JPS58131976A - Preparation of hexafluoro-1,2-epoxypropane - Google Patents
Preparation of hexafluoro-1,2-epoxypropaneInfo
- Publication number
- JPS58131976A JPS58131976A JP1394582A JP1394582A JPS58131976A JP S58131976 A JPS58131976 A JP S58131976A JP 1394582 A JP1394582 A JP 1394582A JP 1394582 A JP1394582 A JP 1394582A JP S58131976 A JPS58131976 A JP S58131976A
- Authority
- JP
- Japan
- Prior art keywords
- surface active
- active agent
- hypochlorite
- nonionic
- organic solvent
- Prior art date
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- Epoxy Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、ヘキサフルオロ−1,2−エポキシプロパン
の製造法、さらに詳しくはへキサフルオロプロペンと次
亜塩素酸塩水溶液とからヘキサフルオロ−1,2−エポ
キシプロパンを製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention provides a method for producing hexafluoro-1,2-epoxypropane, more specifically, a method for producing hexafluoro-1,2-epoxypropane from hexafluoropropene and an aqueous hypochlorite solution. Relating to a method of manufacturing.
ヘキサフルオロ−1,2−エポキシプロパンは、従来公
知の化合物であって、種々の有用な用途を有する。例え
ば、低重合体として耐熱性液体に用いラレルパーフルオ
ロビニルエーテルの中間体として、あるいは含フツ素重
合体のモノマーとして用いられる。Hexafluoro-1,2-epoxypropane is a conventionally known compound and has various useful uses. For example, it is used as a low polymer in heat-resistant liquids, as an intermediate for laryll perfluorovinyl ether, or as a monomer for fluorine-containing polymers.
従来、ヘキサフルオロ−1,2−エポキシプロパンの製
造法として各種の方法が知られており、これらは通常へ
キサフルオロプロペンを原料として、これに酸化剤を作
用させて行なわれている。Hitherto, various methods have been known for producing hexafluoro-1,2-epoxypropane, and these methods are usually carried out using hexafluoropropene as a raw material and acting on it with an oxidizing agent.
しかしながら例えば酸化剤として過酸化水素を用いる液
相法では廃液の処理が困難であり、酸素を用いる気相法
では相当量の分解生成物か生じるという難点を有する。However, for example, a liquid phase method using hydrogen peroxide as an oxidizing agent has difficulty in treating the waste liquid, and a gas phase method using oxygen has the disadvantage that a considerable amount of decomposition products are generated.
また、有機過酸化物を用いる液相法あるいは陽極酸化に
よる方法では操作上の危険性、装置の煩雑性を伴なう。Furthermore, the liquid phase method using an organic peroxide or the anodic oxidation method involves operational risks and complicated equipment.
さらに、ヘキサフルオロプロペンと次亜塩素級塩とを非
プロトン性溶媒の存在下にて反応させる方法もあり温和
な条件で良好な収率を与える( 1゜P、Kolenk
oら、1zvestiya Akademii Nau
k。Furthermore, there is also a method of reacting hexafluoropropene and hypochlorite salt in the presence of an aprotic solvent, which gives a good yield under mild conditions (1°P, Kolenk
o et al., 1zvestiya Akademii Nau
k.
ソ連、隘11.2509〜2512頁、1979年11
月)。しかし、この製造法は非プロトン性溶媒としてア
セトニトリルやジグライムを用いて反応を行なうもので
あって、これら溶媒の次亜塩素酸塩水溶液に対する溶解
性が高く、廃液からの回収も困難であるため溶媒の循環
再使用が困難である。加えてこれらの溶媒は次亜塩素酸
塩と反応して徐々に変質消費されるので次亜塩素酸塩を
も過剰に消費する。このように次亜塩素酸塩を用いる公
知の製造法は、安価な次亜塩素酸ナトリウムなどを用い
ることができるという利点を有しなから6エ業的な製造
方法としては不適当であった。USSR, 11. pp. 2509-2512, November 1979
Month). However, this production method uses acetonitrile and diglyme as aprotic solvents to carry out the reaction, and these solvents have high solubility in hypochlorite aqueous solutions and are difficult to recover from waste liquid. It is difficult to reuse the materials. In addition, these solvents react with hypochlorite and are gradually degraded and consumed, resulting in excessive consumption of hypochlorite. As described above, the known manufacturing method using hypochlorite has the advantage of being able to use inexpensive sodium hypochlorite, etc., so it was unsuitable as an industrial manufacturing method. .
