JPS5780645A - Magnetic field type objective lens - Google Patents

Magnetic field type objective lens

Info

Publication number
JPS5780645A
JPS5780645A JP15631180A JP15631180A JPS5780645A JP S5780645 A JPS5780645 A JP S5780645A JP 15631180 A JP15631180 A JP 15631180A JP 15631180 A JP15631180 A JP 15631180A JP S5780645 A JPS5780645 A JP S5780645A
Authority
JP
Japan
Prior art keywords
magnetic piece
lower magnetic
magnetic field
objective lens
field type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15631180A
Other languages
English (en)
Inventor
Katsushige Tsuno
Yoshiyasu Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP15631180A priority Critical patent/JPS5780645A/ja
Publication of JPS5780645A publication Critical patent/JPS5780645A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP15631180A 1980-11-06 1980-11-06 Magnetic field type objective lens Pending JPS5780645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15631180A JPS5780645A (en) 1980-11-06 1980-11-06 Magnetic field type objective lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15631180A JPS5780645A (en) 1980-11-06 1980-11-06 Magnetic field type objective lens

Publications (1)

Publication Number Publication Date
JPS5780645A true JPS5780645A (en) 1982-05-20

Family

ID=15625020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15631180A Pending JPS5780645A (en) 1980-11-06 1980-11-06 Magnetic field type objective lens

Country Status (1)

Country Link
JP (1) JPS5780645A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4585942A (en) * 1983-03-17 1986-04-29 Jeol Ltd. Transmission electron microscope
JPS61294746A (ja) * 1985-06-24 1986-12-25 Hitachi Ltd 走査型電子顕微鏡
US4929838A (en) * 1988-02-16 1990-05-29 Fujitsu Limited Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221007U (ja) * 1975-08-01 1977-02-15

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221007U (ja) * 1975-08-01 1977-02-15

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4585942A (en) * 1983-03-17 1986-04-29 Jeol Ltd. Transmission electron microscope
JPS61294746A (ja) * 1985-06-24 1986-12-25 Hitachi Ltd 走査型電子顕微鏡
US4929838A (en) * 1988-02-16 1990-05-29 Fujitsu Limited Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage

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