JPS57165831A - Projection printing device - Google Patents
Projection printing deviceInfo
- Publication number
- JPS57165831A JPS57165831A JP56052211A JP5221181A JPS57165831A JP S57165831 A JPS57165831 A JP S57165831A JP 56052211 A JP56052211 A JP 56052211A JP 5221181 A JP5221181 A JP 5221181A JP S57165831 A JPS57165831 A JP S57165831A
- Authority
- JP
- Japan
- Prior art keywords
- arm
- supported
- printing device
- guide rail
- coupling member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To prevent the inclination of a projection optical axis based upon the nonlinearity of a guide rail by using a guide with a buffer device. CONSTITUTION:A supporting tool 22 for a mask 8 and a supporting tool 23 for a wafer 10 are moved in one body by a coupling member 24. This coupling member 24 is supported and guided by an arm 25 through a guide rail 26 and a fluid bearing 31, and the arm 25 is supported on a spherical seat 50 as a buffer member at an upper left side in the figure. Consequently, even if one of left and right rails oscillates, the oscillation is absorbed by the spherical seat 50, so that neither rolling nor pitching is caused.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56052211A JPS57165831A (en) | 1981-04-07 | 1981-04-07 | Projection printing device |
US06/260,387 US4370054A (en) | 1981-04-02 | 1981-05-04 | Projection exposure apparatus |
GB8114118A GB2096334B (en) | 1981-04-02 | 1981-05-08 | Producing printed circuits |
DE19813118632 DE3118632A1 (en) | 1981-04-02 | 1981-05-11 | EXPOSURE PROJECTION DEVICE |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56052211A JPS57165831A (en) | 1981-04-07 | 1981-04-07 | Projection printing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57165831A true JPS57165831A (en) | 1982-10-13 |
Family
ID=12908422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56052211A Pending JPS57165831A (en) | 1981-04-02 | 1981-04-07 | Projection printing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57165831A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5978533A (en) * | 1982-10-27 | 1984-05-07 | Canon Inc | Exposure device |
JP2007299925A (en) * | 2006-04-28 | 2007-11-15 | Yaskawa Electric Corp | Stage device, and exposure apparatus |
-
1981
- 1981-04-07 JP JP56052211A patent/JPS57165831A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5978533A (en) * | 1982-10-27 | 1984-05-07 | Canon Inc | Exposure device |
JP2007299925A (en) * | 2006-04-28 | 2007-11-15 | Yaskawa Electric Corp | Stage device, and exposure apparatus |
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