JPS5546758A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS5546758A
JPS5546758A JP12017578A JP12017578A JPS5546758A JP S5546758 A JPS5546758 A JP S5546758A JP 12017578 A JP12017578 A JP 12017578A JP 12017578 A JP12017578 A JP 12017578A JP S5546758 A JPS5546758 A JP S5546758A
Authority
JP
Japan
Prior art keywords
coefficient
ring
exposed
linear expansion
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12017578A
Other languages
Japanese (ja)
Inventor
Teruo Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP12017578A priority Critical patent/JPS5546758A/en
Publication of JPS5546758A publication Critical patent/JPS5546758A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain the mask which permits low-cost and highly accurate transfer by forming a supporting frame with the material of a coefficient of linear expansion higher than that of the object to be exposed and the material of a lower coefficient. CONSTITUTION:The supporting frame is formed by combining a ring 21 composed of a material of a coefficient of linear expansion higher than that of the object to be exposed and a ring 22 composed of a material of a smaller coefficient through press-fitting, shrink-fitting, etc. With this constitution, the ring 21 becomes smaller in diameter as compared to the case where it is not a combined ring and the ring 22 becomes larger, when temperature rises. As a result, the apparent coefficient of linear expansion as the combined ring approaches to the coefficient of linear expansion of the object to be exposed, thus the differences in thermal elongation and shrinkage between the mask for X-ray exposure and the object to be exposed are hardly produced.
JP12017578A 1978-09-28 1978-09-28 Mask for x-ray exposure Pending JPS5546758A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12017578A JPS5546758A (en) 1978-09-28 1978-09-28 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12017578A JPS5546758A (en) 1978-09-28 1978-09-28 Mask for x-ray exposure

Publications (1)

Publication Number Publication Date
JPS5546758A true JPS5546758A (en) 1980-04-02

Family

ID=14779770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12017578A Pending JPS5546758A (en) 1978-09-28 1978-09-28 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5546758A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0222737A2 (en) * 1985-11-13 1987-05-20 IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. Stabilization of mask membranes, and supporting frame
EP0223770A2 (en) * 1985-11-13 1987-05-27 IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. Means for avoiding plastic deformation of a maskfoil

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0222737A2 (en) * 1985-11-13 1987-05-20 IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. Stabilization of mask membranes, and supporting frame
EP0223770A2 (en) * 1985-11-13 1987-05-27 IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H. Means for avoiding plastic deformation of a maskfoil

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