JPS57151179U - - Google Patents
Info
- Publication number
- JPS57151179U JPS57151179U JP3763981U JP3763981U JPS57151179U JP S57151179 U JPS57151179 U JP S57151179U JP 3763981 U JP3763981 U JP 3763981U JP 3763981 U JP3763981 U JP 3763981U JP S57151179 U JPS57151179 U JP S57151179U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3763981U JPS6138863Y2 (enExample) | 1981-03-19 | 1981-03-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3763981U JPS6138863Y2 (enExample) | 1981-03-19 | 1981-03-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57151179U true JPS57151179U (enExample) | 1982-09-22 |
| JPS6138863Y2 JPS6138863Y2 (enExample) | 1986-11-08 |
Family
ID=29834827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3763981U Expired JPS6138863Y2 (enExample) | 1981-03-19 | 1981-03-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6138863Y2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11447861B2 (en) | 2016-12-15 | 2022-09-20 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus and a method of forming a patterned structure |
| US10770286B2 (en) | 2017-05-08 | 2020-09-08 | Asm Ip Holdings B.V. | Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures |
| US10923344B2 (en) | 2017-10-30 | 2021-02-16 | Asm Ip Holding B.V. | Methods for forming a semiconductor structure and related semiconductor structures |
| US11031242B2 (en) | 2018-11-07 | 2021-06-08 | Asm Ip Holding B.V. | Methods for depositing a boron doped silicon germanium film |
| US12040199B2 (en) | 2018-11-28 | 2024-07-16 | Asm Ip Holding B.V. | Substrate processing apparatus for processing substrates |
| USD975665S1 (en) | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
| CN112309843A (zh) | 2019-07-29 | 2021-02-02 | Asm Ip私人控股有限公司 | 实现高掺杂剂掺入的选择性沉积方法 |
| USD979506S1 (en) | 2019-08-22 | 2023-02-28 | Asm Ip Holding B.V. | Insulator |
| KR20210024423A (ko) | 2019-08-22 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | 홀을 구비한 구조체를 형성하기 위한 방법 |
| US12469693B2 (en) | 2019-09-17 | 2025-11-11 | Asm Ip Holding B.V. | Method of forming a carbon-containing layer and structure including the layer |
| KR102890638B1 (ko) | 2019-11-05 | 2025-11-25 | 에이에스엠 아이피 홀딩 비.브이. | 도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템 |
| US12040177B2 (en) | 2020-08-18 | 2024-07-16 | Asm Ip Holding B.V. | Methods for forming a laminate film by cyclical plasma-enhanced deposition processes |
-
1981
- 1981-03-19 JP JP3763981U patent/JPS6138863Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6138863Y2 (enExample) | 1986-11-08 |