JPS625675B2 - - Google Patents

Info

Publication number
JPS625675B2
JPS625675B2 JP8126078A JP8126078A JPS625675B2 JP S625675 B2 JPS625675 B2 JP S625675B2 JP 8126078 A JP8126078 A JP 8126078A JP 8126078 A JP8126078 A JP 8126078A JP S625675 B2 JPS625675 B2 JP S625675B2
Authority
JP
Japan
Prior art keywords
cleaning
tank
steam
cleaning tank
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8126078A
Other languages
Japanese (ja)
Other versions
JPS558833A (en
Inventor
Shigekichi Inokoshi
Juji Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP8126078A priority Critical patent/JPS558833A/en
Publication of JPS558833A publication Critical patent/JPS558833A/en
Publication of JPS625675B2 publication Critical patent/JPS625675B2/ja
Granted legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Description

【発明の詳細な説明】 本発明は電子部品、機械部品等の洗浄方法に関
する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for cleaning electronic parts, mechanical parts, etc.

従来、電子部品、機械部品等の洗浄には汚染の
種類、例えばフラツクス、油、研摩粉など、に応
じて適当な溶剤を使用し、被洗浄物を溶剤に浸漬
したり又は溶剤の蒸気、スプレーにあてることに
より実施していた。例えば、回路基板半田付後の
フラツクスの溶剤による洗浄においては、蒸気洗
浄又は浸漬洗浄による一槽式洗浄、これらを組合
せた二槽式洗浄が大部分であつた。しかし、一槽
式洗浄では洗浄液の汚れが早く、従つてまた洗浄
時間の管理が難しい、及び被洗浄物の汚れが落ち
にくいなどの欠点があつた。また二槽式洗浄にお
いても最初に浸漬洗浄を行なう場合には浸漬洗浄
槽の洗浄液の汚れが激しく、処理量の増加ととも
に洗浄能力が著しく低下する。他方、最初に蒸気
洗蒸を行なう場合には蒸気洗浄槽の洗浄液の汚れ
が激しいが、常に清浄な蒸気が被洗浄物に当る。
しかしこの場合も、蒸気洗浄のみで完全に汚れを
落すことはできないので、次の浸漬槽に徐々に汚
れが蓄積し処理量の増加とともに洗浄能力が低下
する。
Conventionally, when cleaning electronic parts, mechanical parts, etc., an appropriate solvent is used depending on the type of contamination, such as flux, oil, abrasive powder, etc., and the object to be cleaned is immersed in the solvent, or the object is immersed in the solvent or sprayed with solvent vapor or spray. This was done by focusing on For example, when cleaning flux with a solvent after soldering a circuit board, most of the methods used are one-tank cleaning using steam cleaning or immersion cleaning, and two-tank cleaning using a combination of these. However, the one-tank type cleaning has disadvantages such as the cleaning solution gets dirty quickly, making it difficult to control the cleaning time, and making it difficult to remove the stains from the objects to be cleaned. Further, in the case of two-tank cleaning, when immersion cleaning is performed first, the cleaning liquid in the immersion cleaning tank becomes heavily contaminated, and the cleaning ability decreases significantly as the throughput increases. On the other hand, when steam cleaning is performed for the first time, the cleaning liquid in the steam cleaning tank is heavily contaminated, but clean steam always hits the object to be cleaned.
However, in this case as well, it is not possible to completely remove dirt by steam cleaning alone, so dirt gradually accumulates in the next immersion tank, and the cleaning ability decreases as the throughput increases.

このように従来の洗浄方法にはいずれも洗浄液
が汚れるという問題点があり、従つて被洗浄物の
汚れ落ちが完全ではなく、また洗浄液の交換に多
くの時間をついやすなど能率的ではなかつた。
As described above, all of the conventional cleaning methods have the problem that the cleaning liquid gets dirty, and therefore the stains on the object to be cleaned are not completely removed, and it is not efficient as it takes a lot of time to replace the cleaning liquid.

本発明の目的は従来のかかる欠点に鑑みて洗浄
液の交換が最も少なく、能率的に完全な洗浄が行
なえる洗浄方法を提供することである。
SUMMARY OF THE INVENTION In view of the above-mentioned drawbacks of the conventional methods, it is an object of the present invention to provide a cleaning method that requires minimal replacement of cleaning fluid and can perform efficient and complete cleaning.

