JPS57130222A - Manufacture of thin-film magnetic head - Google Patents

Manufacture of thin-film magnetic head

Info

Publication number
JPS57130222A
JPS57130222A JP1393281A JP1393281A JPS57130222A JP S57130222 A JPS57130222 A JP S57130222A JP 1393281 A JP1393281 A JP 1393281A JP 1393281 A JP1393281 A JP 1393281A JP S57130222 A JPS57130222 A JP S57130222A
Authority
JP
Japan
Prior art keywords
magnetic layer
depth
recessed part
work strain
thicker
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1393281A
Other languages
Japanese (ja)
Inventor
Junzo Toda
Yoshio Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1393281A priority Critical patent/JPS57130222A/en
Publication of JPS57130222A publication Critical patent/JPS57130222A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/313—Disposition of layers
    • G11B5/3143—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
    • G11B5/3146—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers
    • G11B5/3153—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding magnetic layers including at least one magnetic thin film coupled by interfacing to the basic magnetic thin film structure

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To improve characteristics and to reduce the cost for manufacturing by flattening the entire surface of a magnetic layer by mechanical polishing after forming the magnetic layer thicker than the depth of the recessed part in a prescribed pattern, and removing a magnetic layer part, influenced by work strain, by etching. CONSTITUTION:A recessed part in a prescribed pattern is formed on a substrate 1 and a magnetic layer 2 thicker than the depth of the recessed part is formed. The magnetic layer is polished slantingly to form a surface 9, which is smoothed by ion milling or etching treatment to prescribed size, e.g. about 1mum depth to remove work strain, thus forming an ion-milled surface 10. Then, lower magnetic layers 2 and 3 are formed as a lower magnetic layer 4. On it, a coil 5 is provided and after an insulating packing material 6 is packed, an upper magnetic layer 7 is formed and then covered with a surface insulating layer 8. Consequently, products having superior characteristics are manufactured by eliminating work strain.
JP1393281A 1981-02-02 1981-02-02 Manufacture of thin-film magnetic head Pending JPS57130222A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1393281A JPS57130222A (en) 1981-02-02 1981-02-02 Manufacture of thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1393281A JPS57130222A (en) 1981-02-02 1981-02-02 Manufacture of thin-film magnetic head

Publications (1)

Publication Number Publication Date
JPS57130222A true JPS57130222A (en) 1982-08-12

Family

ID=11846957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1393281A Pending JPS57130222A (en) 1981-02-02 1981-02-02 Manufacture of thin-film magnetic head

Country Status (1)

Country Link
JP (1) JPS57130222A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4841402A (en) * 1986-01-27 1989-06-20 Hitachi, Ltd. Thin film magnetic head and method of manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4841402A (en) * 1986-01-27 1989-06-20 Hitachi, Ltd. Thin film magnetic head and method of manufacture

Similar Documents

Publication Publication Date Title
AU564878B2 (en) Mattress consisting of several layers of insulating material,and a method and tool for use in the production of such a mattress
DE2960114D1 (en) Process for equalizing the material removal rate of wafers by polishing
GB2035986B (en) Method for preparing an abrasive silicon oxide layer
JPS5658239A (en) Method of forming semiconductor on main surface of silicon semiconductor body
DE3364665D1 (en) Method for grinding the surface of a semiconductor wafer
EP0068800A3 (en) Process for improving the surface characteristics of shaped articles especially contact lenses
JPS62262210A (en) Manufacture of thin film magnetic head
HK43280A (en) Method for manufacturing rough textured soya bean curd
IT8068906A0 (en) PROCEDURE FOR CUTTING SHELL VALVES FORMED IN A WAFER PAD
JPS57130222A (en) Manufacture of thin-film magnetic head
EP0348230A3 (en) Process for producing thin film magnetic head
JPS5693333A (en) Method of manufacturing insulating layer for covering one side surface of semiconductor
JPS5794641A (en) Manufacture of electric heater
JPS55121643A (en) Fabricating method of semiconductor element
JPS5284597A (en) Method of grinding precisely and burnishing surface of lens by lapping tool tool for finishing surface of lens and method of manufacturing same
JPS5798118A (en) Method for manufacturing magnetic head
JPS57189321A (en) Manufacture of thin film magnetic head
JPS6476414A (en) Thin film magnetic head
JPS51111993A (en) Apparatus for fabricating thin work as semiconductor or the like
JPS5436502A (en) Insulation structure for winding end in electric machine
JPS57107053A (en) Manufacture of semiconductor device
DE3069175D1 (en) Process for heating thin surface layers
JPS5681934A (en) Formation of semiconductor element
JPS5259388A (en) Grinding tool
JPS57120218A (en) Multielement thin-film magnetic head