JPS58132751A - Electrophotographic receptor - Google Patents
Electrophotographic receptorInfo
- Publication number
- JPS58132751A JPS58132751A JP1514582A JP1514582A JPS58132751A JP S58132751 A JPS58132751 A JP S58132751A JP 1514582 A JP1514582 A JP 1514582A JP 1514582 A JP1514582 A JP 1514582A JP S58132751 A JPS58132751 A JP S58132751A
- Authority
- JP
- Japan
- Prior art keywords
- photoconductor
- layer
- photoreceptor
- silane coupling
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/005—Materials for treating the recording members, e.g. for cleaning, reactivating, polishing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は電子写′ic感光体に関する。[Detailed description of the invention] The present invention relates to an electrophotographic photoreceptor.
電子写真感光体は、所定の特性を得るため、あるいは適
用される電子写真プロセスの種類に応じてIIII増の
構Iii、をとるものである。そして、鬼子写真感光体
の代表的なものとして、支持体上に光導電層が形成され
ている感光体および表向に絶縁層を備え友感光体かあ夛
、広く用いられている。支持体と先導電層から構成され
る感光体は、蝋も一般的な蒐子与真プロセスによる即ち
、#電、画像露光および現儂、−に必要に応じて転写に
よる画儂形成に用いられる。また絶縁層を備えた感光体
について、この絶縁ノーは光導電層の保、11.感光体
の機械的強度の改善、暗減衰特性の改善、または、特定
の電子写真プロセスに適用されるため(虹には無公害化
の為)等の目的のために設けられるものである。このよ
うな絶縁−を有する感光体または、絶縁j―を有する感
光体を用いる電子写真プロセスの代表的な例は1例えば
、米国特許第2860048号公報、特公昭41−16
429号公報、特公昭38−15446号公報、%公開
46−3713号会報、特公昭42−23910−j;
公報、特公昭43−24748号公報、時分昭乾−19
747号公報1%公昭36−4121号公報、などに記
載されている。The electrophotographic photoreceptor adopts a structure of III increase in order to obtain predetermined characteristics or depending on the type of electrophotographic process to which it is applied. As typical examples of Oniko photographic photoreceptors, photoreceptors having a photoconductive layer formed on a support and friendly photoreceptors having an insulating layer on the surface are widely used. The photoreceptor, which is composed of a support and a leading conductive layer, is coated with wax according to the general Mako-Yoma process, that is, #electrode, image exposure, and image formation by transfer as necessary. . Also, for photoreceptors with an insulating layer, this insulation condition is due to the protection of the photoconductive layer, 11. It is provided for the purpose of improving the mechanical strength of the photoreceptor, improving the dark decay characteristics, or being applied to a specific electrophotographic process (for rainbow purposes, it is pollution-free). A representative example of an electrophotographic process using a photoreceptor having such insulation or a photoreceptor having insulation is 1, for example, U.S. Pat.
429 Publication, Special Publication No. 38-15446, % Publication No. 46-3713 Bulletin, Special Publication No. 42-23910-j;
Publication, Special Publication No. 43-24748, Time-Bun Shoken-19
It is described in Publication No. 747, 1% Publication No. 36-4121, etc.
電子写真感光体ij、当然のことであるが、適用される
電子写真プロセスに応じ九所定の感匿電気特性、−には
光学特性を備えていることが要求される。しかし、それ
ばかりでなく、感光体の耐湿性も重要な性質である。低
湿において優れた颯子写A%性を備えていても、高湿下
で感光体表向電位が着しく低下す”る感光体においてに
、安定した鮮明な画像を侍ることが困−でめ60また、
転写を行51子写真プロセスでは。As a matter of course, the electrophotographic photoreceptor ij is required to have nine predetermined sensitive electrical properties and optical properties depending on the electrophotographic process to which it is applied. However, not only that, but also the moisture resistance of the photoreceptor is an important property. Even if a photoreceptor has excellent image quality at low humidity, it is difficult to produce stable and clear images with a photoreceptor whose surface potential drops significantly under high humidity.60 Also,
In the 51 child photo process, the transfer is done.
