JPS573214B2 - - Google Patents

Info

Publication number
JPS573214B2
JPS573214B2 JP10282676A JP10282676A JPS573214B2 JP S573214 B2 JPS573214 B2 JP S573214B2 JP 10282676 A JP10282676 A JP 10282676A JP 10282676 A JP10282676 A JP 10282676A JP S573214 B2 JPS573214 B2 JP S573214B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10282676A
Other languages
Japanese (ja)
Other versions
JPS5328378A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10282676A priority Critical patent/JPS5328378A/ja
Publication of JPS5328378A publication Critical patent/JPS5328378A/ja
Priority to US05/924,066 priority patent/US4233109A/en
Priority to US06/166,700 priority patent/US4371412A/en
Publication of JPS573214B2 publication Critical patent/JPS573214B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP10282676A 1976-01-16 1976-08-27 Method of plasma etching Granted JPS5328378A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10282676A JPS5328378A (en) 1976-08-27 1976-08-27 Method of plasma etching
US05/924,066 US4233109A (en) 1976-01-16 1978-07-12 Dry etching method
US06/166,700 US4371412A (en) 1976-01-16 1980-07-03 Dry etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10282676A JPS5328378A (en) 1976-08-27 1976-08-27 Method of plasma etching

Publications (2)

Publication Number Publication Date
JPS5328378A JPS5328378A (en) 1978-03-16
JPS573214B2 true JPS573214B2 (cg-RX-API-DMAC7.html) 1982-01-20

Family

ID=14337815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10282676A Granted JPS5328378A (en) 1976-01-16 1976-08-27 Method of plasma etching

Country Status (1)

Country Link
JP (1) JPS5328378A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55111134A (en) * 1979-02-19 1980-08-27 Mitsubishi Electric Corp Method of gas plasma etching
JPS611023A (ja) * 1984-06-13 1986-01-07 Teru Saamuko Kk バツチプラズマ装置
JPS6147642A (ja) * 1984-08-14 1986-03-08 Teru Saamuko Kk プラズマ発生装置
JPS62279626A (ja) * 1986-05-27 1987-12-04 M Setetsuku Kk 半導体用基板に対する不純物のド−ピング方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48103433A (cg-RX-API-DMAC7.html) * 1972-04-17 1973-12-25
JPS51102825A (ja) * 1975-11-13 1976-09-10 Kubota Ltd Torakutatonozenrinkudosochi

Also Published As

Publication number Publication date
JPS5328378A (en) 1978-03-16

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