JPS58104179A - Method and apparatus for refilling al evaporator - Google Patents

Method and apparatus for refilling al evaporator

Info

Publication number
JPS58104179A
JPS58104179A JP18225482A JP18225482A JPS58104179A JP S58104179 A JPS58104179 A JP S58104179A JP 18225482 A JP18225482 A JP 18225482A JP 18225482 A JP18225482 A JP 18225482A JP S58104179 A JPS58104179 A JP S58104179A
Authority
JP
Japan
Prior art keywords
evaporator
evaporation
outlet
electron beam
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18225482A
Other languages
Japanese (ja)
Other versions
JPS6327425B2 (en
Inventor
ギユンテル・イエツシユ
ウオルフガンク・エルプカム
ヨアヒム・ゼンフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOMUBINAATO BEBU ROKOMOTEIFUBAUUEREKUTOROTEHINITSUSHIE UERUKE HANSU BAIMURERU
ROKOMOTEIFUBAUUEREKUTOROTEHINI
Original Assignee
KOMUBINAATO BEBU ROKOMOTEIFUBAUUEREKUTOROTEHINITSUSHIE UERUKE HANSU BAIMURERU
ROKOMOTEIFUBAUUEREKUTOROTEHINI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KOMUBINAATO BEBU ROKOMOTEIFUBAUUEREKUTOROTEHINITSUSHIE UERUKE HANSU BAIMURERU, ROKOMOTEIFUBAUUEREKUTOROTEHINI filed Critical KOMUBINAATO BEBU ROKOMOTEIFUBAUUEREKUTOROTEHINITSUSHIE UERUKE HANSU BAIMURERU
Publication of JPS58104179A publication Critical patent/JPS58104179A/en
Publication of JPS6327425B2 publication Critical patent/JPS6327425B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 蒸発物の再充填のための方法は、特に移動する帯状の金
−基質の積層のために継続的に作動する高率の蒸発装置
におけるアルミニウムの配意された再充填に使われる。
DETAILED DESCRIPTION OF THE INVENTION A method for recharging evaporates is particularly suitable for the coordinated recharging of aluminum in a continuously operating high-rate evaporator for a moving band-shaped gold-substrate stack. used for.

既知の蒸発装置は、アルミニウム紛ないし片がるつほに
導かれ、そこで鵬解されることで、蒸発が休止している
間にるつぼが蒸発物で再充填されるという原理に基いて
作動する。蒸発が行われている間の蒸発器るつほへのA
jのこの再充填は、上から直接蒸発させるべき物質の表
面へであろうと表面下のるつばを通してであろうと、蒸
発過程の妨害という結果になる。(ドイツ民主共和国特
許159981号明細書)。この欠陥は、p’lの中で
解放されたガスは一部真空での融解の際、又一部は蒸発
温度約1850にへのムtwr成物の加熱の際に遊離さ
れるということにより住じる。このガスは蒸発ステーシ
ョン全体での圧力上昇をもたらす。層の付着力の減少や
層表面の灰色化9がその結果である。それ以上の、望ま
し−くない現象は、融解されたばかりでまだ比較的冷た
いAjによって制約されて、蒸発器るつは内の蒸発物の
無指向性の流れによりこ て引き起こされる。そ(、から生じる不均等で時間的に
変化する蒸気放出面の温度配分は蒸発させるべき帯の横
方向と縦方向の層厚の変動をもたらす。
The known evaporator works on the principle that aluminum powder or pieces are introduced into a crucible and melted there, so that during the evaporation pause the crucible is refilled with evaporated material. . A to the evaporator while evaporation is taking place
This recharging of j results in a disturbance of the evaporation process, whether directly to the surface of the substance to be evaporated from above or through a crucible below the surface. (German Democratic Republic Patent No. 159981). This defect is due to the fact that the gas liberated in the p'l is partly liberated upon melting in vacuum and partly upon heating the mtwr product to an evaporation temperature of about 1850 °C. Live. This gas causes a pressure increase across the evaporation station. A reduction in the adhesion of the layer and a graying of the layer surface 9 are the consequences. A further, undesirable phenomenon is caused by the non-directional flow of evaporate within the evaporator crucible, constrained by the freshly melted and still relatively cold Aj. The uneven and time-varying temperature distribution of the vapor discharge surface resulting from the evaporation results in variations in the lateral and longitudinal layer thickness of the zone to be evaporated.

