JPS5740648B2 - - Google Patents
Info
- Publication number
- JPS5740648B2 JPS5740648B2 JP4103075A JP4103075A JPS5740648B2 JP S5740648 B2 JPS5740648 B2 JP S5740648B2 JP 4103075 A JP4103075 A JP 4103075A JP 4103075 A JP4103075 A JP 4103075A JP S5740648 B2 JPS5740648 B2 JP S5740648B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4103075A JPS51115770A (en) | 1975-04-03 | 1975-04-03 | Annealing method after ion injection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4103075A JPS51115770A (en) | 1975-04-03 | 1975-04-03 | Annealing method after ion injection |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51115770A JPS51115770A (en) | 1976-10-12 |
JPS5740648B2 true JPS5740648B2 (ja) | 1982-08-28 |
Family
ID=12596989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4103075A Granted JPS51115770A (en) | 1975-04-03 | 1975-04-03 | Annealing method after ion injection |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51115770A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0218304Y2 (ja) * | 1988-08-01 | 1990-05-22 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5556637A (en) * | 1978-10-20 | 1980-04-25 | Matsushita Electric Ind Co Ltd | Preparation of semiconductor device |
JPS5873112A (ja) * | 1981-10-28 | 1983-05-02 | Nippon Hoso Kyokai <Nhk> | レ−ザアニ−ル方法 |
JPH0697664B2 (ja) * | 1984-05-11 | 1994-11-30 | 住友電気工業株式会社 | 化合物半導体のアニ−ル法 |
JPS6211225A (ja) * | 1986-07-18 | 1987-01-20 | Sony Corp | 3−v族化合物半導体の熱処理法 |
JP2582741B2 (ja) * | 1991-11-07 | 1997-02-19 | 株式会社日本製鋼所 | エピタキシャル薄膜の形成方法 |
-
1975
- 1975-04-03 JP JP4103075A patent/JPS51115770A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0218304Y2 (ja) * | 1988-08-01 | 1990-05-22 |
Also Published As
Publication number | Publication date |
---|---|
JPS51115770A (en) | 1976-10-12 |