JPS5750611A - Optical range measurement - Google Patents
Optical range measurementInfo
- Publication number
- JPS5750611A JPS5750611A JP56107162A JP10716281A JPS5750611A JP S5750611 A JPS5750611 A JP S5750611A JP 56107162 A JP56107162 A JP 56107162A JP 10716281 A JP10716281 A JP 10716281A JP S5750611 A JPS5750611 A JP S5750611A
- Authority
- JP
- Japan
- Prior art keywords
- range measurement
- optical range
- optical
- measurement
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005259 measurement Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP80104529A EP0045321B1 (de) | 1980-07-31 | 1980-07-31 | Verfahren und Einrichtung zur optischen Distanzmessung |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5750611A true JPS5750611A (en) | 1982-03-25 |
JPS6239922B2 JPS6239922B2 (ja) | 1987-08-26 |
Family
ID=8186738
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56107162A Granted JPS5750611A (en) | 1980-07-31 | 1981-07-10 | Optical range measurement |
Country Status (4)
Country | Link |
---|---|
US (1) | US4577968A (ja) |
EP (1) | EP0045321B1 (ja) |
JP (1) | JPS5750611A (ja) |
DE (1) | DE3071858D1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012215584A (ja) * | 2012-07-09 | 2012-11-08 | National Institute For Materials Science | 走査照射装置のステージ位置合わせ方法 |
JP2019507368A (ja) * | 2015-12-23 | 2019-03-14 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジ方法、ターゲット、及び基板 |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0112399B1 (de) * | 1982-12-20 | 1987-03-11 | Ibm Deutschland Gmbh | Interferometrisches Messverfahren für Oberflächen |
US4703434A (en) * | 1984-04-24 | 1987-10-27 | The Perkin-Elmer Corporation | Apparatus for measuring overlay error |
DE3682675D1 (de) * | 1986-04-29 | 1992-01-09 | Ibm Deutschland | Interferometrische maskensubstratausrichtung. |
NL8601278A (nl) * | 1986-05-21 | 1987-12-16 | Philips Nv | Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. |
FR2615280B1 (fr) * | 1987-05-11 | 1996-07-19 | Canon Kk | Dispositif de mesure de la distance en mouvement relatif de deux objets mobiles l'un par rapport a l'autre |
FR2615281B1 (fr) * | 1987-05-11 | 1996-08-23 | Canon Kk | Dispositif de mesure d'une distance en mouvement relatif de deux objets mobiles l'un par rapport a l'autre |
EP0313681A1 (en) * | 1987-10-30 | 1989-05-03 | Ibm Deutschland Gmbh | Phase-sensitive interferometric mask-wafer alignment |
DE69133626D1 (de) * | 1990-03-27 | 2010-03-11 | Canon Kk | Messverfahren und -vorrichtung |
US5545039A (en) * | 1990-04-10 | 1996-08-13 | Mushabac; David R. | Method and apparatus for preparing tooth or modifying dental restoration |
US5343391A (en) * | 1990-04-10 | 1994-08-30 | Mushabac David R | Device for obtaining three dimensional contour data and for operating on a patient and related method |
US5257184A (en) * | 1990-04-10 | 1993-10-26 | Mushabac David R | Method and apparatus with multiple data input stylii for collecting curvilinear contour data |
US5562448A (en) * | 1990-04-10 | 1996-10-08 | Mushabac; David R. | Method for facilitating dental diagnosis and treatment |
US5569578A (en) * | 1990-04-10 | 1996-10-29 | Mushabac; David R. | Method and apparatus for effecting change in shape of pre-existing object |
US5224049A (en) * | 1990-04-10 | 1993-06-29 | Mushabac David R | Method, system and mold assembly for use in preparing a dental prosthesis |
US5347454A (en) * | 1990-04-10 | 1994-09-13 | Mushabac David R | Method, system and mold assembly for use in preparing a dental restoration |
US5133599A (en) * | 1991-01-02 | 1992-07-28 | Zygo Corporation | High accuracy linear displacement interferometer with probe |
CA2078732A1 (en) * | 1991-09-27 | 1993-03-28 | Koichi Sentoku | Displacement measuring device and displacement measuring method |
JPH06137830A (ja) * | 1992-10-23 | 1994-05-20 | Canon Inc | 干渉計測方法及び干渉計測装置 |
JP2746178B2 (ja) * | 1995-02-15 | 1998-04-28 | 双葉電子工業株式会社 | 測定装置の内挿回路 |