蒸発容器に液状の蒸発物が導管を通って供給され、これ
は真空外で炉の中で融解され、液状に保たれることも知
られている(ドイツ連邦共和国出願公開1193899
2号公報)。その際、蒸発物は蒸発器の表面下にもたら
される。
It is also known that the evaporation vessel is supplied with liquid evaporate through a conduit, which is melted in a furnace outside the vacuum and kept in liquid form (German Published Application No. 1193899).
Publication No. 2). The vapor is then brought below the surface of the evaporator.

この方法は、炉容器中で融解されたAjけ完全にはガス
抜きをされておらず、従ってこれは蒸発容器に達して融
解物から発生したガスによりすでに述べた障害が引き起
こされるという欠点をもつ。
This method has the disadvantage that the melted material in the furnace vessel is not completely degassed, so that it reaches the evaporation vessel and the gases evolved from the melt cause the disturbances already mentioned. .

本発明の目的は、蒸発物、特にAtを、前記欠点を除去
し、継続操作で作動する巾の広い(〉500119)帯
の蒸発を可能にするよう、蒸発器るつ?YK追加供給す
ることにある。
It is an object of the present invention to convert evaporates, in particular At, into an evaporator melt in such a way as to eliminate the above-mentioned drawbacks and to enable wide (>500119) band evaporation operating in continuous operation. YK will supply additional supplies.

A/蒸発器の追加供給のための方法とこの方法を実施す
るた硲の装置を造り出すという鯉題が*81゜ヮi1′
・・れ、3゜ヵよ、え7ケー7ヨンで#1んの僅かなガ
ス発生を惹起し、蒸発物表面の温度配分ははとんど変化
させず、又、ムtの配量された追加供給を可能にする。
A/The problem is to create a method for the additional supply of evaporators and an apparatus for carrying out this method.
... 3 degrees, 7 degrees, caused a slight gas generation of #1, the temperature distribution on the surface of the evaporated material did not change at all, and the amount of gas was not changed. additional supply is possible.

蒸発過程は追加供給によっても、又、発生した酸化物層
によっても影響を受けることはない。
The evaporation process is not influenced by additional feeds or by the oxide layer generated.

本発明に従ってとの昧題は、Atが蒸発ステーションの
外で真空中で別個のるつぼ内で電子ビームを用いて?#
液化され、約1000Kに加熱されるのみで、粋液状の
ムjはるつぼから蒸発ステーションの中にある蒸発器る
つは中にカスケード装置を経て導かれ、その際全処理は
真空で行われるということによって解決される。蒸発物
は経済的理由からなまこ銑として供給され、これは電子
ビームによってすっかり清かされ、るつぼに滴下する。
According to the present invention, the problem is that At can be produced using an electron beam in a separate crucible in vacuum outside the evaporation station? #
After being liquefied and only heated to about 1000 K, the pure liquid muj is led from the crucible through a cascade device into the evaporator crucible in the evaporation station, where the entire process is carried out in a vacuum. This is solved by For economical reasons, the evaporate is supplied as sea cucumber pig iron, which is thoroughly purified by an electron beam and dripped into the crucible.

溶融池は同様に電子ビームによって照射される。この溶
液化とるつは内1、)Ajの加熱及びカスケード装置へ
の流出物の配量のために特別に制御された電子ビームが
用いられる。制御は、融解と加熱に必値な性能に対応し
てなまこ銑やるつぼ上の電子ビームの滞留時間がplk
Jされるという方法で行われる。なまこ銑−やるつばの
間の電子ビームの交代は数10ミリ秒で行われる。しか
し、その長さが数秒の範囲にある周期では電子ビームは
るつぼ流出口に焦点を絞られる。このことはこのi!域
内のAjとムzoosの局部的過熱を招くので、眼界を
#食んの僅か上回っただけですでに酸化層を破って液状
のAtが突出することになる。その際僅かに流出したA
jの量は、カスケード装置の中のAjが適正な真空表面
比に基き完全(七ガス抜きが行われるように作用する。
The molten pool is likewise irradiated by an electron beam. During this solubilization process, a specially controlled electron beam is used for heating Aj and for metering the effluent to the cascade device. The control is based on the residence time of the electron beam on the sea cucumber iron crucible, corresponding to the performance required for melting and heating.
It is done by the method of being J. The electron beam changes between the sea cucumber pig iron and the Yarutsuba in several tens of milliseconds. However, for periods whose length is in the range of a few seconds, the electron beam is focused at the crucible outlet. This is this i! This causes local overheating of Aj and Muzoos in the area, so even if the eye circle is slightly exceeded by #eclipse, the oxidized layer will be broken and liquid At will protrude. At that time, a small amount of A leaked out.
The amount of j is such that Aj in the cascade device is completely degassed based on the proper vacuum surface ratio.

