JPS57174446A - Manufacture of thin nitride film - Google Patents

Manufacture of thin nitride film

Info

Publication number
JPS57174446A
JPS57174446A JP56060431A JP6043181A JPS57174446A JP S57174446 A JPS57174446 A JP S57174446A JP 56060431 A JP56060431 A JP 56060431A JP 6043181 A JP6043181 A JP 6043181A JP S57174446 A JPS57174446 A JP S57174446A
Authority
JP
Japan
Prior art keywords
nitrogen
substrate
liq
laser beams
pulsed laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56060431A
Other languages
Japanese (ja)
Inventor
Takayuki Nakamura
Makoto Hikita
Shugo Kubo
Masaru Igarashi
Akira Terada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56060431A priority Critical patent/JPS57174446A/en
Publication of JPS57174446A publication Critical patent/JPS57174446A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/40—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using liquids, e.g. salt baths, liquid suspensions
    • C23C8/42—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using liquids, e.g. salt baths, liquid suspensions only one element being applied
    • C23C8/48—Nitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/40—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using liquids, e.g. salt baths, liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/40—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using liquids, e.g. salt baths, liquid suspensions
    • C23C8/42—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using liquids, e.g. salt baths, liquid suspensions only one element being applied
    • C23C8/48—Nitriding
    • C23C8/50—Nitriding of ferrous surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE:To form a thin nitride film having a phase stable at high temp. on the surface of a substrate by immersing the substrate in a nitrogen medium and irradiating pulsed laser beams to the substrate surface through the medium to react the surface with nitrogen. CONSTITUTION:A substrate 4 to be nitrided is mounted on a table 5 in a liq. nitrogen container 2, and pulsed laser beams are irradiated to the substrate 4 surface from a laser beam generator 1 through liq. nitrogen 3. The pulsed laser beams are selected so that they pass through the nitrogen 3, and for example, the wavelengths are regulated to about 0.4-11mum. By irradiating laser beams for a short time, the temp. of the substrate 4 surface rises at a very high rising rate, the surface is melted and reacts with liq. nitrogen 3 contacting with the surface, and nitride is formed from the surface toward the interior. The reacted part cools by self-diffusion of heat and is kept at low temp. by the surrounding liq. nitrogen 3, and the cooling is accelerated to rapidly cool the reacted part.
JP56060431A 1981-04-20 1981-04-20 Manufacture of thin nitride film Pending JPS57174446A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56060431A JPS57174446A (en) 1981-04-20 1981-04-20 Manufacture of thin nitride film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56060431A JPS57174446A (en) 1981-04-20 1981-04-20 Manufacture of thin nitride film

Publications (1)

Publication Number Publication Date
JPS57174446A true JPS57174446A (en) 1982-10-27

Family

ID=13142041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56060431A Pending JPS57174446A (en) 1981-04-20 1981-04-20 Manufacture of thin nitride film

Country Status (1)

Country Link
JP (1) JPS57174446A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61261465A (en) * 1985-05-16 1986-11-19 Natl Res Inst For Metals Manufacture of compound superconductor
JPS62142757A (en) * 1985-12-17 1987-06-26 Seiko Instr & Electronics Ltd Decorative article
JPS63245975A (en) * 1987-04-01 1988-10-13 Semiconductor Energy Lab Co Ltd Superconductor device
EP1329533A1 (en) * 2002-01-22 2003-07-23 Federal-Mogul Nürnberg GmbH Lasernitriding of aluminium-based composites

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61261465A (en) * 1985-05-16 1986-11-19 Natl Res Inst For Metals Manufacture of compound superconductor
JPH0453048B2 (en) * 1985-05-16 1992-08-25 Kagaku Gijutsucho Kinzoku Zairyo Gijutsu Kenkyu Shocho
JPS62142757A (en) * 1985-12-17 1987-06-26 Seiko Instr & Electronics Ltd Decorative article
JPS63245975A (en) * 1987-04-01 1988-10-13 Semiconductor Energy Lab Co Ltd Superconductor device
EP1329533A1 (en) * 2002-01-22 2003-07-23 Federal-Mogul Nürnberg GmbH Lasernitriding of aluminium-based composites

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