通常感光体rI繰り返し便用さnるため、感光体の帯電
劣化により、さらに耐湿性が低下することが多い0この
ような耐湿性の低下に対しては感光体をヒーターで加温
し、除湿を行うことによっである根震改讐さ扛るが、−
1れでも常に安ボした鮮明な画像を得るためには十分で
はなく、且つ、常にヒーターを作動させなければならな
いため、コストアップの豊凶となるものでめる0このよ
りな高湿下での表向電位低下は、光導電材料と結着剤か
らなる光導電層の場合、結着剤倒置の選択によりある1
F!4IIIL改善されるが、さらに光導電層の局所的
なブレークダウンの現象により、−鍵上に細かい白班点
が現われるという間趙が残されている0これは、結着剤
樹脂のような嶋分子j1qIIJ實にνいては光導電材
料表向を十分に被覆し、水分子の攻撃を防ぐことが困難
でめるためと考えられる0
而して本@明は、帯湿性に優れ、且つ、尚感度な電子写
真感光体を提供することを王たる目的とする。Normally, the photoconductor is used repeatedly, so its moisture resistance often decreases due to charging deterioration of the photoconductor.To prevent such a decrease in moisture resistance, heat the photoconductor with a heater and dehumidify it. By doing this, a certain fundamental vengeance is achieved, but -
Even one of these is not enough to obtain clear images at all times, and the heater must be operated all the time, which increases costs. In the case of a photoconductive layer consisting of a photoconductive material and a binder, the surface potential decrease is determined by the choice of inversion of the binder1.
F! 4IIIL is improved, but furthermore due to the phenomenon of local breakdown of the photoconductive layer - fine white specks appear on the keys. In fact, this is thought to be because it is difficult to sufficiently cover the surface of the photoconductive material and prevent attack by water molecules. The main objective is to provide a sensitive electrophotographic photoreceptor.
本発明は光導電材料と結合剤とからなる光導電層を有す
る電子写真感光体において、元24電層の上層部に貧有
される光導電材料がシランカップリング剤で表面処理さ
れたものでりることt−%黴とするものである。The present invention relates to an electrophotographic photoreceptor having a photoconductive layer consisting of a photoconductive material and a binder, in which the photoconductive material contained in the upper layer of the original 24-electrode layer is surface-treated with a silane coupling agent. % mold.
即ち、本発明においては、シランカップリング剤を用い
て光導電材料を表面処理することによって、耐湿性の向
上を達成Tると共に、もし、光導電層中の全ての光導電
材料をシランカップリング剤で被覆すれに、光導電材料
の粒子間の障壁が尚くなり、光キャリヤーの移動贋が小
に含有させることに止め、表向処理さnない光4#蝋材
料を下層に貧有させることにより、Sb温湿下安定した
鮮明な@像か得られ、且つ、十分な感震t−有する感光
体を提供することができるものである。That is, in the present invention, improvement in moisture resistance is achieved by surface-treating the photoconductive material using a silane coupling agent. After being coated with the agent, the barrier between the particles of the photoconductive material is further broken down, the migration of the optical carriers is limited to a small amount, and the untreated optical 4# wax material is present in the lower layer. As a result, it is possible to provide a photoreceptor that can provide a clear image that is stable under Sb temperature and humidity conditions, and has sufficient vibration sensitivity.
また、表面処理を行った光導電材料は、M層剤中への分
散性が向上し、几専電層塗布面の平滑性に浚扛るたわ、
光4#1ノー上部にS縁層を塗布する感光体においては
、その塗布性が良好となるものである。In addition, the surface-treated photoconductive material has improved dispersibility in the M layer agent, and the smoothness of the surface coated with the layer has been improved.
In a photoreceptor in which the S edge layer is coated on the upper part of the photoreceptor 4#1, the coatability thereof is good.
っている。ing.
