JPS58111244A - Color picture tube - Google Patents

Abstract

PURPOSE:To reduce coma aberrations to a practically permissible degree by providing magnetically-high-resistance parts at parts which are practically parallel to the horizontally-deflecting magnetic fields of deflecting-magnetic-field controlling elements and vertical to the horizontal axis. CONSTITUTION:Magnetically-high-resistance parts 18, 19, 22 and 23 are provided at part, which are practically parallel to the horizontally-deflecting magnetic fields of deflecting-magnetic-field controlling elements 15 and 16 and include the centers of both side-beam discharging holes 12 and 14. Owing to such a constitution, most of the magnetic flux of a horizontally-deflecting magnetic field which is to pass near the center of a center-beam discharging hole 13 is absorbed by deflecting-magnetic-field controlling elements 20 and 21, and the intensity of the horizontally-deflecting magnetic field is weakened. In addition, horizontally-deflecting magnetic fields which are to pass near the holes 12 and 14 are absorbed by deflecting magnetic-field controlling elements 17, 20, 21 and 24. Consequently, the elements 15 and 16 decrease the horizontally deflected sensitivity of a center beam, increase the horizontally deflected sensitivities of both side electron beams, and can correct the side coma aberration among the coma aberrations of a pattern projected upon a picture screen.

Description

TECHNICAL FIELD OF THE INVENTION The present invention relates to a color picture tube having an in-line arrangement of three electron guns, and particularly to a color picture tube that reduces the amount of bin distortion correction by a deflection magnetic field control element.

Technical Background and Problems of the Invention In a color picture tube with an in-line array of three electron guns, red,
Deflection and consistency of the deflection scanning area (hereinafter referred to as pattern) on the screen by each of the edge and blue dedicated electron guns is a problem.0 The electrons are arranged in a line along the horizontal axis of the screen, and the electrons are arranged in nine in-line arrays by three electron guns. The beam is deflected and scanned by external deflection means, that is, a vertical deflection magnetic field parallel to the horizontal axis and a horizontal deflection magnetic field perpendicular to the horizontal axis. Pattern distortion and degree of matching are most important. 1Ia shows the deflection magnetic field distribution in the cross section of the neck section housing the 4Hc in-twin array 3 electron gun. This has the advantage of reducing color shift between the electron beams on both sides and simplifying the convergence circuit on the receiver side. However, both of the two deflection magnetic fields have a non-uniform magnetic field distribution, which has the disadvantage that the deflection sensitivity for the central electron beam (4) K is worse than the deflection sensitivity for the side electron beams (3) and (5). have.

In this case, a pattern (6) due to both side electron beams and a pattern (7) due to central electron beams as shown in Fig. 2 are obtained on the screen, and this fk phenomenon is considered to be a state with coma aberration. Ru.

In order to correct this, conventionally, a deflection magnetic field control element made of a magnetic material as shown in Figure 3 was installed in the electron beam emission hole of the electron gun, usually at the bottom of the electrode at the tip of the electron gun (on the phosphor screen side). There is. In Figure 3, one side electron beam emission hole (2)
and a deflection magnetic field control element consisting of magnetic bodies (8) and (9) provided so as to surround a4, which functions to weaken the horizontal and vertical image deflection magnetic fields and strengthen the vertical deflection magnetic field near the central electron beam emission hole; On the other hand, the central electron beam emission hole (2)
A deflection magnetic field control element consisting of magnetic bodies tlI and αυ provided above and below with respect to the horizontal axis of the electron beam is controlled to strengthen the horizontal deflection magnetic field near the central electron beam emission hole. As a result, the deflection sensitivity for the nine id electron beams becomes faster than the deflection sensitivity for the center electron beam, which compensates for the deterioration in the deflection sensitivity of the center electron beam due to the non-uniform deflection magnetic field, resulting in less comatic aberration on the screen. A pattern is obtained.

By the way, if you try to omit the convergence correction circuit on the receiver side or try to reduce the amount of bin cushion distortion correction by variously changing the ellipse of the deflection yoke and the magnetic field distribution, you will be able to find a deflection yoke and collar that can achieve the above goals. The pattern of comatic aberration for a combination of picture tubes is not necessarily a pattern as shown in FIG. 2, but may be a pattern as shown in FIG. 4. That is, the pattern (6) due to both side electron beams and the pattern (6) due to the center electron beam
7) becomes complicated, and in the case of such a front pattern, the deflection magnetic field control element as shown in FIG. 3 cannot reduce the coma aberration.

OBJECTS OF THE INVENTION The present invention has been made in view of the above points, and it is an object of the present invention to provide a color picture tube in which VC@ is eliminated so that the coma aberration tube is practically acceptable.

