JPS57188824A - Transfer device for mask pattern - Google Patents

Transfer device for mask pattern

Info

Publication number
JPS57188824A
JPS57188824A JP56073523A JP7352381A JPS57188824A JP S57188824 A JPS57188824 A JP S57188824A JP 56073523 A JP56073523 A JP 56073523A JP 7352381 A JP7352381 A JP 7352381A JP S57188824 A JPS57188824 A JP S57188824A
Authority
JP
Japan
Prior art keywords
image
space filter
wafer
beams
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56073523A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0226777B2 (enrdf_load_stackoverflow
Inventor
Hideki Tomioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56073523A priority Critical patent/JPS57188824A/ja
Publication of JPS57188824A publication Critical patent/JPS57188824A/ja
Publication of JPH0226777B2 publication Critical patent/JPH0226777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56073523A 1981-05-18 1981-05-18 Transfer device for mask pattern Granted JPS57188824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56073523A JPS57188824A (en) 1981-05-18 1981-05-18 Transfer device for mask pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56073523A JPS57188824A (en) 1981-05-18 1981-05-18 Transfer device for mask pattern

Publications (2)

Publication Number Publication Date
JPS57188824A true JPS57188824A (en) 1982-11-19
JPH0226777B2 JPH0226777B2 (enrdf_load_stackoverflow) 1990-06-12

Family

ID=13520677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56073523A Granted JPS57188824A (en) 1981-05-18 1981-05-18 Transfer device for mask pattern

Country Status (1)

Country Link
JP (1) JPS57188824A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006191119A (ja) * 2005-01-06 2006-07-20 Asml Holding Nv マルチｓｌｍマスクレスリソグラフィにおける散乱光を最小化する方法および装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006191119A (ja) * 2005-01-06 2006-07-20 Asml Holding Nv マルチｓｌｍマスクレスリソグラフィにおける散乱光を最小化する方法および装置
US7567368B2 (en) 2005-01-06 2009-07-28 Asml Holding N.V. Systems and methods for minimizing scattered light in multi-SLM maskless lithography
US7859735B2 (en) 2005-01-06 2010-12-28 Asml Holding N.V. Systems and methods for minimizing scattered light in multi-SLM maskless lithography

Also Published As

Publication number Publication date
JPH0226777B2 (enrdf_load_stackoverflow) 1990-06-12

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