JPS6453417A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS6453417A
JPS6453417A JP62209286A JP20928687A JPS6453417A JP S6453417 A JPS6453417 A JP S6453417A JP 62209286 A JP62209286 A JP 62209286A JP 20928687 A JP20928687 A JP 20928687A JP S6453417 A JPS6453417 A JP S6453417A
Authority
JP
Japan
Prior art keywords
damper
exposure device
main body
oscillation
air cushion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62209286A
Other languages
Japanese (ja)
Inventor
Takeshi Takizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62209286A priority Critical patent/JPS6453417A/en
Publication of JPS6453417A publication Critical patent/JPS6453417A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To attenuate the oscillation of the main body of the title exposure device by a method wherein a damper is mounted in parallel with an air cushion in a step and scan type exposure device. CONSTITUTION:A damper 12 is mounted oppositely to an air cushion 11 holding the title exposure device 10. At this time, the clearance between a damper main body 12b and a damper tray 12c is filled with silicon oil 12d. Through these procedures, the damper main body 12b can be moved corresponding to oscillation caused by a travelling carriage 9 not only in the vertical direction but also in the longitudinal direction so that the oscillation in both directions may be notably attenuated by the viscosity of the silicon oil 12d.
JP62209286A 1987-08-25 1987-08-25 Exposure device Pending JPS6453417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62209286A JPS6453417A (en) 1987-08-25 1987-08-25 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62209286A JPS6453417A (en) 1987-08-25 1987-08-25 Exposure device

Publications (1)

Publication Number Publication Date
JPS6453417A true JPS6453417A (en) 1989-03-01

Family

ID=16570430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62209286A Pending JPS6453417A (en) 1987-08-25 1987-08-25 Exposure device

Country Status (1)

Country Link
JP (1) JPS6453417A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9470989B2 (en) 2014-02-24 2016-10-18 Canon Kabushiki Kaisha Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9470989B2 (en) 2014-02-24 2016-10-18 Canon Kabushiki Kaisha Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus

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