JPS57200561A - Magnetron spattering apparatus - Google Patents
Magnetron spattering apparatusInfo
- Publication number
- JPS57200561A JPS57200561A JP8445081A JP8445081A JPS57200561A JP S57200561 A JPS57200561 A JP S57200561A JP 8445081 A JP8445081 A JP 8445081A JP 8445081 A JP8445081 A JP 8445081A JP S57200561 A JPS57200561 A JP S57200561A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- magnets
- target
- cooling water
- corrosion resistant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
Abstract
PURPOSE:To prevent the effect of a magnetron from being reduced due to corrosion of magnets, by coating the surfaces of magnets of a target which will become in contact with cooling water with a corrosion resistant metal or resin film. CONSTITUTION:The surfaces of cooling water channels 3 of the magents 1 of the target 2 are coated with a corrosion resistant metal of resin film. As a metal used will be suitably mentioned Ti, Cr, Au, Rh, Pt, Pb, etc., and as a resin used will be suitably mentioned a phenol resin, urea resin, melamine resin, epoxy resin, vinyl chloride resin, fulorine plastic, urethane resin, etc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8445081A JPS57200561A (en) | 1981-06-03 | 1981-06-03 | Magnetron spattering apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8445081A JPS57200561A (en) | 1981-06-03 | 1981-06-03 | Magnetron spattering apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57200561A true JPS57200561A (en) | 1982-12-08 |
Family
ID=13830946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8445081A Pending JPS57200561A (en) | 1981-06-03 | 1981-06-03 | Magnetron spattering apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57200561A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007088511A (en) * | 2006-12-20 | 2007-04-05 | Neomax Co Ltd | Manufacturing method of magnetic circuit |
CN109778127A (en) * | 2017-11-13 | 2019-05-21 | 佳能特机株式会社 | Sputtering equipment |
-
1981
- 1981-06-03 JP JP8445081A patent/JPS57200561A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007088511A (en) * | 2006-12-20 | 2007-04-05 | Neomax Co Ltd | Manufacturing method of magnetic circuit |
CN109778127A (en) * | 2017-11-13 | 2019-05-21 | 佳能特机株式会社 | Sputtering equipment |
CN109778127B (en) * | 2017-11-13 | 2022-10-21 | 佳能特机株式会社 | Sputtering device |
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