JPS5775738U - - Google Patents
Info
- Publication number
- JPS5775738U JPS5775738U JP15326580U JP15326580U JPS5775738U JP S5775738 U JPS5775738 U JP S5775738U JP 15326580 U JP15326580 U JP 15326580U JP 15326580 U JP15326580 U JP 15326580U JP S5775738 U JPS5775738 U JP S5775738U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15326580U JPS5775738U (fr) | 1980-10-27 | 1980-10-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15326580U JPS5775738U (fr) | 1980-10-27 | 1980-10-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5775738U true JPS5775738U (fr) | 1982-05-11 |
Family
ID=29512525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15326580U Pending JPS5775738U (fr) | 1980-10-27 | 1980-10-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5775738U (fr) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009117845A (ja) * | 2007-11-08 | 2009-05-28 | Applied Materials Inc | 膜均一性のための回転温度制御基板ペデスタル |
| JP2009530806A (ja) * | 2006-03-14 | 2009-08-27 | エルジー イノテック カンパニー リミテッド | サセプタ及びこれを備える半導体製造装置 |
| US8889566B2 (en) | 2012-09-11 | 2014-11-18 | Applied Materials, Inc. | Low cost flowable dielectric films |
| KR101483210B1 (ko) * | 2013-09-17 | 2015-01-15 | 한국생산기술연구원 | 온도균일도가 향상된 서셉터 |
| US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
| US9144147B2 (en) | 2011-01-18 | 2015-09-22 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
| US9412581B2 (en) | 2014-07-16 | 2016-08-09 | Applied Materials, Inc. | Low-K dielectric gapfill by flowable deposition |
-
1980
- 1980-10-27 JP JP15326580U patent/JPS5775738U/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009530806A (ja) * | 2006-03-14 | 2009-08-27 | エルジー イノテック カンパニー リミテッド | サセプタ及びこれを備える半導体製造装置 |
| JP2009117845A (ja) * | 2007-11-08 | 2009-05-28 | Applied Materials Inc | 膜均一性のための回転温度制御基板ペデスタル |
| US9144147B2 (en) | 2011-01-18 | 2015-09-22 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
| US8889566B2 (en) | 2012-09-11 | 2014-11-18 | Applied Materials, Inc. | Low cost flowable dielectric films |
| US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
| KR101483210B1 (ko) * | 2013-09-17 | 2015-01-15 | 한국생산기술연구원 | 온도균일도가 향상된 서셉터 |
| US9412581B2 (en) | 2014-07-16 | 2016-08-09 | Applied Materials, Inc. | Low-K dielectric gapfill by flowable deposition |