JPS5719569B2 - - Google Patents
Info
- Publication number
- JPS5719569B2 JPS5719569B2 JP15008179A JP15008179A JPS5719569B2 JP S5719569 B2 JPS5719569 B2 JP S5719569B2 JP 15008179 A JP15008179 A JP 15008179A JP 15008179 A JP15008179 A JP 15008179A JP S5719569 B2 JPS5719569 B2 JP S5719569B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15008179A JPS5673438A (en) | 1979-11-21 | 1979-11-21 | Dryetching monitoring method for nitriding silicon |
DE19803043517 DE3043517A1 (de) | 1979-11-21 | 1980-11-18 | Verfahren zur ueberwachung eines siliciumnitrid-trockenaetzverfahrens |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15008179A JPS5673438A (en) | 1979-11-21 | 1979-11-21 | Dryetching monitoring method for nitriding silicon |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5673438A JPS5673438A (en) | 1981-06-18 |
JPS5719569B2 true JPS5719569B2 (enrdf_load_stackoverflow) | 1982-04-23 |
Family
ID=15489091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15008179A Granted JPS5673438A (en) | 1979-11-21 | 1979-11-21 | Dryetching monitoring method for nitriding silicon |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5673438A (enrdf_load_stackoverflow) |
DE (1) | DE3043517A1 (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8004005A (nl) * | 1980-07-11 | 1982-02-01 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting. |
JPS5826013A (ja) * | 1981-08-03 | 1983-02-16 | Oki Electric Ind Co Ltd | 窒化シリコン膜のエツチング方法 |
TW201632866A (zh) * | 2015-03-04 | 2016-09-16 | 馗鼎奈米科技股份有限公司 | 電漿放電輝光之光學監控方法 |
CN114660909B (zh) * | 2022-03-25 | 2025-08-26 | 无锡邑文微电子科技股份有限公司 | 光刻胶去除方法和去胶机 |
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1979
- 1979-11-21 JP JP15008179A patent/JPS5673438A/ja active Granted
-
1980
- 1980-11-18 DE DE19803043517 patent/DE3043517A1/de active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5673438A (en) | 1981-06-18 |
DE3043517A1 (de) | 1981-06-11 |
DE3043517C2 (enrdf_load_stackoverflow) | 1987-06-25 |