JPS57207571A - Wafer holding mechanism of resist coating device - Google Patents
Wafer holding mechanism of resist coating deviceInfo
- Publication number
- JPS57207571A JPS57207571A JP9232781A JP9232781A JPS57207571A JP S57207571 A JPS57207571 A JP S57207571A JP 9232781 A JP9232781 A JP 9232781A JP 9232781 A JP9232781 A JP 9232781A JP S57207571 A JPS57207571 A JP S57207571A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- holding
- claws
- turning
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To enable sure holding of a wafer so as to withstand quick acceleration by making the center of the wafer coincide with the rotating axis by a holding claw and holding the wafer to restrict turning of the wafer due to rotation.
CONSTITUTION: A wafer releasing device A is operated to turn holding claws 14a, 14b. After inserting a wafer 1 to a specified position, operation of the device A is stopped and the wafer 1 is held by three claws 14a, 14b, 14b by force of a tension spring 16. As the holding claw 14a is in contact with the orientation flat surface of the wafer 1, the center of the wafer 1 coincides easily with the rotation axis BC. When a rotation axis 11 is turned under this condition, holding claws 14a, 14b are subjected to turning force in the direction of arrows due to centrifugal force as they are pivotted to fulcrum pins below the center of gravity M allowing free turning. Thus, the claws hold the wafer 1 firmly, and turning of holding claws 14a, 14b is restricted by a stopper 17.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9232781A JPS57207571A (en) | 1981-06-17 | 1981-06-17 | Wafer holding mechanism of resist coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9232781A JPS57207571A (en) | 1981-06-17 | 1981-06-17 | Wafer holding mechanism of resist coating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57207571A true JPS57207571A (en) | 1982-12-20 |
Family
ID=14051282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9232781A Pending JPS57207571A (en) | 1981-06-17 | 1981-06-17 | Wafer holding mechanism of resist coating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57207571A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6057132U (en) * | 1983-09-28 | 1985-04-20 | 株式会社日立製作所 | Wafer gripping device |
JPS60141130U (en) * | 1984-02-28 | 1985-09-18 | テル相模株式会社 | plasma CVD |
US4788994A (en) * | 1986-08-13 | 1988-12-06 | Dainippon Screen Mfg. Co. | Wafer holding mechanism |
JPH02189949A (en) * | 1989-01-18 | 1990-07-25 | Tokyo Electron Ltd | Transfer equipment |
US8967935B2 (en) | 2011-07-06 | 2015-03-03 | Tel Nexx, Inc. | Substrate loader and unloader |
US9421617B2 (en) | 2011-06-22 | 2016-08-23 | Tel Nexx, Inc. | Substrate holder |
-
1981
- 1981-06-17 JP JP9232781A patent/JPS57207571A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6057132U (en) * | 1983-09-28 | 1985-04-20 | 株式会社日立製作所 | Wafer gripping device |
JPS60141130U (en) * | 1984-02-28 | 1985-09-18 | テル相模株式会社 | plasma CVD |
US4788994A (en) * | 1986-08-13 | 1988-12-06 | Dainippon Screen Mfg. Co. | Wafer holding mechanism |
JPH02189949A (en) * | 1989-01-18 | 1990-07-25 | Tokyo Electron Ltd | Transfer equipment |
US9421617B2 (en) | 2011-06-22 | 2016-08-23 | Tel Nexx, Inc. | Substrate holder |
US8967935B2 (en) | 2011-07-06 | 2015-03-03 | Tel Nexx, Inc. | Substrate loader and unloader |
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