JPS58114328A - Production of magnetic head - Google Patents

Production of magnetic head

Info

Publication number
JPS58114328A
JPS58114328A JP21171981A JP21171981A JPS58114328A JP S58114328 A JPS58114328 A JP S58114328A JP 21171981 A JP21171981 A JP 21171981A JP 21171981 A JP21171981 A JP 21171981A JP S58114328 A JPS58114328 A JP S58114328A
Authority
JP
Japan
Prior art keywords
thin film
magnetic head
floating
head
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21171981A
Other languages
Japanese (ja)
Inventor
Minoru Takahashi
実 高橋
Seiji Yoneoka
米岡 誠二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21171981A priority Critical patent/JPS58114328A/en
Publication of JPS58114328A publication Critical patent/JPS58114328A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3176Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
    • G11B5/3179Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
    • G11B5/3183Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3176Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
    • G11B5/3179Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
    • G11B5/3186Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes parallel to the gap plane, e.g. "vertical head structure"

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

PURPOSE:To unify a floating slider and a thin film magnetic head element for a thin film magnetic head of a floating structure, by providing numbers of thin film magnetic head elements to form a magnetic circuit on a flat substrate and a coil and forming a floating rails among these head elements. CONSTITUTION:Numbers of thin film magnetic head elements 11 are provided on a flat substrate 10 of Al2O3, etc. to form a magnetic circuit 12 and a coil conductor part 13. Then floating rails 15 are formed between the elements 11. Thus a thin film magnetic head of a floating structure which has a reading/writing R/W gap 14 is obtained. In this case, a vertical or horizontal thin film magnetic head is obtained for the elements 11. As a result, it is possible to unify the thin film magnetic head with a slider which floats up with a fluid dynamic air current and in accordance with the revolutions of magnetic disk.

Description

【発明の詳細な説明】 (1)  発明の技術分舒 本lIWi4Fi高密度磁気Ie会を指向する磁気配置
媒体としての磁気ディスク装置に係り、該ディスクに対
する記鍮又は読出しの磁気ヘッド素子の薄膜−  化を
意図する磁気ヘッドの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (1) The present invention relates to a magnetic disk device as a magnetic arrangement medium oriented to Wi4Fi high-density magnetic Ie, and a thin film of a magnetic head element for recording or reading for the disk. The present invention relates to a method of manufacturing a magnetic head intended to be used as a magnetic head.

(2)従来技術と問題点 近時、この種の磁気ディスク装置では高書度記―指向の
一環として薄膜又は厚層技法を駆使した薄膜磁気ヘッド
が着目されている.薄膜化磁気ヘッド素子は、素子自体
の磁気回路にリード嗜うイト空Wl(以下R/Wギャッ
プと略記)を具備するにもちろん、対接のディスク媒体
面と極微細な空隙でアクセスして高密度磁気記録を実現
する●第IWJは垂厘型構成薄sIs気ヘッド、又lI
8閣は水平型構成め薄層磁気ヘッドを示し、両図を参照
しながら薄膜ヘッド素子とその動作概蟹を説明する。
(2) Prior art and problems Recently, in this type of magnetic disk device, attention has been focused on thin film magnetic heads that make full use of thin film or thick layer techniques as part of the trend toward high performance. The thin-film magnetic head element not only has a space Wl (hereinafter abbreviated as R/W gap) that provides a lead to the magnetic circuit of the element itself, but also has an extremely fine gap that allows access to the opposing disk medium surface. The IWJ that realizes density magnetic recording is a thin sIS head with a droop type configuration, and an lI
8 shows a thin-layer magnetic head with a horizontal configuration, and the thin-film head element and its operation will be explained with reference to both figures.