本発明者らは、次亜塩素酸塩を用いる方法について前記
問題点を解決すべく鋭意研究を行なった結果、ヘキサフ
ルオロプロペンと次亜塩素酸塩水溶液とを特定の界面活
性剤および非水溶性有機溶媒の存在下に反応させること
により、溶媒および界面活性剤の回収が容易で消費量が
少なく温和な条件で良好な収率が達成されることを見出
し、本発明を完成するに至った。The present inventors conducted intensive research to solve the above-mentioned problems regarding the method using hypochlorite. The present inventors have discovered that by conducting the reaction in the presence of an organic solvent, the solvent and surfactant can be easily recovered, the amount consumed is small, and a good yield can be achieved under mild conditions, and the present invention has been completed.
すなわち本発明は、ヘキサフルオロプロペンと次亜塩素
酸塩水溶液とを(a)(1)−(cl12Ct(2o
) n−基(ただし、nは2以上)を有する陰イオン性
もミンオキシド基)を有する非イオン性の活性剤、また
は(+il)両性の界面活性剤、および(b)非水溶性
有機溶媒の存在下において反応させるヘキサフルオロ−
1,2−エポキシプロパンの製造法を提供するものであ
る。That is, the present invention combines hexafluoropropene and an aqueous hypochlorite solution into (a)(1)-(cl12Ct(2o
) a nonionic surfactant having an anionic or amine oxide group having an n-group (where n is 2 or more), or (+il) an amphoteric surfactant; and (b) a water-insoluble organic solvent. Hexafluoro-
A method for producing 1,2-epoxypropane is provided.
しかして本発明方法によれば、反応後の廃液は静置によ
り溶媒と相分離を生じ、水相に対する非水溶性溶媒およ
び界面活性剤などの溶出が極めて少量であるため容易に
廃棄することができる。他方非水溶性溶媒および界面活
性剤などはほとんど水相に溶出せず、変質することもな
いので循環再使用を行なうことができる。さらに本発明
方法による反応は温和な条件下に進行し目的物を高収率
で得ることができるので工業的に極めて有用である。However, according to the method of the present invention, the waste liquid after the reaction undergoes phase separation from the solvent by standing still, and the elution of water-insoluble solvents and surfactants into the aqueous phase is extremely small, so it can be easily disposed of. can. On the other hand, water-insoluble solvents and surfactants hardly dissolve into the aqueous phase and do not change in quality, so they can be recycled and reused. Furthermore, the reaction according to the method of the present invention proceeds under mild conditions and the desired product can be obtained in high yield, making it extremely useful industrially.
本発明方法においては、反応は特定の界面活性剤と非水
溶性有機溶媒の存在下に次亜塩素酸塩水溶液を用いて行
なわれる。In the method of the present invention, the reaction is carried out using an aqueous hypochlorite solution in the presence of a specific surfactant and a water-insoluble organic solvent.
次亜塩素酸塩としては、アルカリ金属塩およびアルカリ
土類金属塩を用いることかでき、ナトリウム塩およびカ
リウム塩が特に好ましい。反応に用いられる次亜塩素酸
塩の量は、ヘキサフルオロ−プロペンに対して化学量論
量ないし過剰量とすればよい。次亜塩素酸塩水溶液の濃
度は高い方が好ましいが、通常は1〜20重量%を採用
することができる。As the hypochlorite, alkali metal salts and alkaline earth metal salts can be used, and sodium salts and potassium salts are particularly preferred. The amount of hypochlorite used in the reaction may be a stoichiometric amount to an excess amount relative to hexafluoro-propene. Although it is preferable that the concentration of the hypochlorite aqueous solution be high, it is usually 1 to 20% by weight.
本発明方法にいう界面活性剤とは、一般に界面活性剤と
して市販されているものはもちろん、つきのいずれの性
質をも備えた化合物をいう。The surfactant used in the method of the present invention refers to not only those commonly commercially available as surfactants, but also compounds having any of the following properties.
