JPS57644B2 - - Google Patents
Info
- Publication number
- JPS57644B2 JPS57644B2 JP10638978A JP10638978A JPS57644B2 JP S57644 B2 JPS57644 B2 JP S57644B2 JP 10638978 A JP10638978 A JP 10638978A JP 10638978 A JP10638978 A JP 10638978A JP S57644 B2 JPS57644 B2 JP S57644B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10638978A JPS5534424A (en) | 1978-08-31 | 1978-08-31 | Electron beam exposing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10638978A JPS5534424A (en) | 1978-08-31 | 1978-08-31 | Electron beam exposing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5534424A JPS5534424A (en) | 1980-03-11 |
JPS57644B2 true JPS57644B2 (enrdf_load_stackoverflow) | 1982-01-07 |
Family
ID=14432332
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10638978A Granted JPS5534424A (en) | 1978-08-31 | 1978-08-31 | Electron beam exposing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5534424A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6246353U (enrdf_load_stackoverflow) * | 1985-09-10 | 1987-03-20 | ||
JPH0283432A (ja) * | 1988-09-20 | 1990-03-23 | Mitsui Petrochem Ind Ltd | 引張試験機用のホルダー |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0793250B2 (ja) * | 1984-09-21 | 1995-10-09 | 株式会社東芝 | パタ−ン形成方法 |
-
1978
- 1978-08-31 JP JP10638978A patent/JPS5534424A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6246353U (enrdf_load_stackoverflow) * | 1985-09-10 | 1987-03-20 | ||
JPH0283432A (ja) * | 1988-09-20 | 1990-03-23 | Mitsui Petrochem Ind Ltd | 引張試験機用のホルダー |
Also Published As
Publication number | Publication date |
---|---|
JPS5534424A (en) | 1980-03-11 |