JPS57199220A - Positioning device - Google Patents
Positioning deviceInfo
- Publication number
- JPS57199220A JPS57199220A JP57038256A JP3825682A JPS57199220A JP S57199220 A JPS57199220 A JP S57199220A JP 57038256 A JP57038256 A JP 57038256A JP 3825682 A JP3825682 A JP 3825682A JP S57199220 A JPS57199220 A JP S57199220A
- Authority
- JP
- Japan
- Prior art keywords
- positioning device
- positioning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
- G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Projection-Type Copiers In General (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19813121666 DE3121666A1 (de) | 1981-05-30 | 1981-05-30 | Verfahren und einrichtung zur gegenseitigen ausrichtung von objekten bei roentgenstrahl- und korpuskularstrahl-belichtungsvorgaengen |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57199220A true JPS57199220A (en) | 1982-12-07 |
JPS6349894B2 JPS6349894B2 (ja) | 1988-10-06 |
Family
ID=6133636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57038256A Granted JPS57199220A (en) | 1981-05-30 | 1982-03-12 | Positioning device |
Country Status (4)
Country | Link |
---|---|
US (1) | US4513203A (ja) |
EP (1) | EP0069823B1 (ja) |
JP (1) | JPS57199220A (ja) |
DE (2) | DE3121666A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4786864A (en) * | 1985-03-29 | 1988-11-22 | International Business Machines Corporation | Photon assisted tunneling testing of passivated integrated circuits |
DE3706862C2 (de) * | 1987-03-04 | 1996-05-15 | Schleicher Co Feinwerktech | Abstreifvorrichtung für Aktenvernichter oder dgl. |
US4835078A (en) * | 1987-07-06 | 1989-05-30 | American Telephone And Telegraph Company | Method for aligning photomasks |
DE3806271A1 (de) * | 1988-02-27 | 1989-09-07 | Basf Ag | Thermoplastische formmassen auf der basis von polyamiden und ethylencopolymerisaten |
US5276725A (en) * | 1988-05-10 | 1994-01-04 | Canon Kabushiki Kaisha | Exposure system |
JPH0390595U (ja) * | 1989-12-28 | 1991-09-13 | ||
EP0669636A1 (en) * | 1994-02-25 | 1995-08-30 | AT&T Corp. | Manufacturing system error detection |
EP0732624B1 (en) * | 1995-03-17 | 2001-10-10 | Ebara Corporation | Fabrication method with energy beam |
JP4746753B2 (ja) * | 2001-03-05 | 2011-08-10 | ルネサスエレクトロニクス株式会社 | 荷電粒子線露光用マスクの形成方法および荷電粒子線用マスクを形成するためのパターンデータの処理プログラム |
US6639219B2 (en) * | 2001-11-09 | 2003-10-28 | International Business Machines Corporation | Electron scatter in a thin membrane to eliminate detector saturation |
EP1335249A1 (en) * | 2002-02-06 | 2003-08-13 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TW594445B (en) * | 2002-02-06 | 2004-06-21 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
JP3960544B2 (ja) * | 2002-10-11 | 2007-08-15 | パイオニア株式会社 | ビーム調整用試料、ビーム調整方法及びビーム調整装置 |
TWI419197B (zh) * | 2010-04-26 | 2013-12-11 | Max Echo Technologies Corp | Production method and process adjustment method of laminated wafer |
DE102016106119B4 (de) * | 2016-04-04 | 2019-03-07 | mi2-factory GmbH | Energiefilterelement für Ionenimplantationsanlagen für den Einsatz in der Produktion von Wafern |
US10488749B2 (en) * | 2017-03-28 | 2019-11-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photomask and method of forming the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5619088U (ja) * | 1979-07-20 | 1981-02-19 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3326176A (en) * | 1964-10-27 | 1967-06-20 | Nat Res Corp | Work-registration device including ionic beam probe |
US3326170A (en) * | 1966-01-26 | 1967-06-20 | Lewmar Marine Ltd | Main sheet or like sliders |
US3745358A (en) * | 1971-05-10 | 1973-07-10 | Radiant Energy Systems | Alignment method and apparatus for electron projection systems |
FR2146106B1 (ja) * | 1971-07-16 | 1977-08-05 | Thomson Csf | |
US4085329A (en) * | 1976-05-03 | 1978-04-18 | Hughes Aircraft Company | Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment |
DE2702444C3 (de) * | 1977-01-20 | 1980-10-09 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Korpuskularstrahloptisches Gerät zur Abbildung einer Maske auf ein Präparat |
DE2722958A1 (de) * | 1977-05-20 | 1978-11-23 | Siemens Ag | Verfahren zur justierung einer halbleiterscheibe relativ zu einer bestrahlungsmaske bei der roentgenstrahl-fotolithografie |
DE2739502C3 (de) * | 1977-09-02 | 1980-07-03 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zur Belichtung durch Korpuskularstrahlen-Schattenwurf und Vorrichtung zur Durchführung des Verfahrens |
US4151420A (en) * | 1977-12-08 | 1979-04-24 | International Business Machines Corporation | Apparatus for the formation of epitaxial layers doped with conductivity-determining impurities by ion deposition |
US4158141A (en) * | 1978-06-21 | 1979-06-12 | Hughes Aircraft Company | Process for channeling ion beams |
DE2837590A1 (de) * | 1978-08-29 | 1980-03-13 | Ibm Deutschland | Verfahren zur schattenwurfbelichtung |
DE2939044A1 (de) * | 1979-09-27 | 1981-04-09 | Ibm Deutschland Gmbh, 7000 Stuttgart | Einrichtung fuer elektronenstrahllithographie |
CA1139198A (en) * | 1979-10-02 | 1983-01-11 | Andrew C. Knight | Comminution apparatus |
US4327292A (en) * | 1980-05-13 | 1982-04-27 | Hughes Aircraft Company | Alignment process using serial detection of repetitively patterned alignment marks |
EP0043863B1 (de) * | 1980-07-10 | 1984-05-16 | International Business Machines Corporation | Verfahren zur Kompensation des Proximity Effekts bei Elektronenstrahl-Projektionsanlagen |
FR2607692B1 (fr) * | 1986-12-05 | 1989-03-31 | Charvin Guy | Dispositifs autonomes pour chauffer des recipients alimentaires |
DE4002137A1 (de) * | 1990-01-25 | 1991-08-01 | Vdo Schindling | Fuer ein kraftfahrzeug bestimmte, pneumatisch arbeitende zentralverriegelungsanlage |
-
1981
- 1981-05-30 DE DE19813121666 patent/DE3121666A1/de not_active Withdrawn
-
1982
- 1982-03-12 JP JP57038256A patent/JPS57199220A/ja active Granted
- 1982-03-18 DE DE8282102220T patent/DE3264623D1/de not_active Expired
- 1982-03-18 EP EP82102220A patent/EP0069823B1/de not_active Expired
-
1984
- 1984-06-29 US US06/625,586 patent/US4513203A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5619088U (ja) * | 1979-07-20 | 1981-02-19 |
Also Published As
Publication number | Publication date |
---|---|
EP0069823B1 (de) | 1985-07-10 |
US4513203A (en) | 1985-04-23 |
DE3121666A1 (de) | 1982-12-16 |
JPS6349894B2 (ja) | 1988-10-06 |
EP0069823A1 (de) | 1983-01-19 |
DE3264623D1 (en) | 1985-08-14 |
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