(+)液体系の少なくとも一つの相に可溶である、(1
1)液体系のうちの溶解相に対して非溶解性である基を
該化合物の分子が構成部分として有する、(iiD該化
金化合物子またはイオンが液体系の界面において配向し
た単分子膜を形成する、(iv)溶液の場合では、界面
における平衡濃度か、その溶液全体の平衡濃度よりも大
きい、(v)溶液全体の濃度が一定値を越えるとミセル
と呼ばれる分子またはイオンの集合体を形成する、(v
l)つきのいずれかの機能を有する:洗浄力、泡形成力
、濡れ性、乳化性、可溶化、分散力。(+) soluble in at least one phase of the liquid system, (1
1) Molecules of the compound have as a constituent a group that is insoluble in the dissolved phase of the liquid system, (iiD a monomolecular film in which the molecules or ions of the chemical compound are oriented at the interface of the liquid system. (iv) In the case of a solution, the equilibrium concentration at the interface or greater than the equilibrium concentration of the entire solution; (v) When the overall concentration of the solution exceeds a certain value, aggregates of molecules or ions called micelles are formed. form, (v
l) Has any of the following functions: detergency, foam-forming ability, wetting ability, emulsifying ability, solubilizing ability, and dispersing ability.
本発明方法に用いられる特定の界面活性剤としては、陰
イオン性、非イオン性、両性のものがいずれも単独で、
または混合して使用でき、特に陰イオン性、非イオン性
または両者の混合物が好ましい。しかしこれらの界面活
性剤はその式中に−(C112CH20)n−基〔ただ
し、nは2以上〕(陰イオン性もしくは非イオン性の界
面活性剤の場合)、または 、N−,0基(非イオン性
の界面活性剤の場合)を有することか必要である。これ
らの基は、非水溶性有機溶媒と共同して次亜塩素酸塩ト
へキサフルオロプロペンとの反応を促進するものである
ことが実験により確認された。The specific surfactants used in the method of the present invention include anionic, nonionic, and amphoteric surfactants;
Alternatively, they can be used in combination, and anionic, nonionic, or a mixture of both is particularly preferred. However, these surfactants have -(C112CH20)n- group [where n is 2 or more] (in the case of anionic or nonionic surfactants), or N-,0 group ( (in the case of nonionic surfactants). It was experimentally confirmed that these groups promote the reaction with hypochlorite tohexafluoropropene in cooperation with a water-insoluble organic solvent.
かかる界面活性剤の代表的なものとしては、つきの一般
式を有するものが例示される(特にことわらないかぎり
、nは2〜100、kは炭素数6〜30を有するアルキ
ル基、Mは水素、アルカリ金属またはトリエタノールア
ミン残基などの有機アミン残基またはアンモニウム残基
、n、m、pは化合物により異なる重複数を意味する)
:(lは2または3を意味する)
RO(CH2CH20)。503M
(Pは1〜5の整数)
1
〔RO(CH2CH20)。+P−(OMI。Typical examples of such surfactants include those having the following general formula (unless otherwise specified, n is 2 to 100, k is an alkyl group having 6 to 30 carbon atoms, and M is hydrogen). , alkali metal or organic amine residues such as triethanolamine residues or ammonium residues, n, m, p mean different overlap numbers depending on the compound)
: (l means 2 or 3) RO(CH2CH20). 503M (P is an integer of 1 to 5) 1 [RO(CH2CH20). +P-(OMI.
(Xは1.2または3、yは3−x、Mは水素、ナトリ
ウム、カリウムまたはモルホリノ(ただし、少なくとも
1つは水素以外を意味する)(x、yおよびMはいずれ
も上記に同じ)R−0−(CH2CH2O)□H
(Pは1〜5の整数)
C)13
L t t 3C■0(CH2CH20)。OCR
CHO(CH2Cf(20)nOCR
CHO(CH2C1120)nH
CHO(CH2CH20) nH
■
CFlO(CH2CH20)nH
畷
CHO(CH2CH20)nH
■
CH20(C1126H20)□H
kCOO(C1120H20)nH
/(CH2CH20)n[I
RN\(。14゜。H2o)。□
R−N、0
2
(R1オよびに2は炭素数1〜5を有するアルキル基)
H3
k。(X is 1.2 or 3, y is 3-x, M is hydrogen, sodium, potassium or morpholino (however, at least one means something other than hydrogen) (x, y and M are all the same as above) R-0-(CH2CH2O)□H (P is an integer from 1 to 5) C) 13
L t t 3C ■ 0 (CH2CH20). OCR CHO(CH2Cf(20)nOCR CHO(CH2C1120)nH CHO(CH2CH20) nH ■ CFlo(CH2CH20)nH Naw CHO(CH2CH20)nH ■ CH20(C1126H20)□H kCOO(C1120H2 0)nH/(CH2CH20)n[I RN \(.14°.H2o).□ RN, 0 2 (R1o and 2 are alkyl groups having 1 to 5 carbon atoms)
H3k.