US6407815B2 (en) | 1998-07-02 | 2002-06-18 | Sony Precision Technology Inc. | Optical displacement measurement system |
US6020966A (en) * | 1998-09-23 | 2000-02-01 | International Business Machines Corporation | Enhanced optical detection of minimum features using depolarization |
EP1026550B1 (en) * | 1999-02-04 | 2005-06-08 | ASML Netherlands B.V. | Lithographic projection apparatus |
US6469793B1 (en) * | 1999-08-10 | 2002-10-22 | Svg Lithography Systems, Inc. | Multi-channel grating interference alignment sensor |
DE10025461A1 (de) * | 2000-05-23 | 2001-12-06 | Mahr Gmbh | Messeinrichtung nach dem Interferenzprinzip |
US20050010310A1 (en) * | 2003-07-11 | 2005-01-13 | Touzov Igor Victorovich | Method of alignment for precision tools. |
EP1817550A2 (en) * | 2004-11-22 | 2007-08-15 | Koninklijke Philips Electronics N.V. | Detection system for detecting translations of a body |
US7636165B2 (en) * | 2006-03-21 | 2009-12-22 | Asml Netherlands B.V. | Displacement measurement systems lithographic apparatus and device manufacturing method |
FR2933494B1 (fr) * | 2008-07-01 | 2010-09-03 | Commissariat Energie Atomique | Dispositif de caracterisation optique d'un objet de tres petites dimensions |
DE102010063253A1 (de) * | 2010-12-16 | 2012-06-21 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
KR102392704B1 (ko) * | 2015-12-23 | 2022-04-29 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 측정 수행 방법 |
US11815347B2 (en) | 2016-09-28 | 2023-11-14 | Kla-Tencor Corporation | Optical near-field metrology |
WO2019192865A1 (en) | 2018-04-06 | 2019-10-10 | Asml Netherlands B.V. | Inspection apparatus having non-linear optics |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2003492A1 (de) * | 1970-01-27 | 1971-08-12 | Leitz Ernst Gmbh | Messverfahren fuer Schrittgeber zum Messen von Laengen oder Winkeln sowie Anordnungen zur Durchfuehrung dieses Messverfahrens |
US3849003A (en) * | 1970-03-25 | 1974-11-19 | Philips Corp | Interferometer apparatus for measuring the roughness of a surface |
DE2240968A1 (de) * | 1972-08-21 | 1974-03-07 | Leitz Ernst Gmbh | Optisches verfahren zur messung der relativen verschiebung eines beugungsgitters sowie einrichtungen zu seiner durchfuehrung |
FR2235354A1 (en) * | 1973-06-29 | 1975-01-24 | Thomson Csf | Photoelectric optical test sensor - measures displacement of a diffraction screen with constant spacing in the test sensor plane |
DE2627609A1 (de) * | 1976-06-19 | 1977-12-29 | Ibm Deutschland | Interferometrisches verfahren |
US4172664A (en) * | 1977-12-30 | 1979-10-30 | International Business Machines Corporation | High precision pattern registration and overlay measurement system and process |
DE2851750B1 (de) * | 1978-11-30 | 1980-03-06 | Ibm Deutschland | Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche |
DD139902A1 (de) * | 1978-12-19 | 1980-01-23 | Hermann Beyer | Doppelbrechendes bauelement fuer polarisierende interferenzapparate |
-
1980
- 1980-07-31 DE DE8080104529T patent/DE3071858D1/de not_active Expired
- 1980-07-31 EP EP80104529A patent/EP0045321B1/de not_active Expired
-
1981
- 1981-07-10 JP JP56107162A patent/JPS5750611A/ja active Granted
-
1985
- 1985-01-24 US US06/694,576 patent/US4577968A/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012215584A (ja) * | 2012-07-09 | 2012-11-08 | National Institute For Materials Science | 走査照射装置のステージ位置合わせ方法 |
JP2019507368A (ja) * | 2015-12-23 | 2019-03-14 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジ方法、ターゲット、及び基板 |
US10379445B2 (en) | 2015-12-23 | 2019-08-13 | Asml Netherlands B.V. | Metrology method, target and substrate |
Also Published As
Publication number | Publication date |
---|---|
EP0045321A2 (de) | 1982-02-10 |
EP0045321A3 (en) | 1984-09-05 |
DE3071858D1 (en) | 1987-01-22 |
EP0045321B1 (de) | 1986-12-10 |
US4577968A (en) | 1986-03-25 |
JPS6239922B2 (ja) | 1987-08-26 |
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