JPS577425B2 - - Google Patents
Info
- Publication number
- JPS577425B2 JPS577425B2 JP9092378A JP9092378A JPS577425B2 JP S577425 B2 JPS577425 B2 JP S577425B2 JP 9092378 A JP9092378 A JP 9092378A JP 9092378 A JP9092378 A JP 9092378A JP S577425 B2 JPS577425 B2 JP S577425B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9092378A JPS5518615A (en) | 1978-07-27 | 1978-07-27 | Radiation sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9092378A JPS5518615A (en) | 1978-07-27 | 1978-07-27 | Radiation sensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5518615A JPS5518615A (en) | 1980-02-08 |
| JPS577425B2 true JPS577425B2 (ja) | 1982-02-10 |
Family
ID=14011939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9092378A Granted JPS5518615A (en) | 1978-07-27 | 1978-07-27 | Radiation sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5518615A (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5529849A (en) * | 1978-08-25 | 1980-03-03 | Toray Ind Inc | Forming method of fine pattern |
| JPS6090205A (ja) * | 1983-10-24 | 1985-05-21 | Shin Etsu Chem Co Ltd | 単分散ビニルシリル基含有有機高分子化合物の製造方法 |
| JPS6127537A (ja) * | 1984-07-18 | 1986-02-07 | Shin Etsu Chem Co Ltd | レジスト剤 |
| JP2648514B2 (ja) * | 1989-06-26 | 1997-09-03 | 住友重機械工業株式会社 | ２レンジ圧力制御用ロードセル |
-
1978
- 1978-07-27 JP JP9092378A patent/JPS5518615A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5518615A (en) | 1980-02-08 |