2
(R1およびR2はいずれも前記と同し)CH2C11
20H
界面活性剤の使用量は特に限定はない。使用量の増加に
ともなって反応速度は増大するが、活性剤の種類により
規定される一定の反応速度に近づく。一般に次亜塩素酸
塩水溶液に対し0.1〜10重世%が好ましい。0,1
重量%より少ない場合は、工業生産上意味かなく、10
重量%を越えても増加量に伴なう反応速度の増加はない
。2 (R1 and R2 are both the same as above) CH2C11
The amount of the 20H surfactant used is not particularly limited. The reaction rate increases as the amount used increases, but approaches a constant reaction rate determined by the type of activator. Generally, 0.1 to 10 weight percent of the hypochlorite aqueous solution is preferred. 0,1
If it is less than 10% by weight, it is meaningless in terms of industrial production.
There is no increase in the reaction rate with increasing amount, even if the weight % is exceeded.
溶媒としては、非水溶性有機溶媒か用いられる。As the solvent, a water-insoluble organic solvent is used.
本発明方法において前記界面活性剤の存在のみでは反応
はほとんと進行せず非水溶性有機溶媒の存在を必要とす
る。該溶媒は反応温度で液体であり、特にアルカリの存
在で可及的に加水分解をせす、また可及的に次亜塩素酸
塩の酸化作用を受けないことか必要である。このような
溶媒としては、一般に飽和脂肪族炭化水素、芳香族炭化
水素およびこれらのハロゲン置換体か採用され、例えは
ベンゼン、トルエン、キシレン、クロロベンゼン、ジク
ロロベンゼン、トリフルオロトリクロロエタン、流動パ
ラフィン、ヘキサン、ペンシトリフルオライド、P−ク
ロロヘンシトリフルオライド、四項溶媒の使用量につい
ても特に限定はないか、一般に次亜塩素酸塩水溶液に対
して1〜30答繊%であるのか好ましい。1容量%より
少ない場合は、工業生産上意味かなく、30容口%を越
えても経済上好ましくない。In the method of the present invention, the reaction hardly proceeds in the presence of the surfactant alone and requires the presence of a water-insoluble organic solvent. It is necessary that the solvent is liquid at the reaction temperature, that it is hydrolyzed as much as possible in the presence of an alkali, and that it is as free from the oxidizing action of hypochlorite as possible. Such solvents generally include saturated aliphatic hydrocarbons, aromatic hydrocarbons, and halogen-substituted products thereof, such as benzene, toluene, xylene, chlorobenzene, dichlorobenzene, trifluorotrichloroethane, liquid paraffin, hexane, There are no particular limitations on the amounts of pensitrifluoride, P-chlorohencytrifluoride, and the four-term solvent used, and it is generally preferred that they be used in an amount of 1 to 30% based on the aqueous hypochlorite solution. If it is less than 1% by volume, it is meaningless in terms of industrial production, and if it exceeds 30% by volume, it is not economically desirable.
ヘキサフルオロプロペンと次亜塩素酸塩との反応は種々
の様式で行なうことかでき、たとえは次亜塩素酸塩水溶
液と溶媒の混合物にヘキサフルオロプロペンを加えても
よく、逆に溶媒とへキサフルオロプロペンの混合系に次
亜塩素酸塩水溶液を加えて行ってもよい。また、次亜塩
素酸塩は苛性アルカリ水溶液に塩素を反応させることに
より容易に生成するものであるから、苛性アルカリ水溶
液と溶媒との混合物にヘキサフルオロプロペンと塩素を
同時に加える方法で行なってもよい。The reaction between hexafluoropropene and hypochlorite can be carried out in various ways, for example by adding hexafluoropropene to a mixture of an aqueous hypochlorite solution and a solvent, or vice versa. An aqueous hypochlorite solution may be added to the fluoropropene mixture system. Furthermore, since hypochlorite is easily generated by reacting chlorine with an aqueous caustic alkali solution, the reaction may be carried out by simultaneously adding hexafluoropropene and chlorine to a mixture of an aqueous caustic alkaline solution and a solvent. .
