JPS57200011A - Reflection type imaging optical device - Google Patents

Reflection type imaging optical device

Info

Publication number
JPS57200011A
JPS57200011A JP56084342A JP8434281A JPS57200011A JP S57200011 A JPS57200011 A JP S57200011A JP 56084342 A JP56084342 A JP 56084342A JP 8434281 A JP8434281 A JP 8434281A JP S57200011 A JPS57200011 A JP S57200011A
Authority
JP
Japan
Prior art keywords
light source
surface reflecting
axis
spot
quadratic curved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56084342A
Other languages
Japanese (ja)
Inventor
Masataka Shiba
Yoshisada Oshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56084342A priority Critical patent/JPS57200011A/en
Priority to US06/384,679 priority patent/US4458302A/en
Priority to DE8282104828T priority patent/DE3268933D1/en
Priority to EP82104828A priority patent/EP0066295B1/en
Publication of JPS57200011A publication Critical patent/JPS57200011A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To image a spot light source while utilizing the energy of a lamp most effectively by using at least two quadratic curved-surface reflecting mirrors, which are rotationally symmetric with respect to the straight line connecting a spot light source position and a spot-light-source imaging position, in combination, and thus obtaining the imaged spot light source. CONSTITUTION:At least two quadratic curved-surface reflecting mirrors which are rotationally symmetric with regard to the straight line connecting a spot light source position 5 and a spot-light-source imaging position 6 as an axis 7 of rotational symmetry are used in combination to form an image of a spot light source at a different position. Then, while the positions 5 and 6 are regarded as conjugate points, those quadratic curved-surface reflecting mirrors are a quadratic curved-surface reflecting mirror which is sectionally shaped in part of an ellipse having focuses at one conjugate point and a point off the axis 7 of rotational symmetry in a plane containing the axis of rotational symmetry, and a quadratic curved-surface reflecting mirror which is sectionally shaped in part of an ellipse having focuses at the other conjugate point and a point off the axis of rotational symmetry.
JP56084342A 1981-06-03 1981-06-03 Reflection type imaging optical device Pending JPS57200011A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP56084342A JPS57200011A (en) 1981-06-03 1981-06-03 Reflection type imaging optical device
US06/384,679 US4458302A (en) 1981-06-03 1982-06-02 Reflection type optical focusing apparatus
DE8282104828T DE3268933D1 (en) 1981-06-03 1982-06-02 Reflection type optical focusing apparatus
EP82104828A EP0066295B1 (en) 1981-06-03 1982-06-02 Reflection type optical focusing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56084342A JPS57200011A (en) 1981-06-03 1981-06-03 Reflection type imaging optical device

Publications (1)

Publication Number Publication Date
JPS57200011A true JPS57200011A (en) 1982-12-08

Family

ID=13827828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56084342A Pending JPS57200011A (en) 1981-06-03 1981-06-03 Reflection type imaging optical device

Country Status (1)

Country Link
JP (1) JPS57200011A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6376429A (en) * 1986-09-19 1988-04-06 Nikon Corp Optical equipment for illumination
US6068080A (en) * 1998-04-13 2000-05-30 Lacarrubba; Emanuel Apparatus for the redistribution of acoustic energy
JP2003528348A (en) * 2000-03-22 2003-09-24 コジェント・ライト・テクノロジーズ・インコーポレイテッド Coupling light from small light sources for projection systems using parabolic reflectors

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6376429A (en) * 1986-09-19 1988-04-06 Nikon Corp Optical equipment for illumination
US6068080A (en) * 1998-04-13 2000-05-30 Lacarrubba; Emanuel Apparatus for the redistribution of acoustic energy
JP2003528348A (en) * 2000-03-22 2003-09-24 コジェント・ライト・テクノロジーズ・インコーポレイテッド Coupling light from small light sources for projection systems using parabolic reflectors
JP4808893B2 (en) * 2000-03-22 2011-11-02 ウェイヴィーン・インコーポレイテッド Image projection apparatus and light collection system

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