第1図ビ)図の磁気ヘッド斜視図にシいて、lは磁気デ
ィスクの回転にともない流体力学的空気流で浮上あるい
は浮動するスライダ、又2はスライダlの後端、即ち矢
印方向の磁気ディスク回転1向に対し後端部に取付けら
れた薄膜ヘッド素子である.図の右方←)図#′i前配
ビ》図の構成体が磁性体を塗布したアルミ合金円盤、い
わゆる磁気ディスク3と対接した磁気ヘッドlI?iI
図である。
In the perspective view of the magnetic head in Figure 1B), l is a slider that floats or floats due to hydrodynamic air flow as the magnetic disk rotates, and 2 is the rear end of slider l, that is, the magnetic disk in the direction of the arrow. This is a thin film head element attached to the rear end for one direction of rotation. Right side of the figure ←) Figure #'i front layout》 The component shown in the figure is an aluminum alloy disk coated with a magnetic material, a so-called magnetic head lI? in contact with a so-called magnetic disk 3? iI
It is a diagram.

薄膜ヘッド素子2は簡略図示される様に従来の磁気;ア
・曹一りと同等の磁性層5を薄IF形成しかつその下方
の磁気ディスク対W1部分を磁気ギャップ4としR/W
ギャップを形成さセる。又図の6Fi員巻状導体を1着
した電磁コイル又はコイルである。第1111←)図中
7は、前記コイルの外部リード端子部である。
As shown in the simplified diagram, the thin-film head element 2 has a magnetic layer 5 equivalent to that of conventional magnetism;
A gap is formed. Also, it is an electromagnetic coil or coil with one 6Fi-member wound conductor as shown in the figure. 1111←) 7 in the figure is an external lead terminal portion of the coil.

他方、第2mの水平蓋薄腓磁気ヘッドでは、基本的な薄
膜ヘッド素子2の前記構成並びに浮動スライダlの構1
1!は岡じである。しかし、薄膜ヘッド素子雪が水平状
鯵で浮動スライダの底面に鋏着される点が異る。第2M
)図は、かかる薄膜ヘッド素子2の取付け、並びに浮動
スライダに設けるレール8の形成状謬が明示しである。
On the other hand, in the 2m-th horizontal lid thin magnetic head, the basic structure of the thin film head element 2 and the structure 1 of the floating slider l are used.
1! is Okaji. However, the difference is that the thin film head element is attached horizontally to the bottom surface of the floating slider. 2nd M
) The figure clearly shows how the thin film head element 2 is mounted and how the rails 8 are formed on the floating slider.

ただし第2図のH)Itは磁気ディスク側から見た薄S
*気ヘッド斜視図、又11H)IIの指標纏A−Aで切
断の断面図が仝l1ll仲)図である。
However, H)It in Figure 2 is the thin S seen from the magnetic disk side.
*This is a perspective view of the air head, and a cross-sectional view taken along the indicator line A-A of 11H) II.

然るに、現在磁気ヘッド素子の主流をなす−1製薄膜ヘ
ッドは、形成の素子をウェーハから一列状に切り出した
後、ギャップディブス加工や浮動レール加工を行なうた
め多大の工数を所要とする等量童上尚問題が残る。他方
、水平層薄膜ヘッド成が未知のため実用化されてないが
、素子形成後の機械加工は容易であり量産化に適してい
る。
However, the -1 thin film head, which is currently the mainstream of magnetic head elements, requires a large number of man-hours to perform gap dibs processing and floating rail processing after cutting the forming elements in a line from a wafer. The problem of Takashi Dogami remains. On the other hand, although it has not been put into practical use because the horizontal layer thin film head formation is unknown, machining after element formation is easy and suitable for mass production.

(初 発明の目的 本発@は前記浮動塵構成の薄膜磁気ヘッド素子を水平■
構成とする形成手段を提示するtので、前記浮動スライ
ダと薄膜ヘッド素子とを一体的に組立てる新規な製造方
法を提供することにある。
(First Purpose of the Invention The present invention @ aims to horizontally
Therefore, it is an object of the present invention to provide a novel manufacturing method for integrally assembling the floating slider and the thin film head element.

