JPS5779619A - Mask cleansing device - Google Patents

Mask cleansing device

Info

Publication number
JPS5779619A
JPS5779619A JP15520280A JP15520280A JPS5779619A JP S5779619 A JPS5779619 A JP S5779619A JP 15520280 A JP15520280 A JP 15520280A JP 15520280 A JP15520280 A JP 15520280A JP S5779619 A JPS5779619 A JP S5779619A
Authority
JP
Japan
Prior art keywords
mask
cleansing
water
cassette
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15520280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6157626B2 (enrdf_load_html_response
Inventor
Takeshi Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15520280A priority Critical patent/JPS5779619A/ja
Publication of JPS5779619A publication Critical patent/JPS5779619A/ja
Publication of JPS6157626B2 publication Critical patent/JPS6157626B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP15520280A 1980-11-06 1980-11-06 Mask cleansing device Granted JPS5779619A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15520280A JPS5779619A (en) 1980-11-06 1980-11-06 Mask cleansing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15520280A JPS5779619A (en) 1980-11-06 1980-11-06 Mask cleansing device

Publications (2)

Publication Number Publication Date
JPS5779619A true JPS5779619A (en) 1982-05-18
JPS6157626B2 JPS6157626B2 (enrdf_load_html_response) 1986-12-08

Family

ID=15600723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15520280A Granted JPS5779619A (en) 1980-11-06 1980-11-06 Mask cleansing device

Country Status (1)

Country Link
JP (1) JPS5779619A (enrdf_load_html_response)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59195653A (ja) * 1983-04-21 1984-11-06 Nec Corp フオトマスクの洗浄方法および洗浄装置
JPS60103349A (ja) * 1983-11-10 1985-06-07 Nippon Kogaku Kk <Nikon> 基板の洗浄装置
JPS6143430A (ja) * 1984-08-07 1986-03-03 Mitsubishi Electric Corp カセツト洗浄装置
US4694527A (en) * 1983-07-06 1987-09-22 Fujitsu Limited Mask washing apparatus for production of integrated circuit
US4715392A (en) * 1983-11-10 1987-12-29 Nippon Kogaku K. K. Automatic photomask or reticle washing and cleaning system
JPS63137429A (ja) * 1986-11-28 1988-06-09 Dainippon Screen Mfg Co Ltd 基板の両面洗浄装置
JPH01160013A (ja) * 1987-12-17 1989-06-22 Nec Kyushu Ltd 縮小投影型露光装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59195653A (ja) * 1983-04-21 1984-11-06 Nec Corp フオトマスクの洗浄方法および洗浄装置
US4694527A (en) * 1983-07-06 1987-09-22 Fujitsu Limited Mask washing apparatus for production of integrated circuit
EP0131449A3 (en) * 1983-07-06 1988-01-13 Fujitsu Limited Automatic mask washing apparatus
JPS60103349A (ja) * 1983-11-10 1985-06-07 Nippon Kogaku Kk <Nikon> 基板の洗浄装置
US4715392A (en) * 1983-11-10 1987-12-29 Nippon Kogaku K. K. Automatic photomask or reticle washing and cleaning system
JPS6143430A (ja) * 1984-08-07 1986-03-03 Mitsubishi Electric Corp カセツト洗浄装置
JPS63137429A (ja) * 1986-11-28 1988-06-09 Dainippon Screen Mfg Co Ltd 基板の両面洗浄装置
JPH01160013A (ja) * 1987-12-17 1989-06-22 Nec Kyushu Ltd 縮小投影型露光装置

Also Published As

Publication number Publication date
JPS6157626B2 (enrdf_load_html_response) 1986-12-08

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