即ち、本発明の洗浄方法は第1及び第2蒸気洗
浄槽並びに浸漬超音波洗浄槽に同種洗浄液を入
れ;該洗浄液を両蒸気洗浄槽で蒸気とし且つその
槽上部で凝縮させて浸漬超音波洗浄槽にもどし、
少なくとも第1蒸気洗浄槽下部から洗浄液を浄化
装置に送つて蒸留することにより清浄化された洗
浄液を浸漬超音波洗浄槽にもどし、並びに浸漬超
音波洗浄槽から洗浄液を少なくとも片方の蒸気洗
浄槽にオーバーフローさせながら;被洗浄物を第
1蒸気洗浄槽、浸漬超音波洗浄槽及び第2蒸気洗
浄槽の順序にて洗浄することを特徴とする。
That is, in the cleaning method of the present invention, the same type of cleaning liquid is placed in the first and second steam cleaning tanks and the immersion ultrasonic cleaning tank; the cleaning liquid is turned into steam in both steam cleaning tanks, and is condensed at the upper part of the tank to perform immersion ultrasonic cleaning. Return it to the tank,
The cleaning liquid is sent from the lower part of at least the first steam cleaning tank to the purifier and the cleaning liquid purified by distillation is returned to the immersion ultrasonic cleaning tank, and the cleaning liquid overflows from the immersion ultrasonic cleaning tank to at least one of the steam cleaning tanks. The object to be cleaned is cleaned in the order of the first steam cleaning tank, the immersion ultrasonic cleaning tank, and the second steam cleaning tank.

次に図面により本方法を詳しく説明する。添付
図面は本方法を実施するための洗浄装置の一具体
例を示す。この洗浄装置は第1蒸気洗浄槽10、
浸漬超音波洗浄槽20及び第2蒸気洗浄槽30を
含む。それぞれの槽には同種洗浄液、例えばフレ
オンが適当量入れられている。第1蒸気洗浄槽1
0の洗浄液11はヒーター12で加熱されて蒸気
となる。この蒸気の洗浄に寄与しなかつた部分は
槽上部のコンデンサコイル13に当つて凝縮さ
れ、清浄な洗浄液が環流路14を通つて浸漬超音
波洗浄槽20に送られる。同様の洗浄液の移動が
第2蒸気洗浄槽30においてもヒーター32、コ
ンデンサコイル33及び環流路34によつて行な
われる。
The method will now be explained in detail with reference to the drawings. The accompanying drawing shows an example of a cleaning device for carrying out the method. This cleaning device includes a first steam cleaning tank 10,
It includes an immersion ultrasonic cleaning tank 20 and a second steam cleaning tank 30. Each tank contains an appropriate amount of a similar cleaning solution, such as Freon. First steam cleaning tank 1
0 cleaning liquid 11 is heated by a heater 12 and becomes vapor. The portion of the steam that does not contribute to cleaning is condensed by the condenser coil 13 at the top of the tank, and the clean cleaning liquid is sent to the immersion ultrasonic cleaning tank 20 through the circulation path 14. Similar movement of the cleaning liquid is performed in the second steam cleaning tank 30 by the heater 32, the condenser coil 33, and the circulation path 34.

被洗浄物(図示せず)はコンベア1に取り付け
たハンガー2に取り入れ装置3により自動的に装
着され第1蒸気洗浄槽10、浸漬超音波洗浄槽2
0及び第2蒸気洗浄槽30の順に送られ、取り出
し装置4で自動的にハンガー2からはずされる。
この取り入れ装置3及び取り出し装置4は当分野
で公知である。第1蒸気洗浄槽10では、常温の
被洗浄物に高温の洗浄液蒸気が当つて凝縮し、し
ずくとなつて落下するとき表面の汚れを洗い落
す。従つて、被洗浄物が蒸気温度に達するまで洗
浄能力があり、しかも蒸気は常に汚れを含まない
清浄な状態である。この第1蒸気洗浄槽10で約
80〜90%の汚れが落ちる。被洗浄物は次に浸漬超
音波洗浄槽20に入り、超音波発振器22の作用
で残つている汚れが除去される。浸漬超音波洗浄
槽20で再びほぼ常温まで冷やされた被洗浄物は
最後に第2蒸気洗浄槽30で仕上げ洗浄される。
各槽での保持時間は被洗浄物の種類、汚れの程度
等により異なるが通常は順に2分、1分及び2分
である。
The object to be cleaned (not shown) is taken into a hanger 2 attached to a conveyor 1 and is automatically attached by a device 3 to a first steam cleaning tank 10 and an immersion ultrasonic cleaning tank 2.
0 and the second steam cleaning tank 30 in this order, and is automatically removed from the hanger 2 by the take-out device 4.
This intake device 3 and extraction device 4 are known in the art. In the first steam cleaning tank 10, the high-temperature cleaning liquid vapor hits the object to be cleaned at room temperature and condenses, and when it falls as droplets, dirt on the surface is washed away. Therefore, the cleaning ability is maintained until the object to be cleaned reaches the steam temperature, and the steam is always clean and free of dirt. In this first steam cleaning tank 10, approximately
Removes 80-90% of dirt. The object to be cleaned then enters an immersion ultrasonic cleaning bath 20, where remaining dirt is removed by the action of an ultrasonic oscillator 22. The object to be cleaned, which has been cooled again to approximately room temperature in the immersion ultrasonic cleaning tank 20, is finally finished cleaned in a second steam cleaning tank 30.
The holding time in each tank varies depending on the type of the object to be cleaned, the degree of dirt, etc., but is usually 2 minutes, 1 minute, and 2 minutes in that order.