Ya8iX。Ya8iX.
xFiけい素原子に結合している加水分解基で開業的に
はクロル基、アルコキシ基、アセトキシ基などがめる。xFi is a hydrolyzable group bonded to a silicon atom, and commercially includes a chloro group, an alkoxy group, an acetoxy group, etc.
Yri有慎有能官能基ビニル基、メタクリル基、エポキ
シ基、グリシドキシ基、アミノ基、メルカプト基、メチ
ル基などがあり、特に、r−グリシドキシグロビル基、
ビニル基、β−(3,4−エポキシシクロヘキシル)基
、メチル基、r−メタアクリルオヤシグロビル基が好適
で6る・7ランカツプリング剤は水分により加水分解し
シラノール基金生成する◎このシラノール基が無機相に
対する化学結合をもたらす0YR8iX、 +3H,0
→YfL8i (OH)、 + 3 HXこの様にして
シランカップリング剤で表向処理した光導電材料は次の
様に改善される。Yri has modest functional groups such as vinyl group, methacrylic group, epoxy group, glycidoxy group, amino group, mercapto group, methyl group, and especially r-glycidoxyglobin group,
Vinyl group, β-(3,4-epoxycyclohexyl) group, methyl group, and r-methacryloyasiglovir group are preferable, and the 6- and 7-run coupling agents are hydrolyzed by moisture to generate a silanol fund.◎This silanol 0YR8iX, +3H,0 where the group provides a chemical bond to the inorganic phase
→YfL8i (OH), + 3 HX The photoconductive material surface-treated with a silane coupling agent in this manner is improved as follows.
l)結着樹脂との親和性が改善される。l) Affinity with the binder resin is improved.
2)水に対する防壁作用を生じて耐湿性が増す。2) Produces a barrier effect against water and increases moisture resistance.
このため、これらの砿構の幾つかが同時に作用して、結
合剤中における光導電材料の分散性が向上し、また、水
に対する防壁が出来るfcめ、結合剤の環境安定性と相
乗的な効果で電子写・真感光体の湿f%性は飛緒的に同
上する〇表向処理を行なうシランカップリング剤は光導
電材料100菖amに対し1〜51Ffi部の範囲での
り、通常5%以上の浴歇で使用する。Therefore, several of these structures act simultaneously to improve the dispersion of the photoconductive material in the binder, and also to provide a barrier against water, which has a synergistic effect on the environmental stability of the binder. Due to the effect, the humidity f% property of electrophotographic/photosensitive materials is the same as above. The silane coupling agent used for surface treatment is applied in a range of 1 to 51 Ffi parts per 100 am of photoconductive material, and usually 5 % or more.
表向処理を施δれる光導電材料としては例え等の結晶性
粒子があるり
光導電層の形成に用いられる結9Iit樹脂としては通
常の谷柚絶鰍彌脂が用いられる。例えばポリエチレン、
ポリエステル、ポリプロピレン。Examples of the photoconductive material to be subjected to the surface treatment include crystalline particles such as eg, and ordinary taniyuzuzetsuanyahi resin is used as the resin used for forming the photoconductive layer. For example, polyethylene
Polyester, polypropylene.
ポリスチレン、ポリ塩化ビニール、ポリ酢酸ビニール、
アクリル11m、ポリカーボネート、シリコン−廁、弗
素両線、エポキシ樹脂等である。polystyrene, polyvinyl chloride, polyvinyl acetate,
Acrylic 11m, polycarbonate, silicone, fluorine wire, epoxy resin, etc.
中でも光導電JK料を表面処理しない場合でもめる春夏
の分散性と耐湿性會南するような1M脂を遇択すると、
アクリル樹脂、塩ビー酢ビ共重合体、シリコンII麿9
等が好適でめる◇光導電層の厚さは、使用する光導電物
質の種類′P臀性にもよるが一般には、5〜100μ、
峙にFi20〜60岸程直が好適である。Among them, if you select a 1M resin that has good dispersibility and moisture resistance in spring and summer even when the photoconductive JK material is not surface-treated,
Acrylic resin, vinyl chloride vinyl acetate copolymer, silicon II Maro 9
◇The thickness of the photoconductive layer is generally 5 to 100 μm, although it depends on the type and flexibility of the photoconductive material used.
