JPS58117899A - Cylindrical plating device - Google Patents
Cylindrical plating deviceInfo
- Publication number
- JPS58117899A JPS58117899A JP21327181A JP21327181A JPS58117899A JP S58117899 A JPS58117899 A JP S58117899A JP 21327181 A JP21327181 A JP 21327181A JP 21327181 A JP21327181 A JP 21327181A JP S58117899 A JPS58117899 A JP S58117899A
- Authority
- JP
- Japan
- Prior art keywords
- objects
- plating
- plated
- tank
- tray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
この発明は、単種又は異種の被メッキ物を同時に多量1
手動又は自動的にメッキし、メッキ速度を高速化する円
筒形状のメッキ装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention provides a method for plating a single type or different types of objects at the same time.
This invention relates to a cylindrical plating device that performs manual or automatic plating and increases the plating speed.
従来のメッキ装置は、床面下に孔を堀って、その中にメ
ッキ槽を収納し、平面的に広い工場床面積を使用してい
たので、敷地を広く要し、地価の高い所では不経済であ
った。Conventional plating equipment drills a hole under the floor surface and stores the plating tank inside, and uses a large factory floor area, so it requires a large site and is difficult to install in areas where land prices are high. It was uneconomical.
又、メッキ作業も一般に長時間かかり、被メッキ面積1
0’OdについてD c 10〜30Δ、30〜乙O分
(メッキ厚/// 00朋程度)安して、納期の面から
も有利でなかった。In addition, plating work generally takes a long time, and the area to be plated is 1
For 0'Od, Dc was 10~30Δ, 30~2O (plating thickness: about 000), and it was not advantageous in terms of delivery time.
この発明は上記の従来技術の不満足な点を改善するもの
で、その要旨はメッキ槽をコンパクトに円筒形状として
、この円筒体を扇形に分割し、各扇形円筒槽には同種又
は異種類のメッキ液、又は水洗液を入れ、円筒部分に取
出皿を配設すると共に、円筒中・Lに回転軸を設け、該
同転軸の」二方には放射状に腕を出して、その腕先に被
メツキ物吊下具を取付け、円筒槽全体を昇降可能乃至回
転軸を昇降可能にして円筒槽と回転軸を相対的に移動可
能としたものである。This invention is an attempt to improve the unsatisfactory points of the above-mentioned prior art, and its gist is that the plating tank is compactly cylindrical, the cylinder is divided into fan shapes, and each fan-shaped cylindrical tank is plated with the same or different types. Fill the liquid or washing liquid, place a take-out tray in the cylindrical part, provide a rotating shaft in the middle of the cylinder L, and extend arms radially from both sides of the rotating shaft. A device for hanging objects to be plated is attached, and the entire cylindrical tank can be raised and lowered, and the rotating shaft can be moved up and down, so that the cylindrical tank and the rotating shaft can be moved relative to each other.
以下図例に基いて構成を説明する。The configuration will be explained below based on an example diagram.
第1図は構成を示す要部斜視図、第2図〜第S図は円筒
槽/を示すもので、第2図は正面図、第3図は左側面図
、第7図は平面図、第5図は第2図のA −A線拡大断
面図、第4図は取出皿の斜視図、第7図は扇形円筒槽の
斜視図である。Figure 1 is a perspective view of the main parts showing the structure, Figures 2 to S show the cylindrical tank, Figure 2 is a front view, Figure 3 is a left side view, Figure 7 is a plan view, FIG. 5 is an enlarged sectional view taken along the line A--A in FIG. 2, FIG. 4 is a perspective view of the take-out tray, and FIG. 7 is a perspective view of the fan-shaped cylindrical tank.
図例において扇形円筒槽2は、//乙内円周もので、5
個連結し、欠円となる個所に取出皿gを備えである。扇
形円筒槽2には上部にフランジlを有し、半径方向に隔
壁乙を以て中央に液溜部Sを形成しており、外周側壁に
は補充液連通孔3を穿孔して管3Aの青緑3Bを経て外
部のメッキ液補充槽15に連通ずるようになっている。In the illustrated example, the fan-shaped cylindrical tank 2 has a circumference of 5.
They are connected together, and a take-out plate g is provided at the place where the circle is missing. The fan-shaped cylindrical tank 2 has a flange l on the upper part, and a liquid reservoir part S is formed in the center with a partition wall B in the radial direction, and a replenisher communication hole 3 is bored in the outer peripheral side wall so that the blue-green color of the pipe 3A is formed. It communicates with an external plating solution replenishment tank 15 through 3B.
