JPS58111014A - Holder for reflecting mirror - Google Patents
Holder for reflecting mirrorInfo
- Publication number
- JPS58111014A JPS58111014A JP56215523A JP21552381A JPS58111014A JP S58111014 A JPS58111014 A JP S58111014A JP 56215523 A JP56215523 A JP 56215523A JP 21552381 A JP21552381 A JP 21552381A JP S58111014 A JPS58111014 A JP S58111014A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- laser beam
- holder
- clean gas
- reflecting mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、加工用レーザにおいて、出力ビームの方向を
変える目的で使用される反射ミラーの保持装置に関する
。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a holding device for a reflecting mirror used for the purpose of changing the direction of an output beam in a processing laser.
従来、加工用レーザにおいては、大気中でのエネルギー
ロスが小さく、拡がりが小さいというビーム特性を生か
し、発振器より離れた位置において集光系を用い加工す
るという手段が用いられてきた。この場合、所定の位置
にレーザビームを導くために反射ミラーが用いられる。Conventionally, processing lasers have taken advantage of the beam characteristics of low energy loss in the atmosphere and small spread, and have been used to perform processing using a condensing system at a position away from the oscillator. In this case, a reflective mirror is used to guide the laser beam to a predetermined location.
第１図に最も簡潔な光学系の構成を示す。発振器１よ
り出だレーザビーム２は反射ミラー３により方向を変え
られ、集光レンズ４により集束され、被加工物５に照射
される。レーザビーム２の経路は安全のだめカバー６で
稜われている。−また被加工物６が大きい場合は、第２
図に示すような方法で加工されることが多い。Figure 1 shows the simplest optical system configuration. A laser beam 2 emitted from an oscillator 1 is changed in direction by a reflection mirror 3, focused by a condensing lens 4, and irradiated onto a workpiece 5. The path of the laser beam 2 is surrounded by a safety cover 6. - Also, if the workpiece 6 is large, the second
It is often processed using the method shown in the figure.
すなわち、発振器７から出だレーザビーム８はＸ−Ｙテ
ーブル９の高さ、移動方向に合致するようにミラーＩＱ
、１１を用いて調整され、Ｘ−Ｙテーブル９上をミラー
１２．１３にて移動し、集光レンズ１４にて集束され、
被加工物１６に照射される。That is, the laser beam 8 emitted from the oscillator 7 is aligned with the mirror IQ so that it matches the height and moving direction of the X-Y table 9.
, 11, moved on the X-Y table 9 by mirrors 12 and 13, and focused by the condenser lens 14,
The workpiece 16 is irradiated.
このような構造の場合、レーザビーム８が移動すること
により、第１図の場合に比べ、ビーム経路の完全なカバ
ーが困難となり、一般には一部のみのカバー、もしくば
Ｘ−Ｙテーブル９全体をカバーする方法がとられる。し
かし、いずれも反射ミラー１０，１１．１２．１３は加
工時の大気雰囲気中に晒されることとなり、被加工物１
６より加工時に発生する物質や、大気中の塵埃等がミラ
−表面に付着する結果となる。これらはレーザビームの
エネルギーにより溶着し、ミラーの反射率低下や表面性
状の劣化を招き、加工能力を低下さ 。In such a structure, due to the movement of the laser beam 8, it is difficult to completely cover the beam path compared to the case shown in FIG. A method is taken to cover the However, in all cases, the reflecting mirrors 10, 11, 12, and 13 are exposed to the atmosphere during processing, and the workpiece 1
6. As a result, substances generated during processing and dust in the atmosphere adhere to the mirror surface. These deposits are welded by the energy of the laser beam, leading to a decrease in mirror reflectivity and deterioration of surface quality, reducing processing ability.
せる−因となっている。また第１図に示す構造において
も発振器１側より汚染物が侵入する可能性は残されてお
り、同様の問題点をかかえているのが現状である。cause - cause Furthermore, even in the structure shown in FIG. 1, there is still a possibility that contaminants may enter from the oscillator 1 side, and the same problem is presently occurring.
本発明は、上記のような従来の欠点を改善するために、
ミラー表面に汚染物が付着するのを防止し、ミラーの耐
久性を高めることを目的とするものである。In order to improve the conventional drawbacks as described above, the present invention has the following features:
The purpose is to prevent contaminants from adhering to the mirror surface and increase the durability of the mirror.
すなわち、ミラー表面への塵埃類の付着を防止する手段
として、ミラー表面にクリーンガスを吹き付けるととも
に、ミラー周辺への塵埃侵入防止効果をクリーンガスの
圧力により達成できるような形状の開口チャンバーを設
けたものである。In other words, as a means to prevent dust from adhering to the mirror surface, clean gas is sprayed onto the mirror surface, and an open chamber is provided in a shape that allows the pressure of the clean gas to prevent dust from entering around the mirror. It is something.
以下本発明による一実施例を第３図に示す。入射レーザ
ビーム１６はミラーホルダ１７に取り付けられた反射ミ
ラー１８の中央部において反射し所定の方向に変化する
。ミラーホルダ１７には、レーザビーム１６の出入口に
それぞれテーバ状のルタを介し、クリーンガスとしてミ
ラー１８の表面に常時一定圧で吹き付けられているもの
とする。An embodiment according to the present invention is shown in FIG. 3 below. The incident laser beam 16 is reflected at the center of a reflecting mirror 18 attached to a mirror holder 17 and changes in a predetermined direction. It is assumed that clean gas is always blown onto the surface of the mirror 18 at a constant pressure through taper-shaped routers at the entrance and exit of the laser beam 16 in the mirror holder 17.
