JPS579488B2 - - Google Patents

Info

Publication number
JPS579488B2
JPS579488B2 JP12426676A JP12426676A JPS579488B2 JP S579488 B2 JPS579488 B2 JP S579488B2 JP 12426676 A JP12426676 A JP 12426676A JP 12426676 A JP12426676 A JP 12426676A JP S579488 B2 JPS579488 B2 JP S579488B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12426676A
Other languages
Japanese (ja)
Other versions
JPS5348676A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12426676A priority Critical patent/JPS5348676A/ja
Publication of JPS5348676A publication Critical patent/JPS5348676A/ja
Publication of JPS579488B2 publication Critical patent/JPS579488B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP12426676A 1976-10-15 1976-10-15 Method of forming pattern Granted JPS5348676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12426676A JPS5348676A (en) 1976-10-15 1976-10-15 Method of forming pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12426676A JPS5348676A (en) 1976-10-15 1976-10-15 Method of forming pattern

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP56054109A Division JPS5914888B2 (ja) 1981-04-09 1981-04-09 パタ−ン形成方法
JP56054108A Division JPS5914892B2 (ja) 1981-04-09 1981-04-09 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5348676A JPS5348676A (en) 1978-05-02
JPS579488B2 true JPS579488B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1982-02-22

Family

ID=14881072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12426676A Granted JPS5348676A (en) 1976-10-15 1976-10-15 Method of forming pattern

Country Status (1)

Country Link
JP (1) JPS5348676A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56116625A (en) * 1980-02-20 1981-09-12 Sanyo Electric Co Ltd Exposure of fine pattern
JPS56160039A (en) * 1980-05-14 1981-12-09 Canon Inc Printing device
JPS58101427A (ja) * 1981-12-11 1983-06-16 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS61111533A (ja) * 1984-11-05 1986-05-29 Mitsubishi Electric Corp 感光性樹脂のパタ−ン形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2143737A1 (de) * 1971-09-01 1973-03-08 Ibm Deutschland Photoaetzverfahren
JPS5218099B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-06-07 1977-05-19
JPS5111573A (en) * 1974-07-19 1976-01-29 Nippon Electric Co Handotaisoshino seizohoho

Also Published As

Publication number Publication date
JPS5348676A (en) 1978-05-02

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