配量された1湯出し0の制御は電子ビームの制御によっ
て行われる。kisssの誘導沈澱部分は蒸発過程を妨
害しない。Ajの噴出や接続された蒸発ステーション内
の圧力上昇を防止するために、いわゆる「アルミニウム
の泡だち」によシアルミ融解の残りのガス化が続く、物
質供給のこの形態では融解の際まだ大量のA420aが
装置に装入される。この酸化物は溶融池の表面に堆積す
る。たった1000に′\の溶融池の加熱ではこの層は
破壊されない。それは、すでにこの温度で存在するムt
の蒸発が危臥のない値にまで低減されるという長所をも
つ。
Control of the dispensed amount of 1 hot water and 0 is performed by controlling the electron beam. The induced precipitation part of kisss does not interfere with the evaporation process. In this form of material supply, there is still a large amount of sialumium melted during melting, followed by the gasification of the remainder of the sialumium melt in a so-called "aluminum bubble" in order to prevent Aj blowouts and pressure build-up in the connected evaporation station. A420a is loaded into the device. This oxide is deposited on the surface of the weld pool. Heating the molten pool to only 1000 min does not destroy this layer. It already exists at this temperature
It has the advantage that the evaporation of water is reduced to a non-hazardous value.

この方法を実行するための装置iitは1個の^窒箪で
でさており、そこにはゲートを通してなまこ鋏状のAt
が導入される。予mmM室と呼ばれるこの真空室では揺
動可能のるつほか、融成分の物質が摘入するように配置
されている。るつほには流出口が取り付けられている。
The device iit for carrying out this method consists of a single nitrous trough, into which a sea cucumber-shaped At is inserted through a gate.
will be introduced. This vacuum chamber, called the premmM chamber, has a swingable melt and is arranged so that the molten substance can be extracted. An outflow port is attached to the rutsuho.

予備融解室Vこは、電子ビームが1製の蒸発物、溶融池
及び派出口を照射できるように一子砲が配置され°Cい
◇、流出口の下方、少し離れて導管装g!、(カスケー
ド)があり、これは、流出する蒸発物が任意に落下する
絵、短い区間を前進しなければならないようにしゃ断さ
れている。最後の導管は蒸発器るつばまで同じく距離が
あり、調釡可匪である。なぜなら蒸発器るつぼはその高
さをM!できるからである。カスケード装置全体におけ
る任意の格下のi!ili度はその都度夕くとも却0i
11ak′こ達する。予備融解室は蒸発ステーションと
^全方式で結曾されておシ&′スの娠、両方が真壁方式
で結合解除することが適切である。この−合、弁の領域
内にある導管が移動可能なように設計さlしる。
In the preliminary melting chamber V, a cannon is placed so that the electron beam can irradiate the evaporated material, the molten pool, and the outlet, and a conduit is installed at a distance below the outlet. , (cascade), which is cut off in such a way that the outflowing evaporates have to advance over a short distance, arbitrarily falling. The last conduit has the same distance to the evaporator crucible and is adjustable. Because the height of the evaporator crucible is M! Because you can. Any lower i! in the whole cascade device! Ili degree is 0i even if it's evening each time
It reaches 11ak'. It is suitable that the pre-melting chamber and the evaporation station are connected in a full-scale manner, and that both are uncoupled in a full-scale manner. In this case, the conduit in the region of the valve is designed to be movable.

さらに導1!j′iaを耐熱性で、真空で出すガスが僅
かで、又、 A/抵抗性物質、とくに理事炭化物(et
c)で製作することが適切である。
More guide 1! j'ia is heat resistant, releases little gas in vacuum, and is suitable for A/resistance materials, especially carbides (etc.
c) is appropriate.

