JPS5751260B2 - - Google Patents

Info

Publication number
JPS5751260B2
JPS5751260B2 JP2476577A JP2476577A JPS5751260B2 JP S5751260 B2 JPS5751260 B2 JP S5751260B2 JP 2476577 A JP2476577 A JP 2476577A JP 2476577 A JP2476577 A JP 2476577A JP S5751260 B2 JPS5751260 B2 JP S5751260B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2476577A
Other languages
Japanese (ja)
Other versions
JPS53110367A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2476577A priority Critical patent/JPS53110367A/en
Priority to GB863378A priority patent/GB1570777A/en
Priority to CA298,247A priority patent/CA1105333A/en
Priority to FR7806618A priority patent/FR2383241A1/en
Priority to DE19782810316 priority patent/DE2810316C3/en
Priority to NL7802611A priority patent/NL7802611A/en
Publication of JPS53110367A publication Critical patent/JPS53110367A/en
Publication of JPS5751260B2 publication Critical patent/JPS5751260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143—Masks therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
JP2476577A 1977-03-09 1977-03-09 Multi-layer film evaporation method Granted JPS53110367A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2476577A JPS53110367A (en) 1977-03-09 1977-03-09 Multi-layer film evaporation method
GB863378A GB1570777A (en) 1977-03-09 1978-03-03 Multi-layer vacuum evaporation deposition method
CA298,247A CA1105333A (en) 1977-03-09 1978-03-06 Multi-layer vacuum evaporation deposition method
FR7806618A FR2383241A1 (en) 1977-03-09 1978-03-08 MULTI-LAYER DEPOSIT PROCESS BY VACUUM EVAPORATION
DE19782810316 DE2810316C3 (en) 1977-03-09 1978-03-09 Process for vapor deposition of a substrate with two superimposed layers
NL7802611A NL7802611A (en) 1977-03-09 1978-03-09 PROCEDURE FOR VAPORIZING AND DEPOSITING MULTIPLE LAYERS IN VACUUM.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2476577A JPS53110367A (en) 1977-03-09 1977-03-09 Multi-layer film evaporation method

Publications (2)

Publication Number Publication Date
JPS53110367A JPS53110367A (en) 1978-09-27
JPS5751260B2 true JPS5751260B2 (en) 1982-11-01

Family

ID=12147241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2476577A Granted JPS53110367A (en) 1977-03-09 1977-03-09 Multi-layer film evaporation method

Country Status (6)

Country Link
JP (1) JPS53110367A (en)
CA (1) CA1105333A (en)
DE (1) DE2810316C3 (en)
FR (1) FR2383241A1 (en)
GB (1) GB1570777A (en)
NL (1) NL7802611A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261315A (en) * 1985-09-11 1987-03-18 Sharp Corp Molecular beam epitaxy device
JPS63144597A (en) * 1986-12-09 1988-06-16 古河電気工業株式会社 Method of forming partial film and multilayer film on substrate continuously
US7229669B2 (en) 2003-11-13 2007-06-12 Honeywell International Inc. Thin-film deposition methods and apparatuses
CN102877026B (en) * 2012-09-27 2014-12-24 中国科学院长春光学精密机械与物理研究所 Vacuum depositing device for multilayer film devices
CN110331364B (en) * 2019-08-02 2021-05-07 深圳市华星光电半导体显示技术有限公司 Vapor plating metal mask plate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1521536A (en) * 1923-08-21 1924-12-30 Samuel A Holmes Crutch chair
US2676114A (en) * 1951-06-08 1954-04-20 Libbey Owens Ford Glass Co Method of producing graded coatings
US2875505A (en) * 1952-12-11 1959-03-03 Bell Telephone Labor Inc Semiconductor translating device
US2906637A (en) * 1953-05-19 1959-09-29 Electronique Soc Gen Method of forming a film a short distance from a surface
NL276676A (en) * 1961-04-13
GB1056678A (en) * 1963-08-01 1967-01-25 Hitachi Ltd Improvements relating to cryosars
DE1272680B (en) * 1963-09-16 1968-07-11 Halbleiterwerk Frankfurt Oder Device for vacuum vapor deposition of layers on a large number of documents covered with masks

Also Published As

Publication number Publication date
GB1570777A (en) 1980-07-09
NL7802611A (en) 1978-09-12
JPS53110367A (en) 1978-09-27
DE2810316B2 (en) 1980-08-14
CA1105333A (en) 1981-07-21
FR2383241B1 (en) 1980-04-18
DE2810316C3 (en) 1981-07-09
DE2810316A1 (en) 1978-09-14
FR2383241A1 (en) 1978-10-06

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