JPS58135632A - インジウム−アンチモン−ヒ素系化合物薄膜の製造方法 - Google Patents
インジウム−アンチモン−ヒ素系化合物薄膜の製造方法Info
- Publication number
- JPS58135632A JPS58135632A JP57018375A JP1837582A JPS58135632A JP S58135632 A JPS58135632 A JP S58135632A JP 57018375 A JP57018375 A JP 57018375A JP 1837582 A JP1837582 A JP 1837582A JP S58135632 A JPS58135632 A JP S58135632A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- antimony
- deposited
- arsenic
- indium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/002—Controlling or regulating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- Hall/Mr Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57018375A JPS58135632A (ja) | 1982-02-08 | 1982-02-08 | インジウム−アンチモン−ヒ素系化合物薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57018375A JPS58135632A (ja) | 1982-02-08 | 1982-02-08 | インジウム−アンチモン−ヒ素系化合物薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58135632A true JPS58135632A (ja) | 1983-08-12 |
| JPH0247850B2 JPH0247850B2 (enExample) | 1990-10-23 |
Family
ID=11969960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57018375A Granted JPS58135632A (ja) | 1982-02-08 | 1982-02-08 | インジウム−アンチモン−ヒ素系化合物薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58135632A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61259583A (ja) * | 1985-05-14 | 1986-11-17 | Asahi Chem Ind Co Ltd | 半導体磁電変換素子 |
-
1982
- 1982-02-08 JP JP57018375A patent/JPS58135632A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61259583A (ja) * | 1985-05-14 | 1986-11-17 | Asahi Chem Ind Co Ltd | 半導体磁電変換素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0247850B2 (enExample) | 1990-10-23 |
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