(4)発明の構成 磁気記鎌媒体に対し配碌又は記録情報の読出しをなす浮
動型磁気ヘッドを薄層形成するに轟り、少くとも平坦な
基板に磁気回路並びにコイル導体部等からなる薄膜ヘッ
ド素子を形成する工程と、前記薄膜ヘッド素子基板に皺
ヘッド浮動用凸状のレール積層の成膜工程と、前記積層
成膜のレール部をエツチング等して所定NIlに浮動レ
ールを形成する工程とを含む磁気ヘッドOm造方法であ
る。
(4) Structure of the invention It is popular to form a floating magnetic head for arranging magnetic recording media or reading recorded information in a thin layer, and a thin film consisting of a magnetic circuit, a coil conductor, etc. on at least a flat substrate. a step of forming a head element, a step of forming a convex rail layer for floating the wrinkled head on the thin film head element substrate, and a step of etching the rail portion of the layered film to form a floating rail at a predetermined NIl. This is a method for manufacturing a magnetic head Om.

(5)発明の実施例 以下、第311乃至all!6WJを参照して本発1l
IO実施例を1!−する。各図共に、製造に係る要部プ
■セスを説明するための図である。
(5) Examples of the invention Below, No. 311 to all! Referring to 6WJ, this issue is 1l.
1 IO example! - to do. Each figure is a diagram for explaining the main process related to manufacturing.

第3図は例えばAle On +1TIC即ちチタンカ
ーバイト含有のアルζデセラ建ツク組成尋の平坦表面加
工が完了したヘッド形成基@10の正面M)と1IiI
illl←)(り下各閣の0)図、(ロ)図も同一の正
面間と側WUIIlである)。
Figure 3 shows, for example, the front surface M) and 1IiI of the head forming base @10 on which the flat surface processing of Ale On +1TIC, that is, the titanium carbide-containing aluminum ζdecera construction composition has been completed.
illll←) (The 0) and (b) figures of each cabinet are also the same front space and side WUIIl).

第411は、薄膜ヘッド素子11がma図基板10上−
こ形成されたところ、その右方にヘッド素子11の拡大
正面図(ハ)と素子形成の拡大側断面図がに)図示しで
ある(第5lll及び第6WJ4同−配列で示しである
)0図中、12は素子11の構成要素をなす高透磁性金
属をパターン被着した磁気回路形成部、13は鋼等導体
を渦IIkあるいはスパイラル状にパターン被着したフ
ィル導体層、又14a磁気@Ml!中に設けるR/Wギ
ャップである。前記の磁気回路部12と;イル導体層1
3と更に各コイル導体層の間は図示にないが絶縁層が形
成される。しかして形成のヘッド素子高さは数μm乃至
数十μmの高さとなる。
No. 411, the thin film head element 11 is placed on the ma-diagram substrate 10.
When this is formed, an enlarged front view (C) of the head element 11 and an enlarged side cross-sectional view of the element formation are shown to the right (No. 511 and No. 6 WJ4 are shown in the same arrangement). In the figure, reference numeral 12 denotes a magnetic circuit forming portion formed by pattern-covering a highly magnetically permeable metal which is a component of the element 11, 13 a fill conductor layer formed by pattern-covering a conductor such as steel in a vortex IIk or spiral shape, and 14a magnetic@ Ml! This is the R/W gap provided inside. The magnetic circuit section 12 and the conductor layer 1
Although not shown, an insulating layer is formed between the coil conductor layer 3 and each coil conductor layer. Thus, the height of the formed head element is several μm to several tens of μm.

第411図示の薄膜ヘッド素子11は、従来集積回路(
IC)の製造に用いる7オ) IJノグラフイ技法を応
用し基板上にモジ、−ルとして形成される。
The thin film head element 11 shown in FIG. 411 is a conventional integrated circuit (
It is formed as a module on a substrate by applying IJ printing technique.

#!5図は、前記に続き空気流て浮上する浮動レール1
5(第2図の8に#轟)を基板1G上に成膜する工程で
ある。即ち、ヘッド素子11の配列ピッチ間に凸状レー
ルを成膜するが、これ社例えば基板票材との組合せで例
えば810.とかム40s等組成の膜材を用いて形成さ
れる。しかし、凸状レール15はに)図に示す様にヘッ
ド素子1mの高さに応じ同高もしくはそれ以上の高さ4
こ積層する。
#! Continuing from the above, Figure 5 shows the floating rail 1 floating by air flow.
5 (#Todoroki at 8 in FIG. 2) is formed on the substrate 1G. That is, a convex rail is formed between the array pitches of the head elements 11, and in combination with a substrate material, for example, 810. It is formed using a film material having a composition such as Tom 40S. However, as shown in the figure, the height of the convex rail 15 is the same or higher depending on the height of the head element 1m.
This is layered.

