JPS57173935A - Manufacture of thin amorphous silicon film - Google Patents

Manufacture of thin amorphous silicon film

Info

Publication number
JPS57173935A
JPS57173935A JP56060211A JP6021181A JPS57173935A JP S57173935 A JPS57173935 A JP S57173935A JP 56060211 A JP56060211 A JP 56060211A JP 6021181 A JP6021181 A JP 6021181A JP S57173935 A JPS57173935 A JP S57173935A
Authority
JP
Japan
Prior art keywords
substrate
manufacture
electret
nozzle
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56060211A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0232782B2 (cg-RX-API-DMAC10.html
Inventor
Kouichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56060211A priority Critical patent/JPS57173935A/ja
Publication of JPS57173935A publication Critical patent/JPS57173935A/ja
Publication of JPH0232782B2 publication Critical patent/JPH0232782B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H10P14/22—
    • H10P14/2905—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Photovoltaic Devices (AREA)
  • Silicon Compounds (AREA)
JP56060211A 1981-04-20 1981-04-20 Manufacture of thin amorphous silicon film Granted JPS57173935A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56060211A JPS57173935A (en) 1981-04-20 1981-04-20 Manufacture of thin amorphous silicon film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56060211A JPS57173935A (en) 1981-04-20 1981-04-20 Manufacture of thin amorphous silicon film

Publications (2)

Publication Number Publication Date
JPS57173935A true JPS57173935A (en) 1982-10-26
JPH0232782B2 JPH0232782B2 (cg-RX-API-DMAC10.html) 1990-07-23

Family

ID=13135585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56060211A Granted JPS57173935A (en) 1981-04-20 1981-04-20 Manufacture of thin amorphous silicon film

Country Status (1)

Country Link
JP (1) JPS57173935A (cg-RX-API-DMAC10.html)

Also Published As

Publication number Publication date
JPH0232782B2 (cg-RX-API-DMAC10.html) 1990-07-23

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