反応温度は、−20〜40°C1好ましくは一10〜3
0℃か採用される。−20°Cよりも低いときは次亜塩
素酸塩水溶液か凝固し、一方40℃を越すと次亜塩素酸
塩か不安定となるからである。The reaction temperature is -20 to 40°C, preferably -10 to 3°C.
0°C is adopted. This is because when the temperature is lower than -20°C, the hypochlorite aqueous solution solidifies, whereas when the temperature exceeds 40°C, the hypochlorite becomes unstable.
反応時のp Hは9以上、好ましくは10以上が採用さ
れる。これは次亜塩素酸塩が酸性では不安定であるため
てpHの調整の便宜のためである。The pH during the reaction is 9 or higher, preferably 10 or higher. This is for the convenience of pH adjustment since hypochlorite is unstable in acidic conditions.
反応圧力は高い方か好ましいが、通常は大気圧ないし若
干の加圧、例えば10気圧以下が採用される。A high reaction pressure is preferred, but usually atmospheric pressure or slightly increased pressure, for example 10 atmospheres or less, is employed.
つきに実施例により本発明をより具体的に説明する。The present invention will now be described in more detail with reference to Examples.
実施例1
攪拌機、ガス仕込口、温度計およびドライ了イスーメタ
ノールにより一78°Cに冷却された還流冷却器を備え
た密閉された3 00 meの四ツロ丸底フラスコに次
亜塩素酸ナトリウム水溶液(有効塩素10%) 200
、eと30重量%水酸化カリウム水溶紗20 meを
加え、さらに溶媒としてクロロベ−(CH2C[(20
)。−〇 (nの平均は8)1.0yを仕込む。Example 1 Sodium hypochlorite was added to a sealed 300 m4 round bottom flask equipped with a stirrer, a gas inlet, a thermometer and a reflux condenser cooled to -78°C with dry cold methanol. Aqueous solution (10% available chlorine) 200
, e and 20 me of 30 wt % potassium hydroxide aqueous gauze were added, and chlorobenzene (CH2C[(20
). -〇 (average of n is 8) Prepare 1.0y.
ヘキサフルオロプロペン(以下、RFPと略す)16.
0yを仕込み、反応を開始する。反応中、フラスク内温
度を一5〜0℃に保つ。240分後、生成ガスを一78
°Cのトラップに回収する(150y)。回収ガスをガ
スクロマトクラフイによって分析した結果、ヘキサフル
オロ−1,2−エポキシプロパン(HFPO)26.0
モル%および)l F P74.0モル%であった。Hexafluoropropene (hereinafter abbreviated as RFP) 16.
Charge 0y and start the reaction. During the reaction, the temperature inside the flask is maintained at -5 to 0°C. After 240 minutes, the generated gas was reduced to 178
Collect in a trap at °C (150y). As a result of analyzing the recovered gas by gas chromatography, it was found that hexafluoro-1,2-epoxypropane (HFPO) was 26.0
The mol% and )l F P were 74.0 mol%.
実施例2〜32
第1表に示す原料、試薬を用い、同表に示す条件を用い
た以外は、実施例1と同様の操作によって第1表に示す
結果を得た。Examples 2 to 32 The results shown in Table 1 were obtained by the same operations as in Example 1, except that the raw materials and reagents shown in Table 1 were used and the conditions shown in the table were used.
なお、表中P−クロロB T FはP−クロロペンシト
リフルオライドを、+CH2CH2O+oにおけるnの
値は平均の値を、また界面活性剤Aは/ \
を意味する。In addition, in the table, P-chloro B TF means P-chloropene citrifluoride, the value of n in +CH2CH2O+o means the average value, and surfactant A means / \.