Fi 20-60 is suitable for facing.
絶縁層の厚さri適宜設けらnるものであゐ〃・、一般
に感光体の保護および耐久性、l#tIk、衰特性の改
善等を主目的として絶縁層を付設する場合にrI′1I
P3縁層は比較的厚く設定され、感光体r特定の電子写
真プロセスに用いられる場合fC設けられる絶縁層は比
較的厚く設定さ扛る0通電、絶縁層の厚さは5〜70μ
特にはlO〜50μに設定される・@廁材料としては、
例えばアクリル側腹、アクリル変性*繍、ウレタン側脂
、ポリエステル樹脂、エポキシ1w腫、メラミン側層。The thickness of the insulating layer ri is set as appropriate.Generally, when an insulating layer is added for the main purpose of protecting the photoconductor, improving its durability, l#tIk, and attenuation characteristics, rI'1I
The P3 edge layer is set relatively thick, and when the photoreceptor is used in a specific electrophotographic process, the insulating layer provided on the fC is set relatively thick.
In particular, it is set to lO~50μ.
For example, acrylic flank, acrylic modified *embroidery, urethane flank, polyester resin, epoxy 1w layer, melamine flank.
シリコーン彌膳、弗素11繍などが挙げられる。Examples include silicone embroidery and fluorine 11 embroidery.
これらは単独で用いられてもよいし、同一、おるいは異
なる樹脂を何層か重ねてもよい。These resins may be used alone, or the same or different resins may be stacked in several layers.
なお、表面処理式れた光尋電材靭は光4′IILII#
の上部層、即ち、光導電層の感光体のt?、面に近い部
分に貧有せしめるが、その富有場せる部分の厚さ、即ち
、上部層の厚さは光導電層の全体の厚−g t ioo
μとした場合、lO〜50μの割合いが好適である・
実施例1
ビニルトリメトキシシラン(商品名A171゜E11本
ユニカー株) it[l) 6 M tpH5,2Kl
lI製した500.Mの純水中に添加し15分間攪拌を
行ない、加水分解を行なう。次にCd8301 t−こ
れtic面処理を施されたOdSと濾液を分離するO表
向処理を施されたOdSを120°0で2時間乾燥する
Q
結着剤としてアクリルポリオール**<m品名人−80
1−IM 、大日本インキ化学製)’を固形分で45&
加えよく攪拌した後、50μロールギヤツプのロールミ
ル装置で3回通過させ、Cd8粉体を良く分散させる。In addition, the toughness of the surface-treated Hikaridenden material is Hikari 4'IILII#.
t? of the photoreceptor in the upper layer, i.e., the photoconductive layer. , the thickness of the part close to the surface is poor, but the thickness of the rich part, that is, the thickness of the upper layer, is equal to the total thickness of the photoconductive layer - g tioo
When μ, a ratio of lO to 50μ is suitable.Example 1 Vinyltrimethoxysilane (trade name A171゜E11 Hon Unicar Co.) it[l) 6 M tpH5,2Kl
500 made by II. It was added to pure water of M and stirred for 15 minutes to perform hydrolysis. Next, separate OdS treated with Cd8301 t-surface treatment and filtrate. Dry OdS treated with O surface treatment for 2 hours at 120°0. Q Use acrylic polyol**<m as a binder. -80
1-IM, manufactured by Dainippon Ink Chemical)' with a solid content of 45 &
After adding and stirring well, the Cd8 powder was passed through a roll mill device with a 50μ roll gap three times to disperse the Cd8 powder well.
