JPS5766636A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5766636A
JPS5766636A JP14330780A JP14330780A JPS5766636A JP S5766636 A JPS5766636 A JP S5766636A JP 14330780 A JP14330780 A JP 14330780A JP 14330780 A JP14330780 A JP 14330780A JP S5766636 A JPS5766636 A JP S5766636A
Authority
JP
Japan
Prior art keywords
pole piece
temperature
sample
improvement
thermal conductivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14330780A
Other languages
Japanese (ja)
Inventor
Makoto Yoshimi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14330780A priority Critical patent/JPS5766636A/en
Publication of JPS5766636A publication Critical patent/JPS5766636A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature

Abstract

PURPOSE:To contrive the improvement in drawing accuracy and the shortening of manufacturing time by a method wherein the region facing to the exposed surface side of a sample is formed by a member having high thermal conductivity and the member and a drawing room are kept at almost same temperature. CONSTITUTION:A pole piece 28 is formed by a member having high thermal conductivity such as gold, silver, copper, beryllium, aluminium or bronze. In this way, the degree of temperature rise at the pole piece 28 by the generation of heat from an electron optics mirror cylinder 20 is rapidly absorbed to constant-temperature water through the pole piece 28 and an increase in temperature of the sample 6 is prevented and the improvement of drawing accuracy will be achieved.
JP14330780A 1980-10-14 1980-10-14 Electron beam exposure device Pending JPS5766636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14330780A JPS5766636A (en) 1980-10-14 1980-10-14 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14330780A JPS5766636A (en) 1980-10-14 1980-10-14 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5766636A true JPS5766636A (en) 1982-04-22

Family

ID=15335711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14330780A Pending JPS5766636A (en) 1980-10-14 1980-10-14 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5766636A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1441381A2 (en) * 2003-01-24 2004-07-28 Leica Microsystems Lithography Ltd. Cooling of a device for influencing an electron beam
GB2585327A (en) * 2018-12-12 2021-01-13 Thermo Fisher Scient Bremen Gmbh Cooling plate for ICP-MS

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1441381A2 (en) * 2003-01-24 2004-07-28 Leica Microsystems Lithography Ltd. Cooling of a device for influencing an electron beam
EP1441381A3 (en) * 2003-01-24 2009-07-08 Leica Microsystems Lithography Ltd. Cooling of a device for influencing an electron beam
GB2585327A (en) * 2018-12-12 2021-01-13 Thermo Fisher Scient Bremen Gmbh Cooling plate for ICP-MS
US10998180B2 (en) 2018-12-12 2021-05-04 Thermo Fisher Scientific (Bremen) Gmbh Cooling plate for ICP-MS
GB2585327B (en) * 2018-12-12 2023-02-15 Thermo Fisher Scient Bremen Gmbh Cooling plate for ICP-MS

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