JPS5773936A - Cassette holder for electron beam exposure - Google Patents
Cassette holder for electron beam exposureInfo
- Publication number
- JPS5773936A JPS5773936A JP15030580A JP15030580A JPS5773936A JP S5773936 A JPS5773936 A JP S5773936A JP 15030580 A JP15030580 A JP 15030580A JP 15030580 A JP15030580 A JP 15030580A JP S5773936 A JPS5773936 A JP S5773936A
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- holder
- secured
- pushing
- furnished
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To enable a cassette to be accurately positioned, and be secured and held certainly and steadily, by settin the position by pushing the cassette horizontally on a table, and releasing the positioning mechanism at the same time as, or after the opertion of securing mechanism of pushing vertically. CONSTITUTION:Sides 3a and 3b of a Cassette 3 which holds and secures a sample 2 are attached to stoppers 4 and 5 installed on a table 1. The cassette is positioned by being pushed on the sides with a steel ball 8 by a spring 9. A holder 23 (also 33) of a holding mechanism 20 (a holding mechanism 30 is furnished on the left side) is lifted from the table 1 by a pin 24 as a fulcrum. After positioning, the cassette 3 is pushed and secured with steel balls 21 and 31 furnished with springs by pushing down the holder 23 (also 33). At this moment, an end point 40a of a pawl 40 fixed at the holder 23 pushes the steel vall 8 back, and positioning mechanism is released. By this method, cassettes can be positioned accurately with less friction, and steadily secured with less relative displacement to the side directions of the cassette table.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15030580A JPS5773936A (en) | 1980-10-27 | 1980-10-27 | Cassette holder for electron beam exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15030580A JPS5773936A (en) | 1980-10-27 | 1980-10-27 | Cassette holder for electron beam exposure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5773936A true JPS5773936A (en) | 1982-05-08 |
Family
ID=15494093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15030580A Pending JPS5773936A (en) | 1980-10-27 | 1980-10-27 | Cassette holder for electron beam exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5773936A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6054325U (en) * | 1983-09-21 | 1985-04-16 | 東芝機械株式会社 | Sample cassette for electron beam lithography equipment |
| US4711438A (en) * | 1986-05-08 | 1987-12-08 | Micrion Limited Partnership | Mask holding |
| US8436467B2 (en) | 2007-06-15 | 2013-05-07 | Rohm Co., Ltd. | Semiconductor device |
-
1980
- 1980-10-27 JP JP15030580A patent/JPS5773936A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6054325U (en) * | 1983-09-21 | 1985-04-16 | 東芝機械株式会社 | Sample cassette for electron beam lithography equipment |
| JPH0337229Y2 (en) * | 1983-09-21 | 1991-08-07 | ||
| US4711438A (en) * | 1986-05-08 | 1987-12-08 | Micrion Limited Partnership | Mask holding |
| US8436467B2 (en) | 2007-06-15 | 2013-05-07 | Rohm Co., Ltd. | Semiconductor device |
| US8922010B2 (en) | 2007-06-15 | 2014-12-30 | Rohm Co., Ltd. | Semiconductor device |
| US9053991B2 (en) | 2007-06-15 | 2015-06-09 | Rohm Co., Ltd. | Semiconductor device |
| US9123628B2 (en) | 2007-06-15 | 2015-09-01 | Rohm Co., Ltd. | Semiconductor device |
| US9466583B2 (en) | 2007-06-15 | 2016-10-11 | Rohm Co., Ltd. | Semiconductor device |
| US9685419B2 (en) | 2007-06-15 | 2017-06-20 | Rohm Co., Ltd. | Semiconductor device |
| US10032739B2 (en) | 2007-06-15 | 2018-07-24 | Rohm Co., Ltd. | Semiconductor device |
| US10510700B2 (en) | 2007-06-15 | 2019-12-17 | Rohm Co., Ltd. | Semiconductor device |
| US11037897B2 (en) | 2007-06-15 | 2021-06-15 | Rohm Co., Ltd. | Semiconductor device |
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