別に表向処理しないCdS粉体100 it (m1i
fitl、以下同じ)に対し、アクリルポリオール#M
麟高形分で15部を加え、同様に分散させてペイント′
に得るO
それぞれのペイントを別々のタンクに入れ、エアースプ
レー塗布機にて、筐ず非表向処理Od8 t−分散され
たペイント140(xのA/シリンーダーに塗布し、指
触乾燥後、表向処理CdSのペイント′ft塗布するO
その結果非処理OdS′4ta有する層が30μ、処理
Od8を含有する層が15μの全体で45μの光導電層
全形成し、100°030分乾嫌した。これを、シクロ
ヘキサン浴剤で希釈した環化ブタジェンゴムCM品名;
CMi(−M。CdS powder without surface treatment 100 it (m1i
fitl, hereinafter the same), acrylic polyol #M
Add 15 parts of Rindakata, disperse in the same way, and paint.
Put each paint into a separate tank and apply it to a cylinder with a non-surface treated Od8 t-dispersed paint 140 (x) using an air spray applicator. After drying to the touch, Direct treatment CdS paint'ft applied
As a result, a total photoconductive layer of 45 μm was formed, including a layer containing untreated OdS'4ta of 30 μm and a layer containing treated Od8 of 15 μm, and dried at 100° for 030 minutes. Cyclized butadiene rubber CM product name, which is diluted with cyclohexane bath agent;
CMi(-M.
日本合成ゴム製)の粘j[4Ocpsll液で反償殖布
し、80°o20分間乾燥を行ない8μmの目止層を形
成した。The mixture was propagated with a viscous solution (manufactured by Japan Synthetic Rubber Co., Ltd.) and dried at 80°C for 20 minutes to form a sealing layer of 8 μm.
次に、平均分子量が約1s00の光硬化型ウレタン1i
jli(fli+品名;ゾンネ、関内ペイント)會粘J
f70 cpsとなる様メチルエチルケトン#1斎jで
希釈調整した溶液に浸し、40(317minの速度で
引き上けた後80℃で4分間乾燥し、4kW水錯ランプ
で1分間照射して硬化させ、11μmの絶縁層を形成し
たOこt′Lを2回くり返し、目止層と合わせて30μ
漢のIP3縁層を形成した。これを感光体!とするO
比較例1゜
0d8粉体をシランカップリング剤で表面処理しないペ
イントのみを用いたこと除いては実施ガ1と同様に作成
した感光体を感光体Mとする〇比較例2゜
Od8粉体をシランカップリング剤で表面処理したペイ
ントのみを用いたことを除いては実施4/@1と同様に
作成した感光体を感光体臘とする。Next, photocurable urethane 1i with an average molecular weight of about 1s00
jli (fli + product name; Sonne, Kannai Paint) Kaiju J
It was immersed in a solution diluted with methyl ethyl ketone #1 to give f70 cps, pulled up at a speed of 40 (317 min), dried at 80°C for 4 minutes, irradiated with a 4kW water complex lamp for 1 minute, and cured to 11 μm. Repeat the process of forming the insulating layer twice to form a 30 μm layer including the sealing layer.
Formed the IP3 marginal layer of Han. This is a photoreceptor! O Comparative Example 1゜Od8 A photoreceptor made in the same manner as Example 1 except that only paint was used without surface treatment of the powder with a silane coupling agent was used as Photoreceptor M〇Comparative Example 2゜Od8 A photoreceptor was prepared in the same manner as in Example 4/@1 except that only a paint whose surface was treated with a silane coupling agent was used as a photoreceptor.
このようにして作られた感光体に対して前露光−次帯電
、*像露光−同時AO除電、全面露光の#像形成プロセ
スにより表面電位を測定すると共に現偉、転写、定着を
行ない、コピー画質の評価を行なった。The surface potential of the photoreceptor produced in this way is measured through the image forming process of pre-exposure - secondary charging, *image exposure - simultaneous AO static elimination, and full-surface exposure, and the image formation, transfer and fixing are performed, and copies are made. Image quality was evaluated.
まず、35°0.85%の高温高湿下における耐久テス
トを行い、 l1iill及び電位評価した結果を次表
に示す。First, a durability test was conducted under high temperature and high humidity conditions of 35° and 0.85%, and the results of llliill and potential evaluation are shown in the table below.
