JPS57154242A - Photomask and manufacture thereof - Google Patents

Photomask and manufacture thereof

Info

Publication number
JPS57154242A
JPS57154242A JP54082A JP54082A JPS57154242A JP S57154242 A JPS57154242 A JP S57154242A JP 54082 A JP54082 A JP 54082A JP 54082 A JP54082 A JP 54082A JP S57154242 A JPS57154242 A JP S57154242A
Authority
JP
Japan
Prior art keywords
photomask
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP54082A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0213780B2 (cs
Inventor
Roorensu Bankusu Edowaado
Edowaado Toruatsukusu Buruusu
Shiyaapuneru Watokins Roorensu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of JPS57154242A publication Critical patent/JPS57154242A/ja
Publication of JPH0213780B2 publication Critical patent/JPH0213780B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP54082A 1981-01-05 1982-01-05 Photomask and manufacture thereof Granted JPS57154242A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22245181A 1981-01-05 1981-01-05

Publications (2)

Publication Number Publication Date
JPS57154242A true JPS57154242A (en) 1982-09-24
JPH0213780B2 JPH0213780B2 (cs) 1990-04-05

Family

ID=22832261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54082A Granted JPS57154242A (en) 1981-01-05 1982-01-05 Photomask and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS57154242A (cs)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5179575A (cs) * 1975-01-06 1976-07-10 Hitachi Ltd
JPS55121442A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate
JPS55121443A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate
JPS5687043A (en) * 1979-12-19 1981-07-15 Hitachi Ltd Mask for exposure
JPS56130749A (en) * 1980-03-18 1981-10-13 Nec Corp Photomask for projective exposure

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5179575A (cs) * 1975-01-06 1976-07-10 Hitachi Ltd
JPS55121442A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate
JPS55121443A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate
JPS5687043A (en) * 1979-12-19 1981-07-15 Hitachi Ltd Mask for exposure
JPS56130749A (en) * 1980-03-18 1981-10-13 Nec Corp Photomask for projective exposure

Also Published As

Publication number Publication date
JPH0213780B2 (cs) 1990-04-05

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