各扇形円筒槽2の中心部には空隙、、2Aが設けられ、
これ等を組合せた時に円筒槽の、中央に中心腔部7が形
成されるようになっており、当該中心腔部7に回転軸/
/が収納され、円筒槽の上下端において軸承(図示せず
)を介して回転軸//が外部駆動により回転可能に支承
されている。この回転軸//には上方に腕/、2が半径
方向に設けられ、この腕/2の先端に被メッキ物(図示
せず)の吊下具が取付けられて、その下端に把持部/q
を^
以て被メッキ物を吊下げ可能に構成されている。A void, 2A, is provided in the center of each fan-shaped cylindrical tank 2,
When these are combined, a central cavity 7 is formed in the center of the cylindrical tank, and the central cavity 7 has a rotating shaft/
/ is housed, and a rotating shaft // is rotatably supported by an external drive via bearings (not shown) at the upper and lower ends of the cylindrical tank. This rotational shaft // is provided with an arm /, 2 in the radial direction above, a hanging tool for the object to be plated (not shown) is attached to the tip of this arm /2, and a grip part /2 is attached to the lower end thereof. q
It is configured so that the object to be plated can be suspended using the .
又、回転軸//は回転中昇降可能な適宜の手段が設けら
れ、更に必要に応じて円筒槽自体を昇降可能に適当な手
段を設ける。例えば昇降機のように円筒槽の重量に見合
うカウンターウェイトを鋼索で連結し、軽快に昇降でき
るようにする。Further, the rotating shaft // is provided with appropriate means for raising and lowering during rotation, and furthermore, suitable means is provided for raising and lowering the cylindrical tank itself as required. For example, like in an elevator, a counterweight suitable for the weight of the cylindrical tank is connected with steel cables, allowing it to be lifted and lowered easily.
次に、この発明の使用態様を説明する。Next, the mode of use of this invention will be explained.
(1)第1実施例 (クロムメッキ)
クロムメッキの例をとれば、第q図において回転軸が右
回りの場合、1.11.曹、■槽にクロムメッキ液を充
填し、■槽に水を入れ取出皿gの位置で予め上げられた
回転軸//の腕/、7先端に設けられた吊下具/3に被
メッキ物を取付け、間欠的に回転軸を乙00回して降下
させ、被メッキ物をメッキ槽Iへ浸漬し、同液中を移動
させてメッキする。以下この動作をくり返して最終的に
水洗槽Vへ浸漬し、取出皿gヘメッキして水洗された被
メッキ物が来た時に手動乃至自動的に被メッキ物を吊下
具から外して取出皿ど上にのせる。(1) First Example (Chrome Plating) Taking the example of chrome plating, if the rotation axis is clockwise in Figure q, 1.11. ■ Fill the tank with chrome plating solution, ■ Fill the tank with water, and place the arm of the rotating shaft // which has been raised in advance at the position of the take-out tray g, to be plated on the hanging tool /3 provided at the tip of 7. The object is attached, the rotary shaft is rotated intermittently 00 times to lower the object, the object to be plated is immersed in the plating tank I, and the object is moved through the solution for plating. Thereafter, this operation is repeated until the plated object is finally immersed in the washing tank V, and when the plated and washed object reaches the take-out pan G, the object to be plated is manually or automatically removed from the hanging tool and placed in the take-out pan. Place on top.
(2)第2実施例 (クロムメッキ)
第1〜第V槽をエツチンク、クロムメッキ、クロムメッ
キ、水洗の配列とする。(2) Second Embodiment (Chrome plating) The first to V tanks are arranged as etching, chrome plating, chrome plating, and water washing.
(3) Fl実m例にッケルクロムメッキ)糟の配列
は、ニッケルメッキ液、水、クロムメッキ液、水、の順
序とする。(3) Nickel chrome plating on Fl example) The order of the plating is nickel plating solution, water, chrome plating solution, and water.
(4)第1実施例 (クロムメッキ)
前処理しておいて、クロムメッキすべき被メッキ物を7
0個、7個の扇形円筒槽の中へ入れ、7個当り乙秒位で
メッキする。(4) First example (Chrome plating) After pre-treating the object to be plated with chrome,
Place 0 pieces and 7 pieces in a fan-shaped cylindrical tank, and plate each 7 pieces in about 1 second.