この場合比較的に素子高さが低いとIFiリフトオフ手
法を用い、又比較的に素子高さが高い例えば数十μ誼の
素子高さの場合はマスク蒸着技法を用いて基板全面にパ
ターン化して成膜15するものである。また必要に応じ
て全面に成膜して%よくその後はギヤップディブスが所
要の寸法となる様に平面ラッピングされる。
In this case, if the element height is relatively low, the IFi lift-off method is used, and if the element height is relatively high, for example, several tens of micrometers, the entire surface of the substrate is patterned using a mask vapor deposition technique. A film is formed 15 thereon. Further, if necessary, a film is formed on the entire surface, and after that, the gap dibs are flat-wrapped so that they have the required dimensions.

第6図は前置工程に絣き、浮動レール1!sO再加工工
程に#幽し、前記のマス身蒸着法等にぶる成膜のレール
凸部に対し所望のパターン精度を出す1鵬である。#工
Sは前記レール付設面に対し更に精細なレールパターン
を創出するため、例えば基板全面にレジスト塗布して塗
布面の選択的蝕刻をなすパターン露光−び番ζケミカル
エツチング等しくニ)図示形状のレール面16を形成す
る。しかし、前記レール面の加工はガスプラズマを用い
たイオンシャワーリング方式のイオンエツチングあるい
はプラズマエツチングにより、更に又機械的加工手段に
よって精度よく加工することも出来る。
Figure 6 shows floating rail 1 with splashed patterns in the preliminary process! This is one way to achieve the desired pattern accuracy for the rail convex portions of the film formed by the mass vapor deposition method, etc., in the sO reprocessing process. In order to create a finer rail pattern on the rail attachment surface, the # process involves, for example, applying a resist to the entire surface of the board and selectively etching the coated surface by pattern exposure and chemical etching. A rail surface 16 is formed. However, the rail surface can be processed with high precision by ion etching or plasma etching using an ion showering method using gas plasma, or by mechanical processing means.

前記イオンエツチング処理を行なう加工の場合は、薄膜
ヘッド素子11のコア巾あるいは磁気回路12の巾精度
を付与する加工を同じ工程で併せ行なうことも出来、好
都合である。
In the case of processing using the ion etching process, processing for imparting accuracy to the core width of the thin film head element 11 or the width of the magnetic circuit 12 can also be carried out in the same process, which is convenient.

尚、第6図薄膜ヘッド素子の拡大正面図e1及び側断面
図に)図は、特に凸状の浮動レール16が完成した単位
薄膜ヘッド素子1の切出しがなされた秋−を示す、前記
切出し加工は規則性をもって記動された素子基板lOを
ダイヤモンドカッタで切削すればよい。
The enlarged front view e1 and side cross-sectional view of the thin film head element in FIG. It is sufficient to cut the element substrate 10, which has been marked with regularity, with a diamond cutter.

かくして同時に多数の薄膜磁気ヘッド素子を一括製作す
ることが可能となる。
In this way, it is possible to manufacture a large number of thin film magnetic head elements at the same time.

(6)発明の詳細 な説明した本発明の磁気ヘッド′素子の製造方法によれ
ば、適宜大いさの素子形成基IN(第311参jll)
の使用により浮動レールを一体化ししかも検雑なレール
形状のスライ〆でも製作が容易である。又前配本発明の
磁気ヘッド素子は、対接の磁気ディスクに対し負圧併用
構成になる浮上力制御のスライダにも容易に適用される
利点がある。かかる観点から本発明の実用的効果は大き
い。
(6) According to the method for manufacturing a magnetic head' element of the present invention described in detail, the element forming group IN (see No. 311 jll) of an appropriate size can be used.
By using the floating rail, it is possible to integrate the floating rail, and it is easy to manufacture even a slide with an intricate rail shape. Further, the magnetic head element of the present invention has the advantage that it can be easily applied to a flying force control slider configured to use negative pressure with respect to an opposing magnetic disk. From this point of view, the practical effects of the present invention are significant.

