JPS579488B2 - - Google Patents
Info
- Publication number
- JPS579488B2 JPS579488B2 JP12426676A JP12426676A JPS579488B2 JP S579488 B2 JPS579488 B2 JP S579488B2 JP 12426676 A JP12426676 A JP 12426676A JP 12426676 A JP12426676 A JP 12426676A JP S579488 B2 JPS579488 B2 JP S579488B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12426676A JPS5348676A (en) | 1976-10-15 | 1976-10-15 | Method of forming pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12426676A JPS5348676A (en) | 1976-10-15 | 1976-10-15 | Method of forming pattern |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56054108A Division JPS5914892B2 (ja) | 1981-04-09 | 1981-04-09 | パタ−ン形成方法 |
| JP56054109A Division JPS5914888B2 (ja) | 1981-04-09 | 1981-04-09 | パタ−ン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5348676A JPS5348676A (en) | 1978-05-02 |
| JPS579488B2 true JPS579488B2 (enExample) | 1982-02-22 |
Family
ID=14881072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12426676A Granted JPS5348676A (en) | 1976-10-15 | 1976-10-15 | Method of forming pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5348676A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56116625A (en) * | 1980-02-20 | 1981-09-12 | Sanyo Electric Co Ltd | Exposure of fine pattern |
| JPS56160039A (en) * | 1980-05-14 | 1981-12-09 | Canon Inc | Printing device |
| JPS58101427A (ja) * | 1981-12-11 | 1983-06-16 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
| JPS61111533A (ja) * | 1984-11-05 | 1986-05-29 | Mitsubishi Electric Corp | 感光性樹脂のパタ−ン形成方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2143737A1 (de) * | 1971-09-01 | 1973-03-08 | Ibm Deutschland | Photoaetzverfahren |
| JPS5218099B2 (enExample) * | 1973-06-07 | 1977-05-19 | ||
| JPS5111573A (en) * | 1974-07-19 | 1976-01-29 | Nippon Electric Co | Handotaisoshino seizohoho |
-
1976
- 1976-10-15 JP JP12426676A patent/JPS5348676A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5348676A (en) | 1978-05-02 |