JPS58111335A - Wafer prober for optical element - Google Patents

Abstract

PURPOSE:To obtain uniform light beam by guiding the light beam generated from the source provided at the outside of wafer prober to said wafer prober with an optical fiber and by switching-over the optical paths of this light beam and the light for alignment using a movable mirror. CONSTITUTION:The light beam generated by a light source 1 provided at the outside of wafer prober P enters the wafer prober P passing an optical fiber 2 and optical fiber guide path 3. This light beam is dispersed by passing through a dispersion plate 5, resulting in more uniform distribution of light intensity and then reflected by the movable mirror and guided to a stage 9. Therefore, uniform light is irradiated to the wafer placed just under a probe card 8. When the reflector is set vertically, alignment can be realized through an alignment microscope 7 comprising a light source.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor measuring device that requires uniformity,
In particular, the present invention relates to an ENO-prober which is suitable for Ueno-A probing of optical elements such as image sensors.

Generally, an important item in the optical characteristics of an optical element such as a one-dimensional image sensor is the uniformity of output voltage with respect to input light. The Queja Prober is used to check this property in the Queja state, but the conventional Queja Proper only has a light source for use in alignment to the sea urchin, so it is difficult to find the uniformity suitable for measuring this type of element. The disadvantage is that it cannot receive light.

Usually, to obtain uniform light, the light source is placed far away. Increase light intensity. Narrow the aperture. It is only necessary to take measures such as installing a diffuser plate, and therefore, if such measures are applied to this type of prober, the above-mentioned drawbacks can be overcome, but in a limited 9 area like a prober, it is not possible to use a normal light source. It cannot be achieved by doing so.

An object of the present invention is to provide a light source outside the quenching prober unit, to guide the light from the light source to the quenching probe unit using a light beam, and to switch the optical path of this light and the optical path of alignment light using a movable mirror. To provide a quenching prober with the following configuration, which can obtain sufficient uniform light necessary for accurate measurement in measuring the output uniformity of optical element semiconductor quenching devices such as image sensors. It is in.

An embodiment of the present invention will be explained below with reference to FIG. 2 and FIG. The overall configuration of the first allK wafer prober is shown. Light generated by a light source 1 provided outside the wafer prober SP passes through an optical fiber 2 extending between the light 11 and the '7z prober section P, and enters the wafer prober section P via an optical fiber introduction path 3. The light is diffused by 21!1iIA of the diffuser plate 5, resulting in a more uniform light intensity distribution. This party is reflected by a movable mirror 6 and guided onto a stage 9. Therefore, the target uniform light is irradiated onto the wafer directly below the probe card 8. The configuration of the movable mirror 6 is shown in Figure 1g2. Reference numeral 11 indicates a mirror body, which can be swung around a fulcrum 12 provided on the diaphragm plate 13 by means of a link (not shown), etc. 6
6° If it is in the hot position, the area alignment will be aia for the alignment microscope in the light source R11 shown by reference numeral 7 in Fig. 1, and if it is in the position b, it will block the light from the alignment light source and 2 can be led onto stage 9. This movable mirror 6 can be attached to an adapter shown at IO.

Therefore, according to this Queha Prober, 9! The light source of the light during groping can be moved substantially away from the quadrature prober section, and uniform light irradiation can be achieved.

As described above, according to the square propper of the present invention, not only can the stage be uniformly irradiated, but also the accuracy of the light intensity on the stage can be set to 2 to 3'l. Since the alignment light source can only achieve an accuracy of 4!104 degrees,
When measuring the output uniformity characteristics of optical devices, over-specification occurred, which was a major factor hindering the improvement of the yield of optical devices.However, with the present invention, by using a source with uniform light intensity, it is possible to measure the characteristics of optical devices. Improved accuracy and yield can be achieved.

[Brief explanation of the drawing]

Figure 1 is an overall configuration diagram of the +7 wafer properr, Figure #I2 (A
), tB), (C) are the front view, bottom view, and 1iIrkJ diagram of the movable mirror. l... Original fiber light source, 2... Original fiber light source, 5.
... Diffusion plate, 6... Movable mirror, 7... Alignment microscope, 9... Stage. Representative Patent Attorney Susuki 1) Toshiyuki 1, -1

Claims (1)

[Scope of Claims] A Z/S prober for an optical element, in which an optical element set in a haproper section of 1 and 9 is checked using an alignment microscope equipped with an alignment light source,
An optical element characterized in that a light source is provided outside the wafer blower six section, the light source light is guided to the wafer propper section using an optical fiber, and the optical paths of this light source light and the alignment light source light can be switched. Phenome prober. 2. The pheno-prober for optical devices according to claim 1, wherein the means for switching the optical path is a movable mirror.