上記の洗浄工程により最も洗浄液が汚れるのは
第1蒸気洗浄槽10である。そこで、少なくとも
第1蒸気洗浄槽10の洗浄液11は槽下部の管1
5から浄化装置(図示せず)に送られ、ここで蒸
留により清浄化される。第2蒸気洗浄槽30の洗
浄液31及び更には浸漬超音波洗浄槽20の洗浄
液21も同じ浄化装置に送つて清浄化してもよ
い。このようにして清浄化された洗浄液は全て浸
漬超音波洗浄槽20に送られる。従つて上記環流
路14,34及び浄化装置から常に清浄な洗浄液
が浸漬超音波洗浄槽20に供給される。故に、本
方法では浸漬超音波洗浄槽20はほとんど清浄に
保つことが出来る。常に清浄な洗浄液が供給され
ている浸漬超音波洗浄槽20の洗浄液21は第1
及び第2蒸気洗浄槽10及び30の両方又は片方
にオーバーフローされる。片方のみにオーバーフ
ローさせる場合には、第2蒸気洗浄槽30にオー
バーフローさせ、この槽から管35を通して洗浄
液31を第1蒸気洗浄槽10に送るのが好まし
い。この好ましい具体例において、全洗浄液量を
約500とすれば洗浄液の一般的流量は例えば、
第1蒸気洗浄槽10から浄化槽に約50/Hr、
浄化槽から浸漬超音波洗浄槽20に約50/
Hr、第1及び第2蒸気洗浄槽10,30から凝
縮により浸漬超音波洗浄槽20にそれぞれ約40
/Hr、浸漬超音波洗浄槽20から第2蒸気洗
浄槽30に約130/Hr、及び第2蒸気洗浄槽3
0から第1蒸気洗浄槽に約90/Hrである。
The first steam cleaning tank 10 is the one where the cleaning liquid is most contaminated by the above cleaning process. Therefore, at least the cleaning liquid 11 in the first steam cleaning tank 10 is supplied to the pipe 1 at the bottom of the tank.
5 to a purifier (not shown) where it is purified by distillation. The cleaning liquid 31 of the second steam cleaning tank 30 and further the cleaning liquid 21 of the immersion ultrasonic cleaning tank 20 may also be sent to the same purification device for cleaning. All of the cleaning liquid thus cleaned is sent to the immersion ultrasonic cleaning tank 20. Therefore, clean cleaning liquid is always supplied to the immersion ultrasonic cleaning tank 20 from the circulation channels 14 and 34 and the purification device. Therefore, with this method, the immersion ultrasonic cleaning tank 20 can be kept almost clean. The cleaning liquid 21 of the immersion ultrasonic cleaning tank 20 to which a clean cleaning liquid is always supplied is the first one.
and overflows into both or one of the second steam cleaning tanks 10 and 30. When overflowing to only one side, it is preferable to overflow to the second steam cleaning tank 30 and sending the cleaning liquid 31 from this tank to the first steam cleaning tank 10 through the pipe 35. In this preferred embodiment, the typical flow rate of the cleaning fluid is, for example, assuming a total cleaning fluid volume of approximately 500.
Approximately 50/Hr from the first steam cleaning tank 10 to the septic tank,
Approximately 50/- from the septic tank to the immersion ultrasonic cleaning tank 20
Hr, about 40
/Hr, about 130/Hr from the immersion ultrasonic cleaning tank 20 to the second steam cleaning tank 30, and the second steam cleaning tank 3
90/Hr from 0 to the first steam cleaning tank.

以上具体例の説明はハンガー付タクトコンベア
を設置した装置で行なつたが、ハンガーのないネ
ツトコンベアあるいはクランクモーシヨン方式の
被処理物搬送手段を装備したものでもよい。この
ような搬送手段を装備した自動洗浄方法は洗浄液
の人体に対する影響がないため好ましいが、無論
手作業洗浄であつてもよい。
Although the specific example has been described above using an apparatus equipped with a tact conveyor with a hanger, it is also possible to use an apparatus equipped with a net conveyor without a hanger or a crank motion method for conveying the processed material. An automatic cleaning method equipped with such a conveyance means is preferable because the cleaning liquid does not affect the human body, but manual cleaning may of course be used.