【図面の簡単な説明】[Brief explanation of the drawing]

(イ)図と側面図(ロ)図、及び第3図乃至第6図は本
発明の製造方法を説明する図で(イ)図は正面図、(ロ
)図は側面図、(/1図は薄膜ヘッド素子の拡大正面図
及びに)図は(ハ)図の側断面図である。 図中、1はスライダ、2と11は薄膜ヘッド素子、3は
磁気配録媒体(磁気ディスク)、4と14はR/Wギャ
ップ、5と12は磁気回路、6と13はコイル導体部、
lOはヘッド素子形成の基板及び8と15と16はlの
浮上又は浮動レールである・ ’fy1図 (イノ 2m tイノ 10) 明   1 8          〒 日       田
(A) Figure and side view (B) Figures, and Figures 3 to 6 are diagrams for explaining the manufacturing method of the present invention. (A) Figure is a front view, (B) Figure is a side view, (/1 The figure is an enlarged front view of the thin film head element, and Figure 2) is a side sectional view of Figure 3C. In the figure, 1 is a slider, 2 and 11 are thin film head elements, 3 is a magnetic recording medium (magnetic disk), 4 and 14 are R/W gaps, 5 and 12 are magnetic circuits, 6 and 13 are coil conductor parts,
lO is the substrate for forming the head element, and 8, 15, and 16 are the floating or floating rails of l.

Claims (1)

【特許請求の範囲】[Claims] 醜気記鍮l#1lI3に対し配録又は配―情報の読出し
を愈す浮動型磁気ヘッドを薄膜成形するに極り、少くと
も平坦な基板に磁気回路並びにコイル導体部等から碌る
薄膜ヘッド素子を形成する工程と、前記基板に該ヘッド
浮動用凸状のレール積層の成膜1獅と、前配積層底膿の
レール部をエツチング等して所定精屓に浮動レールを形
成する工程とを含むことを特徴とする磁気ヘッドの製造
方法。
A floating magnetic head for recording or distributing information for Ugukiki Brass #11I3 is formed into a thin film, and the thin film head is formed from a magnetic circuit and a coil conductor on at least a flat substrate. a step of forming an element, a step of forming a convex rail laminated film for the head floating on the substrate, and a step of etching the rail portion of the front laminated layer to form a floating rail in a predetermined area. A method of manufacturing a magnetic head, comprising:
JP21171981A 1981-12-25 1981-12-25 Production of magnetic head Pending JPS58114328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21171981A JPS58114328A (en) 1981-12-25 1981-12-25 Production of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21171981A JPS58114328A (en) 1981-12-25 1981-12-25 Production of magnetic head

Publications (1)

Publication Number Publication Date
JPS58114328A true JPS58114328A (en) 1983-07-07

Family

ID=16610461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21171981A Pending JPS58114328A (en) 1981-12-25 1981-12-25 Production of magnetic head

Country Status (1)

Country Link
JP (1) JPS58114328A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2559296A1 (en) * 1984-02-03 1985-08-09 Commissariat Energie Atomique NEW CATAMARAN-TYPE SKATE FOR MAGNETIC RECORDING HEADS AND METHOD FOR MANUFACTURING THE SAME
US6172850B1 (en) * 1994-09-29 2001-01-09 Alps Electric Co., Ltd. Floating type magnetic head with non-magnetic thin film coating pattern to reduce starting friction

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2559296A1 (en) * 1984-02-03 1985-08-09 Commissariat Energie Atomique NEW CATAMARAN-TYPE SKATE FOR MAGNETIC RECORDING HEADS AND METHOD FOR MANUFACTURING THE SAME
EP0152328A2 (en) * 1984-02-03 1985-08-21 Commissariat A L'energie Atomique Device for writing on and reading from a magnetic carrier, and process for its production
US4698708A (en) * 1984-02-03 1987-10-06 Commissariat A L'energie Atomique Device for magnetically reading and writing on a flying support
US6172850B1 (en) * 1994-09-29 2001-01-09 Alps Electric Co., Ltd. Floating type magnetic head with non-magnetic thin film coating pattern to reduce starting friction

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