JPS5734555A - Formation of mask - Google Patents

Formation of mask

Info

Publication number
JPS5734555A
JPS5734555A JP10826980A JP10826980A JPS5734555A JP S5734555 A JPS5734555 A JP S5734555A JP 10826980 A JP10826980 A JP 10826980A JP 10826980 A JP10826980 A JP 10826980A JP S5734555 A JPS5734555 A JP S5734555A
Authority
JP
Japan
Prior art keywords
original
mask
film
lens
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10826980A
Other languages
English (en)
Inventor
Hidemi Ushio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Priority to JP10826980A priority Critical patent/JPS5734555A/ja
Publication of JPS5734555A publication Critical patent/JPS5734555A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP10826980A 1980-08-08 1980-08-08 Formation of mask Pending JPS5734555A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10826980A JPS5734555A (en) 1980-08-08 1980-08-08 Formation of mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10826980A JPS5734555A (en) 1980-08-08 1980-08-08 Formation of mask

Publications (1)

Publication Number Publication Date
JPS5734555A true JPS5734555A (en) 1982-02-24

Family

ID=14480361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10826980A Pending JPS5734555A (en) 1980-08-08 1980-08-08 Formation of mask

Country Status (1)

Country Link
JP (1) JPS5734555A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4933712A (en) * 1987-09-22 1990-06-12 Toppan Printing Co., Ltd. System for making covering masks for use in photoengraving
JPH0552680A (ja) * 1991-08-29 1993-03-02 Kubota Corp 磁歪式トルクセンサの検査装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4933712A (en) * 1987-09-22 1990-06-12 Toppan Printing Co., Ltd. System for making covering masks for use in photoengraving
JPH0552680A (ja) * 1991-08-29 1993-03-02 Kubota Corp 磁歪式トルクセンサの検査装置

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