JPS5796572A - Semiconductor memory storage - Google Patents
Semiconductor memory storageInfo
- Publication number
- JPS5796572A JPS5796572A JP17291480A JP17291480A JPS5796572A JP S5796572 A JPS5796572 A JP S5796572A JP 17291480 A JP17291480 A JP 17291480A JP 17291480 A JP17291480 A JP 17291480A JP S5796572 A JPS5796572 A JP S5796572A
- Authority
- JP
- Japan
- Prior art keywords
- erasing
- voltage
- gates
- data
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005055 memory storage Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000004020 conductor Substances 0.000 abstract 3
- 239000011159 matrix material Substances 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000007493 shaping process Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/14—Circuits for erasing electrically, e.g. erase voltage switching circuits
- G11C16/16—Circuits for erasing electrically, e.g. erase voltage switching circuits for erasing blocks, e.g. arrays, words, groups
Landscapes
- Read Only Memory (AREA)
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
Abstract
PURPOSE:To eliminate the need for the supply of erasing voltage from the outside by arranging a plurality of memory cells with control gates, erasing gates and floating gates in matrix shapes and forming a means, which boosts low voltage when erasing data, to an erasing line. CONSTITUTION:An N<+> type drain 19A and an N<+> type source 19C are shaped to a P type Si substrate 11, the memory cell is formed by successively shaping the first layer conductor layer 14 functioning as the erasing gate, the second layer conductor layer 15 serving as the floating gate and the third layer conductor layer 16 functioning as the control gate through gate insulating layers, and a plurality of the memory cells are arranged in matrix shapes, thus manufacturing a programmable ROM, which electrically erases data. The voltage boosting means 51 is formed to the erasing line connected to the erasing gates, and low voltage is boosted when erasing data, thus giving the erasing line data erasing voltage. Accordingly, erasing voltage need not be afforded from the outside, and the number of pins need not also be increased.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17291480A JPS5796572A (en) | 1980-12-08 | 1980-12-08 | Semiconductor memory storage |
DE8181305347T DE3171836D1 (en) | 1980-12-08 | 1981-11-11 | Semiconductor memory device |
EP81305347A EP0053878B1 (en) | 1980-12-08 | 1981-11-11 | Semiconductor memory device |
US06/320,935 US4466081A (en) | 1980-12-08 | 1981-11-13 | Semiconductor memory device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17291480A JPS5796572A (en) | 1980-12-08 | 1980-12-08 | Semiconductor memory storage |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5796572A true JPS5796572A (en) | 1982-06-15 |
JPS623992B2 JPS623992B2 (en) | 1987-01-28 |
Family
ID=15950680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17291480A Granted JPS5796572A (en) | 1980-12-08 | 1980-12-08 | Semiconductor memory storage |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5796572A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4868629A (en) * | 1984-05-15 | 1989-09-19 | Waferscale Integration, Inc. | Self-aligned split gate EPROM |
US5021847A (en) * | 1984-05-15 | 1991-06-04 | Waferscale Integration, Inc. | Split gate memory array having staggered floating gate rows and method for making same |
US7031197B2 (en) | 1990-09-14 | 2006-04-18 | Oki Electric Industry Co., Ltd. | EEPROM writing and reading method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513901A (en) * | 1978-07-17 | 1980-01-31 | Hitachi Ltd | Fixed memory of semiconductor |
-
1980
- 1980-12-08 JP JP17291480A patent/JPS5796572A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5513901A (en) * | 1978-07-17 | 1980-01-31 | Hitachi Ltd | Fixed memory of semiconductor |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4868629A (en) * | 1984-05-15 | 1989-09-19 | Waferscale Integration, Inc. | Self-aligned split gate EPROM |
US5021847A (en) * | 1984-05-15 | 1991-06-04 | Waferscale Integration, Inc. | Split gate memory array having staggered floating gate rows and method for making same |
US7031197B2 (en) | 1990-09-14 | 2006-04-18 | Oki Electric Industry Co., Ltd. | EEPROM writing and reading method |
Also Published As
Publication number | Publication date |
---|---|
JPS623992B2 (en) | 1987-01-28 |
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