これにより、あらかじめミラー１８の表面に付着してい
る塵埃を除去するとともに、テーパ状のチャンバー構造
により、内圧が大気圧より高い状態に維持され、加工時
に発生する汚染物質や、大気中の塵埃の侵入を未然に防
止することが可能となる。またガス吹き付けの付随効果
としてミラーの冷却作用が挙げられる。This removes dust that has adhered to the surface of the mirror 18 in advance, and the tapered chamber structure maintains the internal pressure higher than atmospheric pressure, removing contaminants generated during processing and dust in the atmosphere. It becomes possible to prevent intrusion. Additionally, a cooling effect on the mirror can be mentioned as an accompanying effect of gas blowing.
以上のような本発明の反射ミラーの保持装置によれば、
次のような効果がある。According to the reflective mirror holding device of the present invention as described above,
It has the following effects:
（１）ミラー面の汚染防止による信頼性の向上、加工能
力の維持、メインテナンスの簡素化が図れる。(1) Reliability can be improved by preventing contamination of the mirror surface, machining capacity can be maintained, and maintenance can be simplified.
（２）ミラー冷却による長寿命化が図れる。(2) Longer life can be achieved by cooling the mirror.
第１図は一般のレーザビーム（固定式）の光学系の概略
構成を示す断面正面図、第２図（イ）、（ロ）も一般の
レーザビーム（移動式）の光学系の概略構成を示す平面
図と側面図、第３図は本発明による反射ミラーの保持装
置の一実施例の断面正面図である。
１６・・・・・・レーザビーム、１７・・・・・・ミラ
ーホルダ、１８・・・・・・反射ミラー、１９．２０・
・・・・・チャンバー、２１・・・・・・ノズル穴。Figure 1 is a cross-sectional front view showing the schematic configuration of the optical system of a general laser beam (fixed type), and Figures 2 (a) and (b) also show the schematic configuration of the optical system of a general laser beam (movable type). FIG. 3 is a cross-sectional front view of one embodiment of the reflective mirror holding device according to the present invention. 16...Laser beam, 17...Mirror holder, 18...Reflection mirror, 19.20.
...Chamber, 21...Nozzle hole.
Claims (1)
ル穴とミラー面がクリーンガスで覆われるように開口部
を絞った形状のチャンバーとを備えたミラーホルダーに
反射ミラーを取り付けたことを特徴とする反射ミラーの
保持装置。A reflective mirror characterized in that a reflective mirror is attached to a mirror holder equipped with a nozzle hole for spraying clean gas onto the mirror surface of the reflective mirror and a chamber with a narrowed opening so that the mirror surface is covered with clean gas. holding device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56215523A JPS58111014A (en) | 1981-12-23 | 1981-12-23 | Holder for reflecting mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56215523A JPS58111014A (en) | 1981-12-23 | 1981-12-23 | Holder for reflecting mirror |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58111014A true JPS58111014A (en) | 1983-07-01 |
Family
ID=16673824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56215523A Pending JPS58111014A (en) | 1981-12-23 | 1981-12-23 | Holder for reflecting mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58111014A (en) |
-
1981
- 1981-12-23 JP JP56215523A patent/JPS58111014A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4749840A (en) | Intense laser irradiation using reflective optics | |
| US5308951A (en) | Laser beam machine | |
| US7064906B2 (en) | Optical pickup device with shielding to limit incident or emitted light | |
| US5558788A (en) | Dual beam optical system for pulsed laser ablation film deposition | |
| GB2402230A (en) | Focusing laser beams to different points | |
| JP3292294B2 (en) | Marking method and marking device using laser | |
| JPH06269968A (en) | Method and device for cutting glass | |
| US20040224508A1 (en) | Apparatus and method for cleaning a substrate using a homogenized and non-polarized radiation beam | |
| JPS58111014A (en) | Holder for reflecting mirror | |
| KR920010303B1 (en) | Sputtering apparatus | |
| JP2000133859A (en) | Laser marking method and device using laser | |
| JP2003071584A (en) | Optical path protective bellows for laser beam machine | |
| JP2000263270A (en) | Optical system for laser beam machining device | |
| JPS5819395B2 (en) | Laser processing method and device | |
| JPH04258394A (en) | Machining head of laser beam machine | |
| CN112518104B (en) | Integrated vision system and laser equipment for preventing back light source from being damaged | |
| KR950006279B1 (en) | Laser abrasion device | |
| JPS58119485A (en) | Nozzle for laser working | |
| KR100623623B1 (en) | Laser head assembly for flat panel trimming | |
| US10618134B2 (en) | Galvo cooling air bypass to reduce contamination | |
| JPH0557472A (en) | Laser beam processing head | |
| JP2002340804A (en) | Observation method and observation device of mark | |
| JP2004195516A (en) | Laser beam machining apparatus and laser beam machining method | |
| JPH01138083A (en) | Detector for reflected and returned beam of carbon dioxide gas laser beam machine | |
| JPS59120393A (en) | Laser working device |