JPS576253B2 - - Google Patents

Info

Publication number
JPS576253B2
JPS576253B2 JP7258075A JP7258075A JPS576253B2 JP S576253 B2 JPS576253 B2 JP S576253B2 JP 7258075 A JP7258075 A JP 7258075A JP 7258075 A JP7258075 A JP 7258075A JP S576253 B2 JPS576253 B2 JP S576253B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7258075A
Other languages
Japanese (ja)
Other versions
JPS51148367A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP50072580A priority Critical patent/JPS51148367A/ja
Publication of JPS51148367A publication Critical patent/JPS51148367A/ja
Publication of JPS576253B2 publication Critical patent/JPS576253B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP50072580A 1975-06-14 1975-06-14 Layer construction radiant ray resist Granted JPS51148367A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50072580A JPS51148367A (en) 1975-06-14 1975-06-14 Layer construction radiant ray resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50072580A JPS51148367A (en) 1975-06-14 1975-06-14 Layer construction radiant ray resist

Publications (2)

Publication Number Publication Date
JPS51148367A JPS51148367A (en) 1976-12-20
JPS576253B2 true JPS576253B2 (enExample) 1982-02-04

Family

ID=13493449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50072580A Granted JPS51148367A (en) 1975-06-14 1975-06-14 Layer construction radiant ray resist

Country Status (1)

Country Link
JP (1) JPS51148367A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5921540B2 (ja) * 1977-10-26 1984-05-21 セイコーエプソン株式会社 フオトレジストパタ−ンの形成方法
JPS5820422B2 (ja) * 1977-11-04 1983-04-22 東京応化工業株式会社 超微細パタ−ンの形成方法
US4180604A (en) * 1977-12-30 1979-12-25 International Business Machines Corporation Two layer resist system
JPS59222928A (ja) * 1983-06-02 1984-12-14 Matsushita Electronics Corp マスク製作方法
JPH0287146A (ja) * 1988-09-26 1990-03-28 Hitachi Ltd 半導体装置の製造方法
JP4942432B2 (ja) * 2006-09-12 2012-05-30 株式会社フジシールインターナショナル ブリスター包装体

Also Published As

Publication number Publication date
JPS51148367A (en) 1976-12-20

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