JPS5789751A - Photosensitive material - Google Patents

Photosensitive material

Info

Publication number
JPS5789751A
JPS5789751A JP16561680A JP16561680A JPS5789751A JP S5789751 A JPS5789751 A JP S5789751A JP 16561680 A JP16561680 A JP 16561680A JP 16561680 A JP16561680 A JP 16561680A JP S5789751 A JPS5789751 A JP S5789751A
Authority
JP
Japan
Prior art keywords
monomer
glass transition
transition point
photosensitive material
pyrimidine group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16561680A
Other languages
Japanese (ja)
Inventor
Yoshiaki Inagi
Kiichi Takemoto
Yoshiyuki Harita
Yukihiro Hosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Nippon Synthetic Chemical Industry Co Ltd
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd, Japan Synthetic Rubber Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP16561680A priority Critical patent/JPS5789751A/en
Publication of JPS5789751A publication Critical patent/JPS5789751A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain a negative type resist which is cross-linked by far ultraviolet rays by using a copolymer contg. a monomer having a pyrimidine group. CONSTITUTION:A photosensitive material is obtd. by copolymerizing a monomer having a pyrimidine group represented by the general formula (where R is H, methyl, halogen or halomethyl) with a monomer regulating the glass transition point of the resulting polymer to <=100 deg.C. The glass transition point is restricted to form a thin film on a substrate of silicon, aluminum or the like without peeling off the film. The monomer of the formula is N-vinyluracil, N-vinylthymine, N-2-acryloyloxyethyluracil or the like, and the monomer to be copolymerized is 1,3-butadiene, ethyl methacrylate, methyl acrylate, diethyl maleate or the like.
JP16561680A 1980-11-25 1980-11-25 Photosensitive material Pending JPS5789751A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16561680A JPS5789751A (en) 1980-11-25 1980-11-25 Photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16561680A JPS5789751A (en) 1980-11-25 1980-11-25 Photosensitive material

Publications (1)

Publication Number Publication Date
JPS5789751A true JPS5789751A (en) 1982-06-04

Family

ID=15815743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16561680A Pending JPS5789751A (en) 1980-11-25 1980-11-25 Photosensitive material

Country Status (1)

Country Link
JP (1) JPS5789751A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60116132A (en) * 1983-11-29 1985-06-22 Fujitsu Ltd Forming method of negative type resist pattern
US5462976A (en) * 1992-02-05 1995-10-31 Seikagaku Kogyo Kabushiki Kaisha Photocurable glycosaminoglycan derivatives, crosslinked glycosaminoglycans and method of production thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60116132A (en) * 1983-11-29 1985-06-22 Fujitsu Ltd Forming method of negative type resist pattern
JPH0318179B2 (en) * 1983-11-29 1991-03-11 Fujitsu Ltd
US5462976A (en) * 1992-02-05 1995-10-31 Seikagaku Kogyo Kabushiki Kaisha Photocurable glycosaminoglycan derivatives, crosslinked glycosaminoglycans and method of production thereof
US5763504A (en) * 1992-02-05 1998-06-09 Seikagaku Kogyo Kabushiki Kaisha(Seikagaku Corporation) Photcurable glycosaminoglycan derivatives, crosslinked glycosaminoglycans and method of production thereof

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