JPS5728947B2 - - Google Patents
Info
- Publication number
- JPS5728947B2 JPS5728947B2 JP4193173A JP4193173A JPS5728947B2 JP S5728947 B2 JPS5728947 B2 JP S5728947B2 JP 4193173 A JP4193173 A JP 4193173A JP 4193173 A JP4193173 A JP 4193173A JP S5728947 B2 JPS5728947 B2 JP S5728947B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Surface Treatment Of Glass (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4193173A JPS5728947B2 (en) | 1973-04-13 | 1973-04-13 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4193173A JPS5728947B2 (en) | 1973-04-13 | 1973-04-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS49130688A JPS49130688A (en) | 1974-12-14 |
JPS5728947B2 true JPS5728947B2 (en) | 1982-06-19 |
Family
ID=12621968
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4193173A Expired JPS5728947B2 (en) | 1973-04-13 | 1973-04-13 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5728947B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60137024A (en) * | 1983-12-26 | 1985-07-20 | Matsushita Electronics Corp | Etching method of silicon nitride film |
US6453914B2 (en) | 1999-06-29 | 2002-09-24 | Micron Technology, Inc. | Acid blend for removing etch residue |
-
1973
- 1973-04-13 JP JP4193173A patent/JPS5728947B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS49130688A (en) | 1974-12-14 |