第1表 高温高湿下での耐久性(1万枚コピー後)ま九
常温常温下で、明部、暗部表向電位のコヒ
ントラスト調べた結果を次表に示す〇
ム
第2表
第1表およびfgZ表から明らかなように、t3dSを
表面処理することは電位保持率の陶土、高湿下での画像
ノイズ(白坂点)の消滅に寄与するが、明暗コントラス
トかとれず、カブリのある一鍵となってしまう。表面処
理OdS@ f上層にもうけたものに耐湿性を保持しつ
つ、コントラストのある鮮明な画像が得られるものでお
る。Table 1: Durability under high temperature and high humidity conditions (after 10,000 copies) As is clear from Table 1 and fgZ table, surface treatment of t3dS contributes to the elimination of image noise (white slope point) under china clay and high humidity, but brightness contrast cannot be maintained and there is fog. It becomes the key. Surface treatment OdS@f The upper layer maintains moisture resistance while producing clear images with contrast.
実施例2゜
シランカップリング剤として次のようなものt用いて実
施例1と同様に感光体を作成した。Example 2 A photoreceptor was prepared in the same manner as in Example 1 using the following silane coupling agent.
第3表
感光体ff−1についても高湿下での画像及び電位コン
トラストは良好であった・
実施例3゜
表面処理されたOd8 t−貧有する層f:10μ非処
理0dS=i言有する層t−30μとなるように光導電
層を形成したことを除いては実施例1と同様に作成され
た感光体を感光体1とする〇感光体lについても、高湿
下でコントラストのある鮮明な11!II′vIIが得
られ友。Table 3 Photoreceptor ff-1 also had good image and potential contrast under high humidity.Example 3 Surface treated Od8 t-poor layer f: 10μ Untreated 0dS=i layer Photoconductor 1 is a photoconductor prepared in the same manner as in Example 1, except that the photoconductive layer was formed so that the photoconductor layer had a thickness of t-30μ. Photoconductor I also had a clear contrast with high humidity. Na 11! II'vII was obtained and a friend.
出−人 キャノン株式会社Source: Canon Co., Ltd.
Claims (1)
鬼子写真感光体において、光導電層の上層部に富有され
る光専電材料がシランカプリング剤で表面処理され友も
のであること奢特徴とする電子写真感光体■1. In the Oniko photoreceptor having a photoconductive layer consisting of a photoconductive material and a binder, the photoconductive material contained in the upper layer of the photoconductive layer is surface-treated with a silane coupling agent. Characteristic electrophotographic photoreceptor■
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1514582A JPS58132751A (en) | 1982-02-02 | 1982-02-02 | Electrophotographic receptor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1514582A JPS58132751A (en) | 1982-02-02 | 1982-02-02 | Electrophotographic receptor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58132751A true JPS58132751A (en) | 1983-08-08 |
Family
ID=11880633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1514582A Pending JPS58132751A (en) | 1982-02-02 | 1982-02-02 | Electrophotographic receptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58132751A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6234167A (en) * | 1985-08-02 | 1987-02-14 | ゼロツクス コ−ポレ−シヨン | Light acceptor |
JPS6437563A (en) * | 1987-08-03 | 1989-02-08 | Ricoh Kk | Method for stabilizing characteristic of electrophotographic sensitive body |
US5166381A (en) * | 1990-08-31 | 1992-11-24 | Xerox Corporation | Blocking layer for photoreceptors |
-
1982
- 1982-02-02 JP JP1514582A patent/JPS58132751A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6234167A (en) * | 1985-08-02 | 1987-02-14 | ゼロツクス コ−ポレ−シヨン | Light acceptor |
EP0213723A2 (en) * | 1985-08-02 | 1987-03-11 | Xerox Corporation | Photoreceptor |
JPS6437563A (en) * | 1987-08-03 | 1989-02-08 | Ricoh Kk | Method for stabilizing characteristic of electrophotographic sensitive body |
US5166381A (en) * | 1990-08-31 | 1992-11-24 | Xerox Corporation | Blocking layer for photoreceptors |
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