JPS57201230A - Photosensitive composition and formation of pattern using said composition - Google Patents

Photosensitive composition and formation of pattern using said composition

Info

Publication number
JPS57201230A
JPS57201230A JP8571981A JP8571981A JPS57201230A JP S57201230 A JPS57201230 A JP S57201230A JP 8571981 A JP8571981 A JP 8571981A JP 8571981 A JP8571981 A JP 8571981A JP S57201230 A JPS57201230 A JP S57201230A
Authority
JP
Japan
Prior art keywords
salt
composition
diazonium
pattern
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8571981A
Other languages
Japanese (ja)
Other versions
JPH0319535B2 (en
Inventor
Gen Morishita
Takahiro Kobashi
Nobuaki Hayashi
Motoo Akagi
Saburo Nonogaki
Masaichi Uchino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8571981A priority Critical patent/JPS57201230A/en
Priority to KR1019810002279A priority patent/KR850001415B1/en
Priority to US06/279,849 priority patent/US4377630A/en
Priority to EP81303053A priority patent/EP0043716B1/en
Priority to DE8181303053T priority patent/DE3169809D1/en
Priority to US06/427,586 priority patent/US4409313A/en
Publication of JPS57201230A publication Critical patent/JPS57201230A/en
Publication of JPH0319535B2 publication Critical patent/JPH0319535B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Abstract

PURPOSE:To obtain a photosensitive compsn. of high sensitivity by adding a salt of specific aniline deriv. to an arom. diazonium salt which produces tack when exposed. CONSTITUTION:The salt (e.g.; 3-methoxy-2,6-dimethyl-N,N-dimethyl aniline hydrochloride.zinc chloride double salt) expressed by the formula[R1, R2 are straight chain alkyl groups; X, Y, Z are hydrogen, straight chain alkyl groups, alkoxy groups (where at least one is alkoxy and >=2 are not hydrogen)]is used. More specifically, (A) the arom. diazonium salt[e.g.; 4-(dimethylamino) benzene diazonium chloride.zinc chloride double salt]which produces tack when exposed is added with (B) about 300-1wt% salts of the compd. expressed by the formula, whereby the photosensitive compsn. is obtained.
JP8571981A 1980-07-04 1981-06-05 Photosensitive composition and formation of pattern using said composition Granted JPS57201230A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP8571981A JPS57201230A (en) 1981-06-05 1981-06-05 Photosensitive composition and formation of pattern using said composition
KR1019810002279A KR850001415B1 (en) 1980-07-04 1981-06-23 Photosensitive composition
US06/279,849 US4377630A (en) 1980-07-04 1981-07-02 Photosensitive composition
EP81303053A EP0043716B1 (en) 1980-07-04 1981-07-03 Photosensitive composition and pattern forming process using same
DE8181303053T DE3169809D1 (en) 1980-07-04 1981-07-03 Photosensitive composition and pattern forming process using same
US06/427,586 US4409313A (en) 1980-07-04 1982-09-29 Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8571981A JPS57201230A (en) 1981-06-05 1981-06-05 Photosensitive composition and formation of pattern using said composition

Publications (2)

Publication Number Publication Date
JPS57201230A true JPS57201230A (en) 1982-12-09
JPH0319535B2 JPH0319535B2 (en) 1991-03-15

Family

ID=13866640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8571981A Granted JPS57201230A (en) 1980-07-04 1981-06-05 Photosensitive composition and formation of pattern using said composition

Country Status (1)

Country Link
JP (1) JPS57201230A (en)

Also Published As

Publication number Publication date
JPH0319535B2 (en) 1991-03-15

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