The purpose of the present invention is to solve the difference in the deflection sensitivity between the two side electron beams and the center electron beam in a combination of a color picture tube and a deflection sensor, which have different deflection sensitivities for the two side electron beams and the center electron beam. There is a need to provide means.

SUMMARY OF THE INVENTION The present invention has an in-twin array three electron guns arranged in a row on a horizontal axis, and the electron beam is deflected by a horizontal deflection magnetic field in a direction perpendicular to the horizontal axis and a vertical deflection field in a direction parallel to the horizontal axis. In a color picture tube which is deflected by a deflection magnetic field and has a deflection magnetic field control element disposed so as to surround both side beam passing areas, the horizontal axis including the center of each of the both side beams of the deflection magnetic field control element is vertical. The effective intensity distribution of the deflection magnetic field is changed by providing magnetically high resistance sections in each section, thereby making the deflection magnetic field strength for both side electron beams and the deflection magnetic field for the center electron beam different from each other, thereby achieving the above-mentioned purpose. The goal is to achieve the following.

Examples of the invention The present invention will be described in detail below with reference to Examples.

FIG. 5 is a front view of the deflection magnetic field control elements (6) and (6) applied to the color picture tube of the present invention, viewed from the phosphor screen side. The deflection magnetic field control elements (g) and (to) shown in Fig. 5 are placed in the area covered by the deflection magnetic field, for example, at the bottom of the most advanced electrode on the phosphor screen side of the in-line array 3 electron gun. The whole is omitted and only the main parts are shown. In FIG. 5, the electron beam emission hole Qal (to) and α◆ are arranged in a straight line along the horizontal axis [5]. Then, the deflection magnetic field control elements (to) and (2) are arranged so as to surround both side beam emission holes (b) and (b), that is, both side beam passage areas.
) is provided.

The horizontal axis KfllI [fk portion is substantially parallel to the horizontal deflection magnetic field of the deflection magnetic field control element (to) and the horizontal deflection magnetic field of , (6), @ and (2) are provided.

If the deflection magnetic field control element is configured as shown in FIG.
Therefore, most of the magnetic flux of the horizontal deflection magnetic field, which should originally pass near the center on the side of the central beam emission hole, flows through the deflection magnetic field control element members and @
, and the horizontal deflection magnetic field strength near the central beam emission hole becomes weaker than when there is no magnetic field control element.

Also, the horizontal deflection magnetic field that should originally pass near both side beam emission holes (2) and (b) is the deflection magnetic field control element Q7).

Absorbed by Kan, @ and (24).

However, a part of the magnetic flux of the horizontal deflection magnetic field that should originally pass near the center of both side beam emission holes (to) and (b) is a magnetically high resistance part w, 011. It passes through the @ and - deflection magnetic field control element parts, and passes near the center of both side beam holes.

Therefore, when the deflection magnetic field control elements (to), (40, @ and (to) have high magnetic resistance, the magnetic flux near both side beam emission holes is stronger. Therefore, the deflection magnetic field control elements (2) and (40, @ and (to) As a result, the horizontal deflection sensitivity of the central beam is weakened, and the horizontal deflection sensitivity of the electron beams on both sides is strengthened, and it is possible to correct the left and right coma aberrations in the pattern shown in Figure 4. - The distribution characteristics of the horizontal deflection magnetic field intensity due to the deflection magnetic field control element (to) and @ in this case are shown in FIG. 1. In FIG. 7, the horizontal axis is the valley electron beam emission hole (6).

To the center position 6υ corresponding to (to) and (b)) and -
are shown, respectively, and the vertical axis shows the horizontal deflection magnetic field strength (BH).

Horizontal deflection magnetic field strength distribution when there is no deflection magnetic field control element itself, and when the deflection magnetic field control element of both side beams is the third
For the horizontal deflection magnetic field strength distribution (2) in the case shown in the figure,
The difference in the horizontal deflection magnetic field intensity distribution in the case of the embodiment of the present invention is clearly shown.

Figure 6 shows another embodiment of the present invention, in addition to the embodiment shown in Figure 5. Magnetically high-resistance deflection magnetic field control element portions (2) and (4) are provided on the opposite side of the hole.

By configuring the deflection magnetic field control element as shown in FIG.
Most of the magnetic flux of the vertical deflection magnetic field that should pass near the center of is absorbed by the deflection magnetic field control element part (E), @, @, (support), (2) and ■, and the vertical deflection magnetic field near the both side beam emission holes The magnetic flux of the vertical deflection field near the center of the central beam exit hole becomes stronger. Therefore, the vertical deflection sensitivity of both side beams is weakened, and the central electron beam OII
It works to strengthen the direct deflection sensitivity, and among the coma aberrations in the pattern shown in FIG. 4, it is possible to correct the upper and lower coma aberrations.