また、本方法はプリント基板の半田付け作業後
におけるフラツクス除去のための洗浄に好適であ
る。
Furthermore, this method is suitable for cleaning to remove flux after soldering a printed circuit board.

本発明によれば短時間で完全な洗浄が出来、洗
浄液の管理も容易であり、従つて生産性及び信頼
性を向上させることができる。本発明では洗浄液
の汚れが少なく、従つて液交換の頻度が従来より
も極めて少ない。具体的には第1蒸気洗浄槽及び
浄化槽で洗浄液交換が必要であり、プリント基板
の洗浄実験の結果として洗浄面積約3m2/、プ
リント基枚数にして約14000枚の洗浄まで洗浄液
交換をしなくても何ら支障なく良好な洗浄効果が
得られた。
According to the present invention, complete cleaning can be performed in a short time, cleaning liquid can be easily managed, and therefore productivity and reliability can be improved. In the present invention, there is less dirt in the cleaning liquid, and therefore the frequency of liquid replacement is much less than in the past. Specifically, it is necessary to replace the cleaning solution in the first steam cleaning tank and the septic tank, and as a result of a printed circuit board cleaning experiment, it was found that the cleaning solution was not replaced until the cleaning area was approximately 3 m 2 / and the number of prints was approximately 14,000 sheets. A good cleaning effect was obtained without any problems.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本方法を実施するための洗浄装置の一具
体例を示す概略断面図である。 10……第1蒸気洗浄槽、20……浸漬超音波
洗浄槽、30……第2蒸気洗浄槽。
The drawing is a schematic sectional view showing a specific example of a cleaning device for carrying out the present method. 10...first steam cleaning tank, 20...immersion ultrasonic cleaning tank, 30...second steam cleaning tank.

Claims (1)

【特許請求の範囲】[Claims] 1 同種洗浄液を入れた第1蒸気洗浄槽、浸漬超
音波洗浄槽及び第2蒸気洗浄槽をこの順序に設置
し;第1及び第2蒸気洗浄槽から蒸発する洗浄液
をその洗浄槽上で凝縮させて中央の浸漬超音波洗
浄槽に戻し;浸漬超音波洗浄槽から洗浄液を第2
蒸気洗浄槽にのみオーバーフローさせ;第2蒸気
洗浄槽から洗浄液を第1蒸気洗浄槽に供給し;第
1蒸気洗浄槽の下部から汚れた洗浄液を浄化装置
に送つて蒸留し、清浄化された洗浄液を中央の浸
漬超音波洗浄槽に戻し;及び、このように洗浄液
を循環させながら、被洗浄物を第1蒸気洗浄槽、
浸漬超音波洗浄槽及び第2蒸気洗浄槽の順序にて
洗浄することを特徴とする洗浄方法。
1 A first steam cleaning tank containing the same type of cleaning liquid, an immersion ultrasonic cleaning tank, and a second steam cleaning tank are installed in this order; the cleaning liquid evaporated from the first and second steam cleaning tanks is condensed on the cleaning tank. and return it to the central immersion ultrasonic cleaning tank;
Overflow only to the steam cleaning tank; supply the cleaning liquid from the second steam cleaning tank to the first steam cleaning tank; send the dirty cleaning liquid from the lower part of the first steam cleaning tank to the purification device and distill it to obtain the purified cleaning liquid is returned to the central immersion ultrasonic cleaning tank; and, while circulating the cleaning liquid in this way, the object to be cleaned is returned to the first steam cleaning tank,
A cleaning method characterized by cleaning in the order of an immersion ultrasonic cleaning tank and a second steam cleaning tank.
JP8126078A 1978-07-04 1978-07-04 Method of washing Granted JPS558833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8126078A JPS558833A (en) 1978-07-04 1978-07-04 Method of washing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8126078A JPS558833A (en) 1978-07-04 1978-07-04 Method of washing

Publications (2)

Publication Number Publication Date
JPS558833A JPS558833A (en) 1980-01-22
JPS625675B2 true JPS625675B2 (en) 1987-02-05

Family

ID=13741394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8126078A Granted JPS558833A (en) 1978-07-04 1978-07-04 Method of washing

Country Status (1)

Country Link
JP (1) JPS558833A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60136288A (en) * 1983-12-23 1985-07-19 松下電器産業株式会社 Flexible printed circuit board
JPS60119987U (en) * 1984-01-18 1985-08-13 株式会社 イズミフ−ドマシナリ Stationary cleaning equipment
JPH0341487Y2 (en) * 1985-06-04 1991-08-30
JPS61183312U (en) * 1986-04-15 1986-11-15
JPH0425271Y2 (en) * 1987-01-27 1992-06-16
JPH0534127Y2 (en) * 1987-06-27 1993-08-30

Also Published As

Publication number Publication date
JPS558833A (en) 1980-01-22

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