JPS57174458A - Construction of vessel for evaporating source - Google Patents

Construction of vessel for evaporating source

Info

Publication number
JPS57174458A
JPS57174458A JP5969281A JP5969281A JPS57174458A JP S57174458 A JPS57174458 A JP S57174458A JP 5969281 A JP5969281 A JP 5969281A JP 5969281 A JP5969281 A JP 5969281A JP S57174458 A JPS57174458 A JP S57174458A
Authority
JP
Japan
Prior art keywords
steel strip
plating
length
made equal
width
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5969281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6215632B2 (cs
Inventor
Yoshikiyo Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP5969281A priority Critical patent/JPS57174458A/ja
Publication of JPS57174458A publication Critical patent/JPS57174458A/ja
Publication of JPS6215632B2 publication Critical patent/JPS6215632B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP5969281A 1981-04-22 1981-04-22 Construction of vessel for evaporating source Granted JPS57174458A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5969281A JPS57174458A (en) 1981-04-22 1981-04-22 Construction of vessel for evaporating source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5969281A JPS57174458A (en) 1981-04-22 1981-04-22 Construction of vessel for evaporating source

Publications (2)

Publication Number Publication Date
JPS57174458A true JPS57174458A (en) 1982-10-27
JPS6215632B2 JPS6215632B2 (cs) 1987-04-08

Family

ID=13120513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5969281A Granted JPS57174458A (en) 1981-04-22 1981-04-22 Construction of vessel for evaporating source

Country Status (1)

Country Link
JP (1) JPS57174458A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021379A (ja) * 1983-07-18 1985-02-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置
JPS6389651A (ja) * 1986-10-03 1988-04-20 Mitsubishi Heavy Ind Ltd 真空蒸着装置
JPS63135963U (cs) * 1987-02-23 1988-09-07

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021379A (ja) * 1983-07-18 1985-02-02 Mitsubishi Heavy Ind Ltd 真空蒸着装置
JPS6389651A (ja) * 1986-10-03 1988-04-20 Mitsubishi Heavy Ind Ltd 真空蒸着装置
JPS63135963U (cs) * 1987-02-23 1988-09-07

Also Published As

Publication number Publication date
JPS6215632B2 (cs) 1987-04-08

Similar Documents

Publication Publication Date Title
FR2525242B1 (fr) Procede pour le depot electrolytique d'un alliage fe-zn
LU80788A1 (fr) Procede de depot electrolytique d'une feuille de cuivre
GB2143255B (en) Magnetron cathode for cathodic evaporation installations
SE8400989L (sv) Forfarande for skydd av valsade sektioner av galvaniserat stal genom elektrolytiskt pletering i flera skikt
FR2544337B1 (fr) Procede et installation pour le revetement en continu d'une bande a l'aide d'un revetement oxydable
JPS57174458A (en) Construction of vessel for evaporating source
ES431527A1 (es) Un recipiente de reactor nuclear refrigerado con metal li- quido.
US4655168A (en) Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow
DE3472503D1 (en) Solid electrolyte cell with an iodine-doped metal complex as cathodic material
DE68917588T2 (de) Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium.
GB2080340B (en) Molten zinc bath for hot dip galvanizing steel sheet
SE7611456L (sv) Metod for enkelsidig galvanisering av metallplat
JPS57120667A (en) Lamination coating material
JPS5550489A (en) Continuous production of tin plated strip material
JPS54125138A (en) Plating thickness controller in one-side plating
JPS57158379A (en) Structure of evaporating source for continuous vacuum deposition
JPS55122899A (en) Degreasing method by high speed contactless electrolysis
GB1324478A (en) Lead zinc wet-flux galvanizing process
LV11907B (lv) Iekārta alumīnija, cinka vai to kausējumu aizsargpārklājuma uznešanai uz sloksnes materiāla
JPS54157744A (en) Vacuum galvanization using zinc dross
JPS5743984A (en) Sputtering apparatus
JPH0735566B2 (ja) 連続式真空蒸着装置
GB1553109A (en) Gas knife process for controlling hot-dip aluminium coatings
Foct et al. The role of nickel on the galvanizing reaction
Amano Low energy ion beam deposition of metallic thin films