手続補正書(自制
昭和57年3月13日
特許庁審査官 殿
1事件の表示
昭和57年特許願第 013945 号2、発明の
名称
ヘキサフルオロ−1,2−エポキシプロパンの製造法3
、補正をする者
事件との関係 特許出願人
住所 大阪府大阪市北区8611’l 1丁1]12
番39号新阪急ビル名称 (285) ダイキン
工業株式会社代表者 山 1) 朴
4、代理人
5、補正命令の日付 自発
7、補正の口答
(1)明細書第13頁下から4行、「(+1の平均は8
)」とある?r(nの平均は8.3)Jと補正する。Procedural Amendment (Self-restraint March 13, 1980 Examiner of the Patent Office 1 Indication of Case 1982 Patent Application No. 013945 2 Title of Invention Process for Producing Hexafluoro-1,2-Epoxypropane 3
, Relationship with the case of the person making the amendment Patent applicant address 8611'l 1-1, Kita-ku, Osaka City, Osaka Prefecture] 12
No. 39 New Hankyu Building Name (285) Daikin Industries, Ltd. Representative Yama 1) Park 4, Agent 5, Date of amendment order Motto 7, Oral statement for amendment (1) Page 13 of the specification, 4 lines from the bottom, `` (The average of +1 is 8
)"a? Correct as r (average of n is 8.3)J.
以上that's all
Claims (1)
を、 (a)m+CH2cH2o+、基(ただし、nは2以上
)を有する陰イオン性もしくは非イオン性の界面活性剤
、(11)アミンオキシド基を有する非イオン性の界面
活性剤、または(iiD両性の界面活性剤、および(b
)非水溶性有機溶媒 の存在下で反応させることを特徴とするヘキサフルオロ
−1,2−エポキシプロパンの製造法。(1) Hexafluoropropene and hypochlorite aqueous solution, (a) m+CH2cH2o+, an anionic or nonionic surfactant having a group (however, n is 2 or more), (11) amine oxide nonionic surfactants having groups, or (iiD amphoteric surfactants, and (b
) A method for producing hexafluoro-1,2-epoxypropane, which comprises reacting in the presence of a water-insoluble organic solvent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1394582A JPS58131976A (en) | 1982-01-29 | 1982-01-29 | Preparation of hexafluoro-1,2-epoxypropane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1394582A JPS58131976A (en) | 1982-01-29 | 1982-01-29 | Preparation of hexafluoro-1,2-epoxypropane |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58131976A true JPS58131976A (en) | 1983-08-06 |
Family
ID=11847338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1394582A Pending JPS58131976A (en) | 1982-01-29 | 1982-01-29 | Preparation of hexafluoro-1,2-epoxypropane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58131976A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58134086A (en) * | 1982-02-04 | 1983-08-10 | Asahi Chem Ind Co Ltd | Synthetic method of hexafluoropropylene oxide |
JPH01246270A (en) * | 1989-02-03 | 1989-10-02 | Asahi Chem Ind Co Ltd | Synthesis of hexafluoropropylene oxide |
KR100816878B1 (en) | 2006-10-16 | 2008-03-27 | 한국화학연구원 | Manufacturing method of hexafluoropropylene-oxide with high yield |
CN114426487A (en) * | 2020-09-23 | 2022-05-03 | 中国石油化工股份有限公司 | Water lock inhibitor and preparation method and application thereof |
-
1982
- 1982-01-29 JP JP1394582A patent/JPS58131976A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58134086A (en) * | 1982-02-04 | 1983-08-10 | Asahi Chem Ind Co Ltd | Synthetic method of hexafluoropropylene oxide |
JPH0470314B2 (en) * | 1982-02-04 | 1992-11-10 | Asahi Chemical Ind | |
JPH01246270A (en) * | 1989-02-03 | 1989-10-02 | Asahi Chem Ind Co Ltd | Synthesis of hexafluoropropylene oxide |
JPH0432068B2 (en) * | 1989-02-03 | 1992-05-28 | ||
KR100816878B1 (en) | 2006-10-16 | 2008-03-27 | 한국화학연구원 | Manufacturing method of hexafluoropropylene-oxide with high yield |
US7405312B2 (en) * | 2006-10-16 | 2008-07-29 | Korea Research Institute Of Chemical Technology | Manufacturing method of hexafluoropropylene oxide with high yield |
CN114426487A (en) * | 2020-09-23 | 2022-05-03 | 中国石油化工股份有限公司 | Water lock inhibitor and preparation method and application thereof |
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