尚、槽内の段部/乙は中心方向へ傾斜させて、こぼれた
液は槽内へ戻るようにする。Note that the stepped part in the tank is tilted toward the center so that spilled liquid returns to the tank.
尚、この発明に係る装置では高速メッキを実施できるも
のである。Note that the apparatus according to the present invention can perform high-speed plating.
以上述べたように、この発明によれば、狭い床面積でメ
ッキ作業が可能であシ地価の高い部会でも効率が良く、
メッキ槽は外部の補充液槽と連通して液の補充が任意に
行なうことができ、又、メッキ槽を小別けして液温、a
度、被メツキ物浸漬時間の制御を容易にしたから短時間
の高速メッキが可能となった。As described above, according to the present invention, plating work can be performed in a small floor area, and is efficient even in a committee where land prices are high.
The plating tank is connected to an external replenisher tank so that the liquid can be refilled at will.
By making it easier to control the immersion time of the object to be plated, it has become possible to perform high-speed plating in a short period of time.
尚、メッキ槽側を昇降可能にすることにより、被メッキ
物の精度が高いものとが、揺れてはいけないものにはメ
ッキ槽従ってメッキ液を昇降させて被メッキ物を静止し
たままメッキすることが可能で良好なメッキ作業をする
ことができる。By making the plating tank side movable, the plating tank can be moved up and down, allowing the plating solution to be moved up and down for high-precision objects to be plated, and for objects that should not be shaken, while the objects remain stationary. This allows for good plating work.
4図面の簡単な説明、
図はこの発明の実施例を示し、第1図は構成を示す要部
斜視図、第2図〜第S図は円筒槽を示し、第2図は正面
図、第3図は左側面図、第1図は平面図、第5図は第2
図のA−A線断面図であり、第6図は取出皿の斜視図、
第7図は扇形円筒槽の斜視図である。4 Brief Explanation of the Drawings The figures show an embodiment of the present invention, Fig. 1 is a perspective view of the main part showing the configuration, Figs. 2 to S show a cylindrical tank, Fig. 2 is a front view, Figure 3 is a left side view, Figure 1 is a plan view, Figure 5 is a second view.
FIG. 6 is a perspective view of the extraction tray;
FIG. 7 is a perspective view of the sector-shaped cylindrical tank.
/・・・円筒形メッキ装置、2・・・扇形円筒槽、3・
・補充液連通孔、g・・・取出皿、//・・・回転軸、
/2・・・腕、/3・・・吊下具、15・・・メッキ液
補充槽。/... Cylindrical plating device, 2... Fan-shaped cylindrical tank, 3...
・Refill fluid communication hole, g...removal plate, //...rotation shaft,
/2...Arm, /3...Hanging tool, 15...Plating solution replenishment tank.
特 許 出 願 人Patent applicant
Claims (1)
、該欠円筒部に取出皿を配設して円筒形部中心には回転
軸を配設して、該回転軸上方に腕を出して被メツキ物吊
下用の吊下具を設け、前記円筒槽全体と回転軸との何れ
かを相対的に上下移動可能に形成したことを特徴とする
円筒形メッキ装置。A plurality of fan-shaped cylindrical tanks are combined to form a cylindrical tank with a partially occluded circle, a take-out tray is arranged in the occluded cylindrical part, a rotating shaft is arranged in the center of the cylindrical part, and a rotating shaft is provided above the rotating shaft. A cylindrical plating apparatus characterized in that a hanging tool is provided with an arm sticking out to hang an object to be plated, and either the entire cylindrical tank or a rotating shaft can be moved up and down relative to each other.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21327181A JPS58117899A (en) | 1981-12-30 | 1981-12-30 | Cylindrical plating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21327181A JPS58117899A (en) | 1981-12-30 | 1981-12-30 | Cylindrical plating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58117899A true JPS58117899A (en) | 1983-07-13 |
Family
ID=16636334
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21327181A Pending JPS58117899A (en) | 1981-12-30 | 1981-12-30 | Cylindrical plating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58117899A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102677113A (en) * | 2012-01-09 | 2012-09-19 | 河南科技大学 | Device for manufacturing plating layer of metal multilayer film |
-
1981
- 1981-12-30 JP JP21327181A patent/JPS58117899A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102677113A (en) * | 2012-01-09 | 2012-09-19 | 河南科技大学 | Device for manufacturing plating layer of metal multilayer film |
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