予備融解室1の中にるつは2があり、子の中にp−1な
まこ鉛3が電子砲艦で作られる電子ビーム5により溶か
される。電子ビー、ム5iiAlす咬こ銑3、るつは2
及びるつは2の流臼口6を照射する。るつは2社傾倒可
紅である。るつI″:2の傾倒の際液状のムtは流出口
6を通って匂創した導管1に、そこから水平な管8を通
って同じく傾斜したN#導管へ流れ込み、そこ〃・ら次
に蒸発器るつぼ10へ達し、その蒸!A器るっほはイ・
来の蒸発ステーションにある。その乳ミ、カスケード式
の導管装置内の液状のAjは任意落下区間の一部Kl下
する。そうすることによりAjの1泡立ち”とそれによ
乏残余ガス抜きが行われる。
There is a melter 2 in the pre-melting chamber 1, in which p-1 sea cucumber lead 3 is melted by an electron beam 5 produced by an electron gunboat. Electronic beam, Mu5iiAl Sukko 3, Rusuha 2
The second one irradiates the flow mill opening 6. There are two companies that are in love with each other. During the tilting of the tube I":2, the liquid liquid flows through the outlet 6 into the insulated conduit 1, and from there through the horizontal tube 8 into the also inclined N# conduit, where it flows from there. Next, it reaches the evaporator crucible 10, and the steaming!
It is located at the next evaporation station. The milk, liquid Aj in the cascade type conduit device, drops part of the arbitrary falling section Kl. By doing so, one bubble of Aj and the resulting degassing of the remaining residual gas are carried out.

もしとの位値で弁″か・・、、真空区間での真空式の結
合解除のために内1′&されていると、導管フは移1可
能なように1社式れている。蒸発するっは10がその高
さをill!l動できるので、導管9はこれとしりかり
固定されてお夛、そのため導管9から蒸発器るつぼ10
への落下高度は一定である。
If the valve is in the same position as 1' for disconnection of the vacuum in the vacuum section, then the conduit valve is set so that it can be moved. Since the evaporator 10 can move ill!l its height, the conduit 9 is firmly fixed to this, so that the evaporator crucible 10 can be moved from the conduit 9 to the evaporator crucible 10.
The height of fall to is constant.

それによシ導管7と9の間の落下高度が不適蟲に大きく
表ることを避けるために導管8がその間に配置され、そ
れにより、補助的なカスケードが生じる。
In order to thereby avoid that the fall height between the conduits 7 and 9 is too pronounced for unsuitable insects, the conduit 8 is arranged between them, so that an auxiliary cascade occurs.

ムtの融解と加熱のための電子ビーム5は周期的に数秒
aFMjでるつ#X2の流出口6に焦点を絞って偏向さ
せられ、この領域のAjとムzoosの局部的加熱を招
く。
The electron beam 5 for melting and heating the mu t is periodically deflected for several seconds aFMj to focus on the outlet 6 of the melt #X2, resulting in local heating of Aj and mu zoos in this region.

【図面の簡単な説明】[Brief explanation of the drawing]

オ11は予備融解室の断面図、牙2−は予備融解室の蒸
発ステーションの平面図である。
11 is a sectional view of the pre-melting chamber, and 2- is a plan view of the evaporation station of the pre-melting chamber.

Claims (1)

【特許請求の範囲】 1)  At1r制嚢された電子ビームにより真空中で
触解し、るりは内で約1000 xに加熱し、6つほか
ら電子ビームによって配置し乍ら^空でのカスケードを
介して蒸発ステーションの蒸発器るつは中に導くことを
特徴とする、蒸発物を蒸発ステーション外でmsし、液
状で供給する、At蒸宛器の再充填のための方法。 2)予備融解室(1)が^空力式でS殆ステーション(
11)と1&軟されてお〕、予備#!lI暦室(1)中
にはゲートを通って導入されたAjなまこi& (3)
、流出口(6)を石する類例可能のるつは(2)、蒸発
物と浴−池と流出口(6)を照射aJ能な電子ビーム(
5〕をもつ電子砲(4)が配置され、流出口(6)のT
bで始まプ、k尭ステーシミン(11)のa兄岳るつぼ
(10)でin、少くともlカ所において格下区間によ
り中萌される4m()l)が配置されておシ、格下区間
と、専* (’/)とh出口(6)及び蒸発器るつは(
10)の間の短離はそれぞれ少くとも100@″5il
c達することを特徴とする特許請求の範囲l)に基く方
法を実施するための、蒸発ステーションと接続された予
備−解雇から成る装置。 3)  蒸発スf −シヨy (11)ト’?IN+l
l5M室(1)ノ間に弁がBe1lされてお〕、この領
域で導!()Jが移動可能である、特許請求の範H2)
に基〈装置。 4) 導管(マHa)が耐熱性で、真空中でほとんどガ
スを出さずアル建抵抗物質、とくに珪:ak化峻から成
る、特JPF!1lIj求の範82)K基く装置。
[Claims] 1) Catalyze in a vacuum with an At1r capsulated electron beam, heat Ruri to about 1000x inside, and place it with an electron beam from 6 units while cascading in the sky. A method for refilling an At evaporator, characterized in that the evaporated material is ms outside the evaporation station and supplied in liquid form, characterized in that the evaporator melt of the evaporation station is guided into the evaporation station via a evaporator melt. 2) The pre-melting chamber (1) is aerodynamic and has almost all stations (
11) and 1 & softened], spare #! Aj sea cucumber i & (3) introduced through the gate into lI calendar room (1)
, an analogous example (2) of irradiating the evaporated matter, the bath, and the outlet (6) is a powerful electron beam (
5] is arranged, and the T of the outlet (6) is arranged.
4m ()l) is arranged in the lower-grade section at least in l places, starting with b, in the a-nitake crucible (10) of k-suteshimin (11), and the lower-grade section is arranged, Special * ('/) and h outlet (6) and evaporator outlet (
10) are each at least 100@″5il
Device consisting of a pre-discharge connected to an evaporation station for carrying out the method according to claim 1), characterized in that c. 3) Evaporation gas f - y (11) t'? IN+l
A valve is installed between the 15M chamber (1) and conduction in this area! () J is movable, claim H2)
Based on <device. 4) The conduit (MaHa) is heat resistant, emits almost no gas in a vacuum, and is made of an alkali-based resistive material, especially silicon: A special JPF! 1lIj Search Range 82) K-based device.
JP18225482A 1981-10-19 1982-10-19 Method and apparatus for refilling al evaporator Granted JPS58104179A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD23417481A DD200897A1 (en) 1981-10-19 1981-10-19 METHOD AND DEVICE FOR SUBSTITUTING AL-EVAPORATORS
DD23C/234174 1981-10-19

