allows 21 to move horizontally for 11 seconds A cover @ 24 to be placed over the wafer (the lower plate to be stored in the accommodated Sa guide 15') 21, a sales cover 112
．． 4k Equipped with a shaft 25 for vertical movement of the pot which can be moved up and down once. Fig. 3 (as shown in Fig.
1127ri of lk126 and cover 1124 [
Secret tif, 6! 9, d026 and 2'l (D@
@Sensitive $1 Cuff-t ti j [fT Th M) One stroke is applied by the spring contact 28.

Ill wash 1tlj, unload the wafer from the above-mentioned washing tank 11 to the subsequent unit) @ ``J In
: Penalty payout guide 17 and payout button 18
A, a pure water outlet 21j and a drain port 30 are provided to supply clean pure water. 1 liter, industrial waste lO and washing tank 1
1 and 31 water prevention plates are placed in the darkness.

About the action of the first real m--J Kyauchi~ (I will explain about the action. First, the 117t wafer to be treated with a chemical solution in the chemical solution tank 10 is fed from the receiving guide 14 with the pusher 16.
Sent to J@Guide 15. Feeding button shear 16
When it returns to the original position t, it descends from the state shown in Fig. 3 (A) and comes into contact with the lower plate 21 as shown in Fig. 3 (Fig. 3).

Therefore, [as shown in Figure 3 (0) K, the bottom plate 21
The covering pot 24 is connected to the chemical liquid tank 1 by the shaft 22 for vertical movement.
It rises from within 0 and emerges into the air. At this time, lower plate 2
1's rkJ28 and cover 1k24's (1127 and almost contact 28, and water C) 懺thII
Because of the effort involved, the chemical agent G does not leak from between surfaces 26 and 27, and the wafer remains completely immersed in the chemical agent.

In this state, the S guide 15, the downward plate 21, and the cover 24 are moved from the position shown in FIG. Washing tank 11
When you move to the 9th lower leg position 1, the Kapze pouch 24 will open as shown in Figure 3 (
1) K rises as shown, the chemical solution is washed away with water, and the wafer is held on the transfer guide 1s on the lower plate 2i and washed with water for 7t, leaving it in a clean state.

70@, the wafer is moved by the payout pusher 18 for 1s
#LlIL is sent to the payout guide x7, and the unit K of Fuyuki (not shown) is paid out.

Book 1! According to HFIK, wafers are always soaked in a chemical solution or pure water, and then placed in a washing tank 1. Since it does not appear in 9 even during the time when the calyx is replaced, the 9M table in this case -〇
The cleaning layer is removed and the cleaning layer is extremely thin, which improves the yield.

This is the original @ frame, square, f cleaning, etching, etc. clothes aiwt
It can be overused in t-conducting tin salt equipment.

As explained above, with one-shot #4, it is possible to wash the sea urchins with a high degree of cleaning without any abnormal adhesion, and it is possible to wash the mackerel and increase the yield rate P (same as above).

[Brief explanation of drawings]

Summary 1 - Healthy O wafer cleaning trowel 10 - Horizontal view, Ugly 2 view α book'
#, A sea urchin I/cleaning device in an example of Ming [91N shown]
4 tank diagrams, 3 diagrams (3) to (g)) are the reasons for the rotation of the phenol in the present invention and Table 1. lO...Prefectural liquid tower, 11...Washing tank, 12...#@
* Structure, 13...butsusha-41! Bridge, 14... Acceptance guide, 15... Hiragi Kan guide, 16... Infeed button shear - 117... Output guide, 18... Output button shear - 119... 1 shaft in the middle of the shear, 20.・・１
Guide for shear, 21...) Direction plate, 22...
・Shaft for vertical movement, 23...Horizontal mating a#$4 shaft, 24...Folding metal, 25...Shaft for vertical movement of mounting, 26...plane, 21...plane, 28...pure water person 0
130...Firewood water outlet, 31...Water leak prevention plate. Figure 1

Claims (1)

[Scope of Claims] 1. In a wafer surface processing @cage where fi [10 wafers are processed using a tank with kllll number of wafers], wafers [means to be transferred from one hinoki to the next hinoki without being exposed to air. Wafer and surface processing equipment that produces t% images.