The vertical deflection magnetic field strength (Bv) 0 distribution characteristics of the deflection magnetic field control element (to) and 01 in this case are shown in FIG. 8 in the same manner as in FIG. 7. 1 for the vertical deflection magnetic field strength distribution □□□ without the element itself and the direct deflection magnetic field strength distribution @ when there is no deflection magnetic field control element part other than the deflection magnetic field control element part - and (2)
The difference in the vertical deflection magnetic field strength distribution in the case of this embodiment is clearly shown.

In the above explanation, in the embodiment shown in FIG. 5, the correction of left and right coma aberration was mainly explained, and in the embodiment shown in FIG. 6, the effect of correction of vertical coma aberration was mainly explained. The embodiment shown in the figure can correct comatic aberration more effectively than the embodiment shown in FIG.

Note that part or all of the magnetically high resistance portion of the deflection magnetic field control element shown in FIGS. 5 and 6 may be formed of a gap or may be formed of a non-magnetic material. ,
That is, the horizontal and vertical deflection magnetic field strength distributions of this magnetically high resistance portion should be appropriately selected and designed according to the combination of the deflection yoke and color picture tube used, in accordance with the gist of the present invention.

Effects of the Invention As described above, according to the present invention, the deflection sensitivity of the center beam to the vertical deflection magnetic field is relatively increased compared to the deflection sensitivity of both side beams, and the deflection sensitivity of both side beams to the horizontal deflection magnetic field is increased relative to the deflection sensitivity of the center beam to the horizontal deflection magnetic field. By increasing the deflection sensitivity of K relative to the solid relative, the pattern of the central electron beam for one side electron beam '5 is lengthened in the horizontal direction in the putter yK on the screen of a color picture tube with three electron guns in an in-line arrangement. Comatic aberrations that are short in the vertical direction can be easily and effectively corrected, and the comparability correction circuit can be omitted and the amount of pin distortion correction can be reduced, which is of great industrial value.

[Brief explanation of the drawing]

Figure 1 is a schematic cross-sectional view for explaining the deflection magnetic field distribution at the neck, Figure 2 is a schematic diagram showing the pattern on the screen due to the deflection magnetic field distribution in Figure 1, and Figure 3 shows a conventional magnetic field control element. A schematic cross-sectional view, FIG. 4 is a schematic diagram showing the on-screen pattern of a color picture tube having three electron guns in an in-line arrangement, and FIGS. 5 and 6 show examples of the arrangement of magnetic field control elements applied to the present invention. The schematic cross-sectional views shown in FIGS. 7 and 8 are distribution characteristic diagrams showing the horizontal and vertical deflection magnetic field intensities shown in FIGS. 5 and 6 for each electron beam position. (2), α◆・・・Side electron beam emission hole (to)・
... Central electron beam emission hole (G), QIS ... Deflection magnetic field control element αη, (E)
, (c), 124. Trunk, fin, (ha), (to)...
・Deflection magnetic field control element part (to), 054, @, @, (e), Kan...
...Magnetic high resistance part (7317) Agent: Patent attorney Noriyuki Chika (and 1 other person) 1st. Figure 3 Figure 2 Figure 4

Claims (1)

[Claims] 1) Nine in-line array three electron guns are arranged in a row with a horizontal axis 1icfi1, and the electron beam of the electron gun is directed perpendicularly to the horizontal axis with a horizontal deflection magnetic field. In a color picture tube, the deflection magnetic field is scanned by a direct deflection magnetic field in a parallel direction and has a deflection magnetic field control element arranged so as to surround both side beam passing regions of the three in-line electron guns. A collar characterized in that a control element O is provided with a magnetically high resistance portion in a portion substantially parallel to the horizontal deflection magnetic field and perpendicular to the horizontal axis including the center of each of the two nide beams. Picture tube. 2) A portion of the deflection magnetic field control element that is substantially parallel to the perpendicular deflection magnetic field, substantially parallel to the horizontal axis including the centers of each of the two side beams, and opposite to the central beam is magnetically 2. The color picture tube according to claim 1, further comprising a high-resistance bottle portion. 3) Claim 1 or 2, characterized in that part or all of the magnetically high resistance portion consists of a gap.
Color picture tube as described in section. 4) Claim 1 or 2, characterized in that part or all of the magnetically high resistance portion is made of a non-magnetic material.
Color picture tube as described in section.