Publications (2)

Publication Number Publication Date
JPS58104179A true JPS58104179A (en) 1983-06-21
JPS6327425B2 JPS6327425B2 (en) 1988-06-02

Family

ID=5534181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18225482A Granted JPS58104179A (en) 1981-10-19 1982-10-19 Method and apparatus for refilling al evaporator

Country Status (2)

Country Link
JP (1) JPS58104179A (en)
DD (1) DD200897A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013186969A (en) * 2012-03-06 2013-09-19 Ulvac Japan Ltd Method for forming electrode film of organic el element and apparatus for forming electrode film of organic el element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013186969A (en) * 2012-03-06 2013-09-19 Ulvac Japan Ltd Method for forming electrode film of organic el element and apparatus for forming electrode film of organic el element

Also Published As

Publication number Publication date
DD200897A1 (en) 1983-06-22
JPS6327425B2 (en) 1988-06-02

Similar Documents

Publication Publication Date Title
US2423729A (en) Vaporization of substances in a vacuum
US2333654A (en) Method of and apparatus for making steel
US3681042A (en) Coating of glass on a molten metal bath
EP0297405B1 (en) Vacuum refining of glass or the like with enhanced foaming
US2352709A (en) Apparatus for annealing articles
US2034348A (en) Nonspangled galvanized sheet
KR100287978B1 (en) MG evaporation method with increased evaporation rate
JPS58104179A (en) Method and apparatus for refilling al evaporator
JPS60191026A (en) Device and method for liquefying powdery material
US3177535A (en) Electron beam furnace with low beam source
KR100264945B1 (en) Continuous casting method and device for thin strip
US3345058A (en) Cooling means for tilting converter
US20020002951A1 (en) Heating installation for a reactor
KR20210005938A (en) Vapor deposition evaporator device
FI83760C (en) FOERFARANDE OCH ANORDNING FOER FRAMSTAELLNING AV GLAS ELLER LIKNANDE.
NO780606L (en) PROCEDURE FOR TREATING MELTED METAL
US3260235A (en) Apparatus for coating material with metal
US3930463A (en) Vapor deposition apparatus including a three-compartment evaporator
JPH06346230A (en) Method and apparatus for forming chemical vapor deposition structure by means of chemical vapor deposition method
US3485997A (en) Process and apparatus for the thermal vaporization of mixtures of substances in a vacuum
US2928150A (en) Temperature control during metal casting
FI73407B (en) ANORDNING SOM ANVAENDS FOER OMVANDLING AV SMAELT MATERIAL TILL MINERALFIBRER, SAOSOM TAPPHAOL, TRAOG OCH FIBERBILDANDE SPINNARE, SAMT FOERFARANDE FOER DERAS KYLNING.
US4118215A (en) Method and apparatus for heating glass in a forehearth
JPS59107755A (en) Heating method of molten steel in tundish
JPH06299336A (en) Crucible of evaporating source for vacuum deposition